Pascal and Francis Bibliographic Databases

Help

Search results

Your search

kw.\*:("MASQUAGE")

Filter

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Document Type [dt]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Publication Year[py]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Discipline (document) [di]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Language

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Author Country

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Origin

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Results 1 to 25 of 6558

  • Page / 263

Export

Selection :

  • and

DOUBLE-SIDED PHOTOLITHOGRAPHY.HEINZ RA; CHUSS JT; SCHROEDER CM et al.1978; SOLID STATE TECHNOL.; USA; DA. 1978; VOL. 21; NO 8; PP. 55-60; BIBL. 2 REF.Article

NOUVEAUX DEVELOPPEMENTS DANS LA TECHNOLOGIE DES CIRCUITS INTEGRESWIEDENHOF N; WAALWIJK JM.1978; ELECTRONIQUE; CHE; DA. 1978; NO 10-11; PP. EL1-EL3Article

NEUE LITHOGRAFIEVERFAHREN IN DER HALBLEITERTECHNIK = NOUVELLES METHODES LITHOGRAPHIQUES DANS LA TECHNIQUE DES SEMICONDUCTEURSHANNO S.1978; ELEKTRONIK; DEU; DA. 1978; VOL. 27; NO 11; PP. 59-66; BIBL. 9 REF.Article

METODI LITOGRAFICI PER LA TECNOLOGIA PLANARE. I. LITOGRAFIA OTTICA, A RAGGI X, ELETTRONICA A PROIEZIONE. = METHODES LITHOGRAPHIQUES POUR LA TECHNOLOGIE PLANAIRE. PHOTOLITHOGRAPHIE, LITHOGRAPHIE AUX RAYONS X, LITHOGRAPHIE PAR PROJECTION D'ELECTRONSARMIGLIATO A; COCITO M; MERLI PG et al.1977; ELETTRON. E TELECOMUNIC.; ITAL.; DA. 1977; VOL. 26; NO 2; PP. 67-80; ABS. ANGL.; BIBL. 36 REF.Article

L'ETAT PRESENT ET PREVISIONNEL DES MASQUEURS ELECTRONIQUES.PIRCHER G.1977; REV. TECH. THOMSON-C.S.F.; FR.; DA. 1977; VOL. 9; NO 2; PP. 221-244; ABS. ANGL. ALLEM.; BIBL. 41 REF.Article

DETERMINATION OF WAVELENGTH AND EXCITATION VOLTAGE FOR X-RAY LITHOGRAPHY.SULLIVAN PA; MCCOY JH.1976; I.E.E.E. TRANS. ELECTRON DEVICES; U.S.A.; DA. 1976; VOL. 23; NO 4; PP. 412-418; BIBL. 25 REF.Article

HERSTELLUNG VON DUENNSCHICHTSTRUKTUREN DURCH ELEKTRONENSTRAHLLITHOGRAFIE. = PRODUCTION DE STRUCTURES DE COUCHES MINCES PAR LITHOGRAPHIE PAR BOMBARDEMENT D'ELECTRONSLEDOVSKOJ WP; MARGOLIN WI; TIEROK M et al.1976; FEINGERAETETECHNIK; DTSCH.; DA. 1976; VOL. 25; NO 5; PP. 225-226; ABS. RUSSE ANGL.; BIBL. 3 REF.Article

PHOTOLITHOGRAPHIC LINEWITH CONTROL.MCGILLIS DA; FEHRS DL.1975; I.E.E.E. TRANS. ELECTRON DEVICES; U.S.A.; DA. 1975; VOL. 22; NO 7; PP. 471-477; BIBL. 3 REF.Article

MASQUAGE ET DUPLICATION DANS LE DOMAINE DU MICRON DE LARGEUR DE TRAIT. ETAT ET PERSPECTIVES DES TECHNIQUES OPTIQUES ET ELECTRONIQUES.PIRCHER G.1975; REV. TECH. THOMSON-C.S.F.; FR.; DA. 1975; VOL. 7; NO 1; PP. 5-46; ABS. ANGL. ALLEM.; BIBL. 18 REF.Article

MASKENHERSTELLUNG MIT DEM ELEKTRONENSTRAHL. = FABRICATION DES MASQUES AU MOYEN D'UN FAISCEAU ELECTRONIQUERICKER T; HERSENER J.1975; VAKUUM-TECH.; DTSCH.; DA. 1975; VOL. 24; NO 8; PP. 223-226; ABS. ANGL. FR.; BIBL. 5 REF.Article

POLYMER RESIST SYSTEMS FOR PHOTO- AND ELECTRON LITHOGRAPHY.THOMPSON LF; KERWIN RE.1976; ANNU. REV. MATER. SCI.; U.S.A.; DA. 1976; VOL. 6; PP. 267-301; BIBL. 1 P. 1/2Article

ELECTRON BEAM AND X-RAY LITHOGRAPHY UPDATE.PIWCZYK BP.1978; ELECTRON. PACKAG. PRODUCT.; U.S.A.; DA. 1978; VOL. 18; NO 5; PP. 36-51 (10P.); BIBL. 18 REF.Article

PRODUCTION E-BEAM LITHOGRAPHY.1977; CIRCUITS MANUF.; U.S.A.; DA. 1977; VOL. 17; NO 11; PP. 54-55Article

PRINCIPE ET TECHNIQUE DE LA LITHOGRAPHIE PAR BOMBARDEMENT ELECTRONIQUECHANG THP; HATZAKIS M; WILSON AD et al.1977; ELEKTRONIK; DTSCH.; DA. 1977; VOL. 29; NO 8; PP. 51-60; BIBL. 27 REF.Article

ELECTRON LEAMS HELP SHAPE BETTER CIRCUITS.HERRIOT DR.1976; BELL LAB. REC.; U.S.A.; DA. 1976; VOL. 54; NO 3; PP. 69-73Article

INFLUENCE DU FOND DANS LA PHOTOIMPRESSION AVEC MASQUAGE ELECTRONIQUEKRUGLOV NV; LAPINA NI.1976; OPT.-MEKH. PROMYSHL.; S.S.S.R.; DA. 1976; VOL. 43; NO 12; PP. 10-12; BIBL. 2 REF.Article

PHOTOLITHOGRAPHY IN INTEGRATED CIRCUIT MASK METROLOGY.ROTTMANN HR.1975; SOLID STATE TECHNOL.; U.S.A.; DA. 1975; VOL. 18; NO 6; PP. 29-34; BIBL. 37 REF.Article

PROJECTION ELECTRON LITHOGRAPHY USING APERTURE LENSES.HEYNICK LN; WESTERBERG ER; HARTELIUS CC JR et al.1975; I.E.E.E. TRANS. ELECTRON DEVICES; U.S.A.; DA. 1975; VOL. 22; NO 7; PP. 399-409; BIBL. 13 REF.Article

PROXIMITY EFFECT IN ELECTRON-BEAM LITHOGRAPHY.CHANG THP.1975; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1975; VOL. 12; NO 6; PP. 1271-1275; BIBL. 6 REF.; (SYMP. ELECTRON ION PHOTON BEAM TECHNOL. 13. PROC.; COLORADO SPRINGS; 1975)Conference Paper

CONTROL SYSTEM DESIGN AND ALIGNMENT METHODS FOR ELECTRON LITHOGRAPHY.ALLES DS; ASHLEY FR; JOHNSON AM et al.1975; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1975; VOL. 12; NO 6; PP. 1252-1256; (SYMP. ELECTRON ION PHOTON BEAM TECHNOL. 13. PROC.; COLORADO SPRINGS; 1975)Conference Paper

ELECTRODE FLATNESS REQUIREMENTS FOR CATHODE PROJECTION MICROFABRICATION SYSTEMS.WARDLY GA.1975; I.E.E.E. TRANS. ELECTRON DEVICES; U.S.A.; DA. 1975; VOL. 22; NO 7; PP. 414-417; BIBL. 12 REF.Article

DES MASQUES PLUS PRECIS, PLUS FIABLES.CATIER E.1975; ELECTRON. MICROELECTRON. INDUSTR.; FR.; DA. 1975; NO 202; PP. 53-58; BIBL. 10 REF.Article

A THEORY OF CENTRAL AUDITORY MASKING AND ITS PARTIAL VALIDATION = UNE THEORIE SUR LE MASQUAGE AUDITIF CENTRAL ET SA VALIDATION PARTIELLEZWISLOCKI JJ.1972; J. ACOUST. SOC. AMER.; U.S.A.; DA. 1972; VOL. 52; NO 2, PART 2; PP. 644-659; BIBL. 1P.Serial Issue

TRENDS IN SEMICONDUCTOR PHOTOLITHOGRAPHY.MARKSTEIN HW.1977; ELECTRON. PACKAG. PRODUCT.; U.S.A.; DA. 1977; VOL. 17; NO 3; PP. 25-33 (6P.); BIBL. 2 REF.Article

PATHWAYS AND PITFALLS IN DEVICE LITHOGRAPHY.GORDON EI.1975; IN: INT. ELECTRON DEVICES MEET.; WASHINGTON, D.C.; 1975; NEW YORK; INST. ELECTR. ELECTRON. ENG.; DA. 1975; PP. 3-5; BIBL. 7 REF.Conference Paper

  • Page / 263