Pascal and Francis Bibliographic Databases

Help

Search results

Your search

kw.\*:("MASQUE")

Filter

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Document Type [dt]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Publication Year[py]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Discipline (document) [di]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Language

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Author Country

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Origin

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Results 1 to 25 of 10456

  • Page / 419
Export

Selection :

  • and

PHOTOLITHOGRAPHIC MASK ALIGNMENT USING MOIRE TECHNIQUESKING MC; BERRY DH.1972; APPL. OPT.; U.S.A.; DA. 1972; VOL. 11; NO 11; PP. 2455-2459; BIBL. 7 REF.Serial Issue

DES APPAREILS D'AVANT-GARDE POUR LA MICROELECTRONIQUE DE DEMAINNOLET B.1973; ELECTRON. MICROELECTRON. INDUSTR.; FR.; DA. 1973; NO 169; PP. 57-59Serial Issue

AUTOMATIC OUT-OF-CONTACT MASK ALIGNMENT.CLARK KG.1975; SOLID STATE TECHNOL.; U.S.A.; DA. 1975; VOL. 18; NO 8; PP. 47-57 (8P.); BIBL. 12 REF.Article

PROGRAM OF AUTOMATIC CIRCUIT DRAWING FOR MASK MAKING SYSTEMUYEHARA T; TAKAHASHI O; SHIRAISHI H et al.1972; FUJITSU SCI. TECH. J.; JAP.; DA. 1972; VOL. 8; NO 3; PP. 35-58; BIBL. 2 REF.Serial Issue

DIRECT COHERENT OPTICAL FOURIER TRANSFORM OF CURVES.LANZL F; HEITMANN H.1974; IN: INT. OPT. COMPUT. CONF. DIG. PAPERS., ZURICH, SWITZ; 1974; NEW YORK; INST. ELECTR. ELECTRON. ENG.; DA. 1974; PP. 38-40; BIBL. 4 REF.Conference Paper

THE OPTHYCOGRAPH. = L'"OPTHYCOGRAPHE"BOUWER AG; BRUEL RH; VAN HEEK HF et al.1974; PHILIPS TECH. REV.; NETHERL.; DA. 1974; VOL. 34; NO 10; PP. 257-269; BIBL. 10 REF.Article

PHOTO-COMPOSITION AND LSIMURPHY JP; HENRIKSEN G; WOODS L et al.1973; SOLID STATE TECHNOL.; U.S.A.; DA. 1973; VOL. 16; NO 6; PP. 29-32; BIBL. 7 REF.Serial Issue

BESSERE FOTOMASKEN FUER INTEGRIERTE SCHALTUNGEN DURCH PD-PROZESS = AMELIORATION DES MASQUES PHOTOGRAPHIQUES POUR CIRCUITS INTEGRES PAR LE PROCEDE PD1972; INTERNATION. ELEKTRON. RDSCH.; DTSCH.; DA. 1972; VOL. 26; NO 10; PP. 245; ABS. ANGL. FRSerial Issue

THE SEMICONDUCTOR IN MANUFACTURECLARK KG.1972; MICROELECTRONICS; G.B.; DA. 1972; VOL. 4; NO 3; PP. 31-36Serial Issue

AUTOMATED PHOTOMASK INSPECTION.NOVOTNY DB; CIARLO DR.1978; SOLIDE STATE TECHNOL.; USA; DA. 1978; VOL. 21; NO 5; PP. 51-76 (10P.); BIBL. 32 REF.Article

PHOTOMASKMAKING SERVICES FACE DEMAND FOR STIL HIGHER QUALITY, LOWER PRICES.ISCOFF RLZ.1975; ELEKTRON. PACKAG. PRODUCT.; U.S.A.; DA. 1975; VOL. 15; NO 8; PP. 109-114 (4P.)Article

AN AUTOMATED MASK INSPECTION SYSTEM. AMIS.BRUNING JH; FELDMAN M; KINSEL TS et al.1975; I.E.E.E. TRANS. ELECTRON DEVICES; U.S.A.; DA. 1975; VOL. 22; NO 7; PP. 487-495; BIBL. 15 REF.Article

THEORY AND PRACTICE OF IMAGE FORMATION BY THE PHOTOPROJECTION METHOD OF SUBMICRON PATTERNS.VAN DEN BERG HAM; RUIGROK JJM.1978; APPL. PHYS.; GERM.; DA. 1978; VOL. 16; NO 3; PP. 279-287; BIBL. 19 REF.Article

AN ECONOMIC PHOTOMASK PROCESSING SCHEME FOR THE SMALL LABORATORY.JAGGERS KA.1978; INTERNATION. J. ELECTR. ENGNG EDUC.; G.B.; DA. 1978; VOL. 15; NO 1; PP. 41-52; ABS. FR. ALLEM. ESP.; BIBL. 4 REF.Article

PATTERN GENERATOR FOR MANUFACTURING HIGHER CAPACITY, HIGHER DENSITY ICS.ICHINOSE W.1974; JAP. ELECTRON. ENGNG; JAP.; DA. 1974; NO 92; PP. 30-35Article

A LABORATORY PHOTOMASK PRODUCTION FACILITYGAYLORD TK.1972; REV. SCI. INSTRUM.; U.S.A.; DA. 1972; VOL. 43; NO 9; PP. 1268-1271; BIBL. 11 REF.Serial Issue

CONTROLLED DIFFRACTION AS THE BASIS OF AN OUT-OF-CONTACT MASKING SYSTEMBEYNON JDE; HALL BP; SMITH JG et al.1972; SOLID STATE TECHNOL.; U.S.A.; DA. 1972; VOL. 15; NO 11; PP. 29-34; BIBL. 12 REF.Serial Issue

CURRENT DEFINITIONS AND STANDARDS IN PHOTOMASK MANUFACTURING.KELLER CW.1978; INSULAT. CIRCUITS; U.S.A.; DA. 1978; VOL. 24; NO 5; PP. 33-35Article

MISE EN OEUVRE DU PHOTOREPETEUR MONO-OBJECTIF UNIVERSEL UER DANS L'INDUSTRIE DES SEMI-CONDUCTEURSHOESSEL B.1978; REV. IENA; DDR; DA. 1978; VOL. 18; NO 5; PP. 219-221; BIBL. 2 REF.Article

CERTAINES METHODES DE MULTIPLICATION DES DESSINS DE PHOTO-MASQUES REPRESENTANT LA TOPOLOGIE DES CIRCUITS INTEGRES REALISES A L'AIDE DES INSTALLATIONS A FAISCEAUX CATHODIQUESBEZNOSENKO DA; KISELEVSKIJ FN; MAN'KOVSKIJ VI et al.1974; IZVEST. VYSSH. UCHEBN. ZAVED., PRIBOROSTR.; S.S.S.R.; DA. 1974; VOL. 17; NO 9; PP. 110-112; BIBL. 2 REF.Article

THE SILICON REPEATERBOUWER AG; BOUWHUIS G; VAN HEEK HF et al.1977; PHILIPS TECH. REV.; NLD; DA. 1977; VOL. 37; NO 11-12; PP. 330-333; BIBL. DISSEM.Article

FABRICATION OF HIGH RESOLUTION AND HIGH PRECISION METALLIC PHOTOMASK.MIMURA Y; OZAWA A.1975; REV. ELECTR. COMMUNIC. LAB.; JAP.; DA. 1975; VOL. 23; NO 11-12; PP. 1255-1263; BIBL. 5 REF.Article

PROGRESS IN IC PHOTOMASKINGMARKSTEIN H.1973; ELECTRON. PACKAG. PRODUCT.; U.S.A.; DA. 1973; VOL. 13; NO 5; PP. 31-44 (5 P.)Serial Issue

A PRODUCTION-COMPATIBLE MICROELECTRONIC TEST PATTERN FOR EVALUATING PHOTOMASK MISALIGNMENTRUSSELL TJ; MAXWELL DA.1979; NATION. BUR. STAND., SPEC. PUBL.; USA; DA. 1979; NO 400-51; 31 P.; BIBL. DISSEM.Serial Issue

AUTOMATED EQUIPMENT FOR 100% INSPECTION OF PHOTOMASKS.LEVY K.1978; SOLIDE STATE TECHNOL.; USA; DA. 1978; VOL. 21; NO 5; PP. 60-71 (8P.); BIBL. 5 REF.Article

  • Page / 419