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PROGRESS IN RESEARCHES ON LASER MATERIAL PROCESSING IN JAPANKOBAYASHI A.1980; BULL. JPN. SOC. PRECIS. ENG.; ISSN 0582-4206; JPN; DA. 1980; VOL. 14; NO 4; PP. 201-206Article

DISTORSIONS THERMIQUES DES DESSINS OBTENUS SUR DES OXYDES DE METAUX PAR RAYONNEMENT LASERNEPOKOJCHITSKIJ AG; SKIBA PA.1979; ZH. PRIKL. SPEKTROSK.; BYS; DA. 1979; VOL. 31; NO 2; PP. 219-225; ABS. ENG; BIBL. 13 REF.Article

SPECIAL ISSUE ON SEMICONDUCTOR MATERIALS AND PROCESSING TECHNOLOGY.GREGORY BL.1977; I.E.E.E. J. SOLID-STATE CIRCUITS; U.S.A.; DA. 1977; VOL. 12; NO 4; PP. 334Article

SEEKING ANSWERS OVERSEASBELFORTE DA.1980; ELECTRO-OPT. SYST. DESIGN; USA; DA. 1980; VOL. 12; NO 6; PP. 60-62; (2 P.); BIBL. 6 REF.Article

AMELIORATION DE LA STRUCTURE DU PROCESSUS TECHNOLOGIQUE D'OBTENTION DES COMPOSANTS OPTIQUES DE FAIBLE RIGIDITESHLISHEVSKIJ B EH.1977; OPT.-MEKH. PROMYSHL.; S.S.S.R.; DA. 1977; VOL. 44; NO 8; PP. 38-40; BIBL. 2 REF.Article

PHOTORESIST TRENDS IN SEMICONDUCTOR PROCESSING.LEVINTHAL DJ.1977; ELECTRON. PACKAG. PRODUCT.; U.S.A.; DA. 1977; VOL. 17; NO 11; PP. 49-50Article

AUTOMATED PROCESSING OF POSITIVE PHOTORESISTS: SPRAY DEVELOPING FOR LINE SEMICONDUCTORSMACBETH G.1979; CIRCUITS MANUF.; USA; DA. 1979; VOL. 19; NO 4; PP. 50-60; (5 P.); BIBL. 5 REF.Article

DO LIGHTWEIGHT MATERIALS REALLY SAVE ENERGY.WHEELER MA.1982; AUTOMAT. ENG.; ISSN 0098-2571; USA; DA. 1982; VOL. 90; NO 3; PP. 35-38Article

LE FRITTAGE SOUS VIDEMARMER EH N.1979; ELEKTROTEKHNIKA; SUN; DA. 1979; NO 9; PP. 36-39; BIBL. 8 REF.Article

THE PARTICULATE MATTER IN SEMICONDUCTOR CHEMICALS.JUCEFF EM; FAWCETT S; GAYDA SE et al.1977; MICROELECTRONICS; G.B.; DA. 1977; VOL. 8; NO 3; PP. 35-37; BIBL. 1 REF.Article

INTRODUCTION AUX LASERS ET A LEURS APPLICATIONSO'SHEA DONALD C; RUSSEL CALLEN W; RHODES WILLIAM T et al.1980; ; FRA; PARIS: EYROLLES; DA. 1980; 269 P.; 24 CM;[INTRODUCTION TO LASERS AND THEIR APPLICATIONS; USA; READING, MA: ADDISON-WESLEY PUBLISHING CO.; DA. 1977]Book

FACTORS AFFECTING ADHESION OF LITHOGRAPHIC MATERIALSMITTAL KL.1979; SOLID STATE TECHNOL.; USA; DA. 1979; VOL. 22; NO 5; PP. 89-100; (8 P.); BIBL. 27 REF.Article

THE PHYSICS OF MAGNETIC SEPARATION.PARKER MR.1977; CONTEMPOR. PHYS.; G.B.; DA. 1977; VOL. 18; NO 3; PP. 279-306; BIBL. 23 REF.Article

PREVIEW OF THE 7TH CLEA. AN LF MEETING ROUNDUP1979; LASER FOCUS; USA; DA. 1979-05; PP. 46-62; (9 P.)Article

PRINCIPLES OF HIGH-GRADIENT MAGNETOGRAVIMETRIC SEPARATION.ZIMMELS Y; TUVAL Y; LIN IJ et al.1977; I.E.E.E. TRANS. MAGNET.; U.S.A.; DA. 1977; VOL. 13; NO 4; PP. 1045-1052; BIBL. 7 REF.Article

DIE ENTWICKLUNG DER MATERIALBEARBEITUNG DURCH ELEKTRONENSTRAHLEN. GUNDLAGEN UND ANWENDUNGEN DER ELEKTRONENSTRAHLTECHNIK. = DEVELOPPEMENT DU TRAITEMENT DES MATERIAUX PAR RAYONNEMENT ELECTRONIQUEBERTELE H.1977; ELEKTROTECH. U. MASCH.-BAU; OESTERR.; DA. 1977; VOL. 94; NO 8; PP. 323-336; BIBL. 22 REF.Article

LASER PROCESSING OF SEMICONDUCTORS - AN UPDATEARTHURS EG; FALSTER R.1981; ELECTRO-OPT. SYST. DES.; ISSN 0424-8457; USA; DA. 1981; VOL. 13; NO 3; PP. 49-57; 7 P.; BIBL. 21 REF.Article

OPERATIONAL MAINTENANCE CONSIDERATIONS WITH THE ELECTROCURTAINREG. PROCESSORNABLO SV.1981; J. RADIAT. CURING; ISSN 0361-6428; USA; DA. 1981; VOL. 8; NO 2; PP. 10-18; 7 P.; BIBL. 11 REF.Article

REPLICATING OPTICAL SURFACES USING UV CURING CEMENTS: A METHODFANTONE SD.1983; APPLIED OPTICS; ISSN 0003-6935; USA; DA. 1983; VOL. 22; NO 6; PP. 764Article

COMPLEX PERMITTIVITY AND MICROWAVE HEATING OF PURE WATER, TAP WATER AND SALT SOLUTIONKUMAR A.1979; INTERNATION. J. ELECTRON.; GBR; DA. 1979; VOL. 47; NO 6; PP. 531-536; BIBL. 5 REF.Article

ETUDE DE LA TEMPERATURE D'ECHAUFFEMENT DES PIECES SPHERIQUES DANS UN COURANT DE PLASMAKARPINOS DM; CHEKHOVSKIJ AA; ZIL'BERBERG VG et al.1979; POROSHKOV. METALLURG.; UKR; DA. 1979; NO 2; PP. 79-81; ABS. ENG; BIBL. 4 REF.Article

MASS CHANGES OF ADHESIVES DURING CURING, EXPOSURE TO WATER VAPOR, EVACUATION, AND OUTGASSING, PART I: ABLEFILMS 529, 535 AND 550VASOFSKY RW; CSANDERNA AW; CSANDERNA KK et al.1978; I.E.E.E. TRANS. COMPON. HYBR. MANUFG TECHNOL.; USA; DA. 1978; VOL. 1; NO 4; PP. 405-411; BIBL. 20 REF.Article

RESONATEUR LIMITE RECTANGULAIRE OUVERT AVEC OSCILLATIONS DE TYPE H10P ET H20SMIRONENKO VL.1976; RADIOTEKHNIKA, U.S.S.R.; S.S.S.R.; DA. 1976; NO 38; PP. 107-109; BIBL. 7 REF.Article

CHARACTERIZATION OF MAGNETOHYDROSTATIC AXIAL SEPARATION SYSTEMZIMMELS Y; LIN IJ.1983; IEEE TRANSACTIONS ON MAGNETICS; ISSN 0018-9464; USA; DA. 1983; VOL. 19; NO 1; PP. 27-32; BIBL. 4 REF.Article

ETUDE D'UN SYSTEME DE RECUIT EN CONTINU DES CONDUCTEURSSTRATIJ VI; SHLYAKHTER GN.1980; ELEKTROTEHNIKA; ISSN 0013-5860; SUN; DA. 1980; NO 12; PP. 55-57Article

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