Capacitance-voltage characterization of LPCVD-silicon oxynitride filmsSZEKERES, A; ALEXANDROVA, S; MODREANU, M et al.Physica status solidi. A. Applied research. 2001, Vol 187, Num 2, pp 493-498, issn 0031-8965Article

Study of the growth and annealing conditions of SrCu₂O₂ (SCO) thin films deposited by injection MOCVDDESCHANVRES, J. L; MILLON, C; JIMENEZ, C et al.Physica status solidi. A, Applications and materials science (Print). 2008, Vol 205, Num 8, pp 2013-2017, issn 1862-6300, 5 p.Article

Growth and characterisation of CaCu₂O_x thin films by pulsed injection MOCVDDESCHANVRES, J. L; JIMENEZ, C; RAPENNE, L et al.Thin solid films. 2008, Vol 516, Num 7, pp 1461-1463, issn 0040-6090, 3 p.Conference Paper

Thin multilayers characterization by grazing X-ray reflectometry and use of Fourier transformBRIDOU, F; GAUTIER, J; DELMOTTE, F et al.Applied surface science. 2006, Vol 253, Num 1, pp 12-16, issn 0169-4332, 5 p.Conference Paper

Optical characterisation of LPCVD SiO_xN_y thin filmsMODREANU, M; GARTNER, M; TOMOZEIU, N et al.Proceedings - Electrochemical Society. 2003, pp 118-129, issn 0161-6374, isbn 1-56677-346-6, 12 p.Conference Paper

Microstructural information from optical properties of LPCVD silicon films annealed at low temperatureGARTNER, M; MODREANU, M; COBIANU, C et al.Sensors and actuators. A, Physical. 2002, Vol 99, Num 1-2, pp 160-164, issn 0924-4247, 5 p.Conference Paper

Phase and surface roughness evolution for as-deposited LPCVD silicon filmsCOBIANU, C; PLUGARU, R; NASTASE, N et al.Journal de physique. IV. 1999, Vol 9, Num 8, pp Pr8.1083-Pr8.1090, issn 1155-4339, 2Conference Paper

Influence of the substrate and nitrogen amount on the microstructural and optical properties of thin r.f.-sputtered ZnO films treated by rapid thermal annealingNICOLESCU, Madalina; ANASTASESCU, Mihai; GARTNER, M et al.Applied surface science. 2012, Vol 261, pp 815-823, issn 0169-4332, 9 p.Article

Properties of strontium copper oxide (SCO) deposited by PLD using the 308 nm laser and formation of SCO/Si heterostructuresLOULOUDAKIS, D; VARDA, M; PAPADOPOULOU, E. L et al.Physica status solidi. A, Applications and materials science (Print). 2010, Vol 207, Num 7, pp 1726-1730, issn 1862-6300, 5 p.Conference Paper

Studies of oxide-based thin-layered heterostructures by X-ray scattering methodsDURAND, O; ROGERS, D; TEHERANI, F. Hosseini et al.Thin solid films. 2007, Vol 515, Num 16, pp 6360-6367, issn 0040-6090, 8 p.Conference Paper

Study of the growth conditions and characterization of CaCu₂O_x and SrCu₂O_x thin filmsMILLON, C; DESCHANVRES, J. L; JIMENEZ, C et al.Surface & coatings technology. 2007, Vol 201, Num 22-23, pp 9395-9399, issn 0257-8972, 5 p.Conference Paper

Investigation of thermal annealing effects on microstructural and optical properties of HfO₂ thin filmsMODREANU, M; SANCHO-PARRAMON, J; DURAND, O et al.Applied surface science. 2006, Vol 253, Num 1, pp 328-334, issn 0169-4332, 7 p.Conference Paper

Interface of ultrathin HfO₂ films deposited by UV-photo-CVDFANG, Q; ZHANG, J.-Y; SENATEUR, J.-P et al.Thin solid films. 2004, Vol 453-54, pp 203-207, issn 0040-6090, 5 p.Conference Paper

Investigation on optical and microstructural properties of photoluminescent LPCVD SiO_xN_y thin filmsMODREANU, M; GARTNER, Mariuca; TOMOZEIU, N et al.Optical materials (Amsterdam). 2001, Vol 17, Num 1-2, pp 145-148, issn 0925-3467Conference Paper

Derivation of the complex refractive index of ITO and ITON films in the infrared region of the spectrum by the analysis of optical measurementsKONDILIS, A; APERATHITIS, E; MODREANU, M et al.Thin solid films. 2008, Vol 516, Num 22, pp 8073-8081, issn 0040-6090, 9 p.Conference Paper

Effect of chlorine doping on electrical and optical properties of ZnO thin filmsCHIKOIDZE, E; NOLAN, M; MODREANU, M et al.Thin solid films. 2008, Vol 516, Num 22, pp 8146-8149, issn 0040-6090, 4 p.Conference Paper

Extraction of the refractive index profile of thin transparent conductive oxide films from the analysis of reflectance optical spectraKONDILIS, A; APERATHITIS, E; MODREANU, M et al.Thin solid films. 2007, Vol 515, Num 24, pp 8586-8589, issn 0040-6090, 4 p.Conference Paper

Electrical characterization of HfO₂ films obtained by UV assisted injection MOCVDDECAMS, J. M; GUILLON, H; RUSWORTH, S et al.Microelectronics and reliability. 2005, Vol 45, Num 5-6, pp 929-932, issn 0026-2714, 4 p.Conference Paper

Post deposition UV-induced O₂ annealing of HfO₂ thin filmsFANG, Q; LIAW, I; MODREANU, M et al.Microelectronics and reliability. 2005, Vol 45, Num 5-6, pp 957-960, issn 0026-2714, 4 p.Conference Paper

Optical characterization of indium-tin-oxynitride fabricated by RF-sputteringAPERATHITIS, E; MODREANU, M; BENDER, M et al.Thin solid films. 2004, Vol 450, Num 1, pp 101-104, issn 0040-6090, 4 p.Conference Paper

Optical properties of silicon thin films related to LPCVD growth conditionMODREANU, M; GARTNER, M; COBIANU, C et al.Thin solid films. 2004, Vol 450, Num 1, pp 105-110, issn 0040-6090, 6 p.Conference Paper

The etching behavior of APCVD PSG thin films used as sacrificial layers for surface micromachined resonant microstructuresMODREANU, M; MOLDOVAN, Carmen; IOSUB, Rodica et al.Sensors and actuators. A, Physical. 2002, Vol 99, Num 1-2, pp 82-84, issn 0924-4247, 3 p.Conference Paper

Optical properties of LPCVD silicon oxynitrideMODREANU, M; TOMOZEIU, N; COSMIN, P et al.Thin solid films. 1999, Vol 337, Num 1-2, pp 82-84, issn 0040-6090Conference Paper

Transparent p/n diode device from a single zinc nitride sputtering targetKAMBILAFKA, V; KOSTOPOULOS, A; ANDROULIDAKI, M et al.Thin solid films. 2011, Vol 520, Num 4, pp 1202-1206, issn 0040-6090, 5 p.Conference Paper

Electrical properties of chlorine-doped ZnO thin films grown by MOCVDCHIKOIDZE, E; MODREANU, M; SALLET, V et al.Physica status solidi. A, Applications and materials science (Print). 2008, Vol 205, Num 7, pp 1575-1579, issn 1862-6300, 5 p.Article