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Advanced mask manufacturingREITA, Carlo.Comptes rendus. Physique. 2006, Vol 7, Num 8, pp 896-909, issn 1631-0705, 14 p.Article

Masques Sulka = Sulka masksJEUDY-BALLINI, M.Arts d'Afrique noire (Villiers-le-Bel). 1994, Num 90, pp 32-38, issn 0337-1603Article

PHOTOLITHOGRAPHIC MASK ALIGNMENT USING MOIRE TECHNIQUESKING MC; BERRY DH.1972; APPL. OPT.; U.S.A.; DA. 1972; VOL. 11; NO 11; PP. 2455-2459; BIBL. 7 REF.Serial Issue

Contrôle par comparaison des masques utilisés en micro-électronique. Comparateur de masques = Control by comparison of masks used by the microelectronics industry. Mask comparatorLE LUYER, M.Bulletin d'Information du Bureau National de Métrologie. 1983, Vol 14, Num 54, pp 13-16, issn 0373-3815Article

Is there History in Horizontal Masks? A Preliminary Response to the Dilemma of FormMCNAUGHTON, P. R.African arts. 1991, Vol 24, Num 2, pp 40-53, issn 0001-9933, 88Article

DES APPAREILS D'AVANT-GARDE POUR LA MICROELECTRONIQUE DE DEMAINNOLET B.1973; ELECTRON. MICROELECTRON. INDUSTR.; FR.; DA. 1973; NO 169; PP. 57-59Serial Issue

AUTOMATIC OUT-OF-CONTACT MASK ALIGNMENT.CLARK KG.1975; SOLID STATE TECHNOL.; U.S.A.; DA. 1975; VOL. 18; NO 8; PP. 47-57 (8P.); BIBL. 12 REF.Article

PROGRAM OF AUTOMATIC CIRCUIT DRAWING FOR MASK MAKING SYSTEMUYEHARA T; TAKAHASHI O; SHIRAISHI H et al.1972; FUJITSU SCI. TECH. J.; JAP.; DA. 1972; VOL. 8; NO 3; PP. 35-58; BIBL. 2 REF.Serial Issue

Dieu masqué, dieu sans têteMEEKS, D.Archéo-Nil. 1991, Vol 1, pp 5-15Article

DIRECT COHERENT OPTICAL FOURIER TRANSFORM OF CURVES.LANZL F; HEITMANN H.1974; IN: INT. OPT. COMPUT. CONF. DIG. PAPERS., ZURICH, SWITZ; 1974; NEW YORK; INST. ELECTR. ELECTRON. ENG.; DA. 1974; PP. 38-40; BIBL. 4 REF.Conference Paper

THE OPTHYCOGRAPH. = L'"OPTHYCOGRAPHE"BOUWER AG; BRUEL RH; VAN HEEK HF et al.1974; PHILIPS TECH. REV.; NETHERL.; DA. 1974; VOL. 34; NO 10; PP. 257-269; BIBL. 10 REF.Article

PHOTO-COMPOSITION AND LSIMURPHY JP; HENRIKSEN G; WOODS L et al.1973; SOLID STATE TECHNOL.; U.S.A.; DA. 1973; VOL. 16; NO 6; PP. 29-32; BIBL. 7 REF.Serial Issue

BESSERE FOTOMASKEN FUER INTEGRIERTE SCHALTUNGEN DURCH PD-PROZESS = AMELIORATION DES MASQUES PHOTOGRAPHIQUES POUR CIRCUITS INTEGRES PAR LE PROCEDE PD1972; INTERNATION. ELEKTRON. RDSCH.; DTSCH.; DA. 1972; VOL. 26; NO 10; PP. 245; ABS. ANGL. FRSerial Issue

THE SEMICONDUCTOR IN MANUFACTURECLARK KG.1972; MICROELECTRONICS; G.B.; DA. 1972; VOL. 4; NO 3; PP. 31-36Serial Issue

CURRENT DEFINITIONS AND STANDARDS IN PHOTOMASK MANUFACTURING.KELLER CW.1978; INSULAT. CIRCUITS; U.S.A.; DA. 1978; VOL. 24; NO 5; PP. 33-35Article

MISE EN OEUVRE DU PHOTOREPETEUR MONO-OBJECTIF UNIVERSEL UER DANS L'INDUSTRIE DES SEMI-CONDUCTEURSHOESSEL B.1978; REV. IENA; DDR; DA. 1978; VOL. 18; NO 5; PP. 219-221; BIBL. 2 REF.Article

CERTAINES METHODES DE MULTIPLICATION DES DESSINS DE PHOTO-MASQUES REPRESENTANT LA TOPOLOGIE DES CIRCUITS INTEGRES REALISES A L'AIDE DES INSTALLATIONS A FAISCEAUX CATHODIQUESBEZNOSENKO DA; KISELEVSKIJ FN; MAN'KOVSKIJ VI et al.1974; IZVEST. VYSSH. UCHEBN. ZAVED., PRIBOROSTR.; S.S.S.R.; DA. 1974; VOL. 17; NO 9; PP. 110-112; BIBL. 2 REF.Article

THE SILICON REPEATERBOUWER AG; BOUWHUIS G; VAN HEEK HF et al.1977; PHILIPS TECH. REV.; NLD; DA. 1977; VOL. 37; NO 11-12; PP. 330-333; BIBL. DISSEM.Article

FABRICATION OF HIGH RESOLUTION AND HIGH PRECISION METALLIC PHOTOMASK.MIMURA Y; OZAWA A.1975; REV. ELECTR. COMMUNIC. LAB.; JAP.; DA. 1975; VOL. 23; NO 11-12; PP. 1255-1263; BIBL. 5 REF.Article

PROGRESS IN IC PHOTOMASKINGMARKSTEIN H.1973; ELECTRON. PACKAG. PRODUCT.; U.S.A.; DA. 1973; VOL. 13; NO 5; PP. 31-44 (5 P.)Serial Issue

25th European Mask and Lithography Conference (12-15 January 2009, Dresden, Germany)Behringer, Uwe F. W.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, various pagings, isbn 978-0-8194-7770-5 0-8194-7770-2Conference Proceedings

THEORY AND PRACTICE OF IMAGE FORMATION BY THE PHOTOPROJECTION METHOD OF SUBMICRON PATTERNS.VAN DEN BERG HAM; RUIGROK JJM.1978; APPL. PHYS.; GERM.; DA. 1978; VOL. 16; NO 3; PP. 279-287; BIBL. 19 REF.Article

AN ECONOMIC PHOTOMASK PROCESSING SCHEME FOR THE SMALL LABORATORY.JAGGERS KA.1978; INTERNATION. J. ELECTR. ENGNG EDUC.; G.B.; DA. 1978; VOL. 15; NO 1; PP. 41-52; ABS. FR. ALLEM. ESP.; BIBL. 4 REF.Article

PATTERN GENERATOR FOR MANUFACTURING HIGHER CAPACITY, HIGHER DENSITY ICS.ICHINOSE W.1974; JAP. ELECTRON. ENGNG; JAP.; DA. 1974; NO 92; PP. 30-35Article

A LABORATORY PHOTOMASK PRODUCTION FACILITYGAYLORD TK.1972; REV. SCI. INSTRUM.; U.S.A.; DA. 1972; VOL. 43; NO 9; PP. 1268-1271; BIBL. 11 REF.Serial Issue

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