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Mask Cycle Time Reduction for Foundry ProjectsBALASINSKI, A.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81660K.1-81660K.8, 2Conference Paper

OPC Recipe Optimization Using Simulated AnnealingDESOUKY, Tamer.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 78233N.1-78233N.9, 2Conference Paper

Photomask technology 2011 (19-22 September 2011, Monterey, California, United States)Maurer, Wilhelm; Abboud, Frank E.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 2 vol, 2, isbn 978-0-8194-8791-9Conference Proceedings

Accurate prediction of 3D mask topography induced best focus variation in full-chip photolithography applicationsPENG LIU.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 816640.1-816640.8, 2Conference Paper

NP-completeness result for positive line-by-fill SADP processQIAO LI.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 78233P.-78233P.11, 2Conference Paper

Photomask technology 2010 (13-16 September 2010, Monterey, California, United States)Montgomery, M. Warren; Maurer, Wilhelm.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 1 vol, 2, isbn 978-0-8194-8337-9Conference Proceedings

Design for e-beam: design insights for direct-write maskless lithographyFUJIMURA, Aki.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 782315.1-782315.8, 2Conference Paper

Detecting measurement outliers - Remeasure efficientlyULLRICH, Albrecht.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 78232I.1-78232I.8, 2Conference Paper

Impact of mask topography and multilayer stack on high NA imaging of EUV masksRUOFF, Johannes.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 78231N.1-78231N.15, 2Conference Paper

Development status of EUVL mask blank and substrateHIRABAYASHI, Yusuke.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81663T.1-81663T.6, 2Conference Paper

Evaluation of a New Model of Mask Topography EffectsPIERRAT, Christophe.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 78230W.1-78230W.11, 2Conference Paper

Optimize the OPC control recipe with cost functionQINGWEI LIU; LIGUO ZHANG.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 78233M.10-78233M.6, 2Conference Paper

EUV mask defect mitigation through pattern placementBURNS, John; ABBAS, Mansoor.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 782340.1-782340.5, 2Conference Paper

Multiple Beam Mask Writers: An Industry Solution to the Write Time CrisisLITT, Lloyd C.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 78230A.1-78230A.6, 2Conference Paper

Application of signal reconstruction techniques to shot count reduction in simulation driven fracturingSHANGLIANG JIANG; ZAKHOR, Avideh.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81660U.1-81660U.14, 2Conference Paper

Challenges for 1X nm Device Fabrication using EUVL: Scanner and MaskARNOLD, William H.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81662I.1-81662I.9, 2Conference Paper

Mask Industry Assessment: 2011CHAN, Y. David.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81660D.1-81660D.13, 2Conference Paper

Determination of CD variance factors of 28nm 1x-Metal layer hotspots using experimental and simulated CD contoursWEISBUCH, François; SCHRAMM, Jessy.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81663G.1-81663G.16, 2Conference Paper

In-die Mask Registration Measurement with Existing Inspection ToolsTAMAMUSHI, Shuichi; TOUYA, Takanao.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 816639.1-816639.9, 2Conference Paper

Layout Decomposition and Mask Synthesis for Double and Triple Exposure With Image Reversal in a Single Photoresist LayerNDOYE, Coumba; ORLOWSKI, Marius.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81663D.1-81663D.7, 2Conference Paper

Scanning probe microscopy study of the tolerance of patterned EUV masks to megasonic cleaningSHIMOMURA, Takeya; RASTEGAR, Abbas.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81661N.1-81661N.10, 2Conference Paper

Cell Projection Use and Multi Column Approach For Throughput Enhancement of EBDW SystemYAMADA, Akio; OOAE, Yoshihisa.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 78231H.1-78231H.8, 2Conference Paper

Impact of Model-Based Fracturing on E-beam Proximity Effect Correction MethodologyPIERRAT, Christophe; BORK, Ingo.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 782313.1-782313.11, 2Conference Paper

Using custom features to check OPC model performanceABDO, Amr; VISWANATHAN, Ramya.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81663R.1-81663R.7, 2Conference Paper

DIRECT WRITE ELECTRON BEAM LITHOGRAPHY: A HISTORICAL OVERVIEWPFEIFFER, Hans C.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 782316.1-782316.6, 2Conference Paper

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