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Determination of the ionization energy of deep levels from DLTS dataVYVENKO, O. F; BAZLOV, N. V; TSELISHCHEV, S. L et al.Soviet physics. Semiconductors. 1990, Vol 24, Num 12, pp 1369-1371, issn 0038-5700, 3 p.Article

Capacitance and conductance deep level transient spectroscopy in field-effect transistorHAWKINS, I. D; PEAKER, A. R.Applied physics letters. 1986, Vol 48, Num 3, pp 227-229, issn 0003-6951Article

Method for measuring deep levels in thin silicon-on-insulator layer without any interface effectsKANG, H. S; AHN, C. G; KANG, B. K et al.Journal of the Electrochemical Society. 1998, Vol 145, Num 10, pp 3581-3585, issn 0013-4651Article

Deep level transient Fourier spectroscopy (DLTFS). A technique for the analysis of deep level propertiesWEISS, S; KASSING, R.Solid-state electronics. 1988, Vol 31, Num 12, pp 1733-1742, issn 0038-1101Article

System effects in double-channel gated-integrator-based deep-level transient spectroscopyBALASUBRAMANYAM, N; VIKRAM KUMAR.Journal of applied physics. 1988, Vol 64, Num 11, pp 6311-6314, issn 0021-8979Article

Capacitance switching method of eliminating false transients on the Boonton 72B capacitance meter in deep-level transient spectroscopy applicationsCHRISTOFOROU, N; LESLIE, J. D.Measurement science & technology (Print). 1991, Vol 2, Num 2, pp 127-130, issn 0957-0233Article

Problem of increasing the resolution of deep level transient spectroscopyCHIKHRAI, E. V; ABDULLIN, K. A; TYBULEWICZ, A et al.Soviet physics. Semiconductors. 1991, Vol 25, Num 4, pp 453-454, issn 0038-5700Article

Small-signal deep-level transient spectroscopy as a local probe of potential fluctuations due to electrically active defectsNADAZDY, V; THURZO, I.Semiconductor science and technology. 1997, Vol 12, Num 2, pp 157-165, issn 0268-1242Article

Analysis of the deep-level transient spectra by the method of mathematical modelingSHMATOV, A. A; TYBULEWICZ, A.Semiconductors (Woodbury, N.Y.). 1993, Vol 27, Num 8, pp 710-712, issn 1063-7826Article

A study of annealing effects on deep level profile distributions in GaAs by capacitive methodsBHUIYAN, A. S; MARTINEZ, A; ESTEVE, D et al.Thin solid films. 1988, Vol 162, pp 13-19, issn 0040-6090Article

An efficient technique for analyzing deep level transient spectroscopy dataDEVRIES, P. D; AZIM KHAN, A.Journal of electronic materials. 1989, Vol 18, Num 4, pp 543-547, issn 0361-5235, 5 p.Article

Hot-carrier-induced leep-level defects from gated-diode measurements on MOSFET'sSPECKBACHER, P; ASENOV, A; BOLLU, M et al.IEEE electron device letters. 1990, Vol 11, Num 2, pp 95-97, issn 0741-3106, 3 p.Article

Thermal instability of electron traps in InAs/GaAs quantum dot structuresKANIEWSKA, M; ENGSTRÖM, O; KACZMARCZYK, M et al.Journal of materials science. Materials in electronics. 2008, Vol 19, issn 0957-4522, S101-S106, SUP1Conference Paper

Iron and gold related defects in water quenched siliconALI, Akbar; MAJID, Abdul; SALEH, M. N et al.Journal of materials science. Materials in electronics. 2007, Vol 18, Num 4, pp 421-425, issn 0957-4522, 5 p.Article

A multipoint correlation method with binomial weighting coefficients for deep-level measurements in metal-oxide-semiconductor devicesDMOWSKI, K.Journal of applied physics. 1992, Vol 71, Num 5, pp 2259-2269, issn 0021-8979Article

Deep levels of thermal defects in high-resistivity ultrapure n-type siliconVERBITSKAYA, E. M; EREMIN, V. K; IVANOV, A. M et al.Soviet physics. Semiconductors. 1992, Vol 26, Num 11, pp 1101-1106, issn 0038-5700Article

Formation of deep levels in p-type Si as a result of etching with a gas in an atmosphere containing chlorineOMEL'YANOVSKAYA, N. M; ITAL'YANTSEV, A. G; KRASNOBAEV, L. YA et al.Soviet physics. Semiconductors. 1990, Vol 24, Num 11, pp 1267-1269, issn 0038-5700, 3 p.Article

Defect states in 2.0-MeV electron-irradiated phosphorus-doped siliconAWADELKARIM, O. O; MONEMAR, B.Journal of applied physics. 1989, Vol 65, Num 12, pp 4779-4788, issn 0021-8979, 10 p.Article

Stoichiometry related deep levels in undoped, semi-insulating GaAsDOBRILLA, P.Journal of applied physics. 1988, Vol 64, Num 12, pp 6767-6769, issn 0021-8979Article

Deep states associated with stacking faults in siliconLAHIJI, G. R; HAMILTON, B; PEAKER, A. R et al.Electronics Letters. 1988, Vol 24, Num 21, pp 1340-1342, issn 0013-5194, 3 p.Article

Deep levels in argon-implanted and annealed indium phosphideJI-KUI LUO; KIMURA, T; YUGO, S et al.Japanese journal of applied physics. 1987, Vol 26, Num 4, pp 582-587, issn 0021-4922, 1Article

Electronically stimulated deep-center reactions in electron-irradiated InP: comparison between experiment and recombination-enhancement theoriesSIBILLE, A.Physical review. B, Condensed matter. 1987, Vol 35, Num 8, pp 3929-3936, issn 0163-1829Article

Application de mécanique de la rupture au composite carbone-carbone bi-directionnelR'Mili, Mohamed; Fantozzi, Gilbert.1987, 221 p.Thesis

A DLTS study on plasma-hydrogenated n-type high-resistivity magnetic Cz siliconHUANG, Y. L; SIMOEN, E; CLAEYS, C et al.Journal of materials science. Materials in electronics. 2007, Vol 18, Num 7, pp 705-710, issn 0957-4522, 6 p.Conference Paper

Interpretation of transient capacitance spectra of A centers formed by pulsed photon bombardment of siliconBELYAVSKII, V. I; KAPUSTIN, Y. A; SVIRIDOV, V. V et al.Soviet physics. Semiconductors. 1992, Vol 26, Num 10, pp 1028-1029, issn 0038-5700Article

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