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Results 1 to 25 of 998

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Novolak design concept for high performance positive photoresistsHANABATA, M; OI, F; FURUTA, A et al.Polymer engineering and science. 1992, Vol 32, Num 20, pp 1494-1499, issn 0032-3888Conference Paper

Novolak resins with high thermal stability, high resolution, improved photospeed and etch characteristics for advanced photoresist applicationsKHANNA, D. N; DURHAM, D. L; SEYEDI, F et al.Polymer engineering and science. 1992, Vol 32, Num 20, pp 1500-1508, issn 0032-3888Conference Paper

Masking effect of photoactive compounds with various ballast molecules in novolak-naphthoquinonediazide positive photoresistsKISHIMURA, S; YAMAGUCHI, A; YAMADA, Y et al.Polymer engineering and science. 1992, Vol 32, Num 20, pp 1550-1555, issn 0032-3888Conference Paper

Quantitation of microstructure of novolac resins: Development of improved one- and two-dimensional NMR methodologiesROY, Debmalya; BASU, P. K; RAGHUNATHAN, P et al.Journal of applied polymer science. 2004, Vol 91, Num 4, pp 2096-2102, issn 0021-8995, 7 p.Article

Refroidissement et granulation des résines phénolformaldéhyde novolaqueEREMIN, A. T; PROSEKOVA, L. I; BUYANOV, O. N et al.Plastičeskie massy. 1987, Num 8, pp 37-39, issn 0554-2901Article

Resins influence on the Sensitivity of the CTP PlateCUNLIN ZHANG; JIADAN XUE; HELING ZHANG et al.SPIE proceedings series. 2005, pp 599-601, isbn 0-8194-5592-X, 3 p.Conference Paper

Atkivkohle aus Phenolharz mit Gepressten Olivenkernen als Füllstoff = Carbone activé préparé à partir de résine phénolique avec des noyaux d'olive pressés, comme charge = Activated carbon from phenolic resin with pressed olive stones as fillerSIMITZIS, J.Die Angewandte makromolekulare Chemie. 1987, Vol 153, pp 165-176, issn 0003-3146Article

Water absorption in novolac epoxy resins studied by positron annihilationMIURA, T; SUZUKI, T; OKI, Y et al.Journal de physique. IV. 1993, Vol 3, Num 4, pp 249-252, issn 1155-4339Conference Paper

Stategic synthesis of model novolac resinsDE BRUYN, P. J; LIM, A. S. C; LOONEY, M. G et al.Tetrahedron letters. 1994, Vol 35, Num 26, issn 0040-4039, 4481, 4627-4630 [5 p.]Article

Liant phénolformaldéhyde pour la préparation des moules-enveloppesMOROZ, S. A; PROSEKOVA, L. I; LYKOVA, G. P et al.Plastičeskie massy. 1987, Num 8, pp 44-46, issn 0554-2901Article

Adhesives from autohydrolysis bagasse lignin, a renewable resource. Part I : The physical properties of laminates made with phenolated lignin novolacsYSBRANDY, R. E; SANDERSON, R. D; GERISCHER, G. F. R et al.Holzforschung. 1992, Vol 46, Num 3, pp 249-252, issn 0018-3830Article

Evaluation of onium salt cationic photoinitiators as novel dissolution inhibitor for novolac resinITO, H; FLORES, E.Journal of the Electrochemical Society. 1988, Vol 135, Num 9, pp 2322-2327, issn 0013-4651Article

Modèle statistique de phénoplaste novolaque avec la cendre volante comme chargeZHEREBTSOV, I. P; GALDINA, I. YU; BAUMGARTEN, M. I et al.Himičeskaâ tehnologiâ. 1988, Num 5, pp 46-48, issn 0235-3482Article

Phenolic resins: 100 Years and still going strongPILATO, Louis.Reactive & functional polymers. 2013, Vol 73, Num 2, pp 270-277, issn 1381-5148, 8 p.Article

Crosslinking in halogen containing novolac electron beam negative resistsLAMPE, I. V; REINHARDT, M.Polymer engineering and science. 1995, Vol 35, Num 2, pp 180-183, issn 0032-3888Article

Differential technique in thermally stimulated depolariz-tion current measurementsTOPIC, M.Die Angewandte makromolekulare Chemie. 1988, Vol 163, pp 149-159, issn 0003-3146Article

Silylation of novolac based resists : influence of deep-ultraviolet induced crosslinkingDE BEECK, M. O; VAN DEN HOVE, L.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1992, Vol 10, Num 2, pp 701-714, issn 0734-211XArticle

Novel strategies for novolak resin fractionation : Consequences for advanced photoresist applicationsNARASIMHAN, Balaji; WANAT, Stanley F; RAHMAN, M. Dalil et al.Polymer engineering and science. 2000, Vol 40, Num 10, pp 2251-2261, issn 0032-3888Article

The molecular mechanism of Novolak resistsREISER, A.The Journal of imaging science and technology. 1998, Vol 42, Num 1, pp 15-22, issn 1062-3701Article

The deposition and adhesion of copper films on smooth polymer surfacesEISCH, J. J; LASKOWSKI, J; BIELINSKI, J et al.Journal of materials science letters. 1995, Vol 14, Num 2, pp 146-147, issn 0261-8028Article

Quantitative description of dissolution and dissolution inhibition in novolak and other phenolic resinsTUNG-FENG YEH; HSIAO-YIH SHIH; REISER, A et al.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1992, Vol 10, Num 2, pp 715-722, issn 0734-211XArticle

Antioxydants polymères. I. Oligomères d'alkylphénol linéaires pontés par un méthylène pont orthoABE, Y; MATSUMURA, S; ASAKURA, K et al.Yukagaku. 1986, Vol 35, Num 9, pp 751-755, issn 0513-398XArticle

Study on a Parameter to Express Glass-Forming Relationship of Phenolic-Novolac ResinKAI GUO; XIUFANG BIAN; ZHONGHAO LI et al.Polymer composites. 2012, Vol 33, Num 1, pp 52-57, issn 0272-8397, 6 p.Article

Study on curing of novolac epoxy resin : polyamide hardener systemsAGRAWAL, J. P; BHIDE, N. M; NAIDU, S. R et al.Journal of thermal analysis. 1993, Vol 39, Num 3, pp 351-358, issn 0368-4466Article

A composite sorbent based on bead cellulose and mercurated NovolacLENFELD, J; STAMBERG, J.Reactive polymers, ions exchangers, sorbents. 1987, Vol 5, Num 2, pp 133-140, issn 0167-6989Article

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