au.\*:("ORLINOV VI")
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BERECHNUNG DES SCHICHTWIDERSTANDES FUER DIE BOR-IMPLANTATION IN SILIZIUM = CALCUL DE LA RESISTANCE DE COUCHE POUR L'IMPLANTATION DU BORE DANS LE SILICIUMSPANGENBERG B; MLADENOV GM; ORLINOV VI et al.1980; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1980; VOL. 71; NO 1; PP. 1-6; ABS. ENG; BIBL. 9 REF.Article
EFFECT OF A SECONDARY PASSIVATING FILM OF SIO2 DEPOSITED BY CATHODE SPUTTERING ON THE PARAMETERS OF PLANAR TRANSISTORS.ORLINOV VI; GORANCHEV BG; HRISTOV DK et al.1975; BULG. J. PHYS.; BULG.; DA. 1975; VOL. 2; NO 3; PP. 236-246; ABS. RUSSE; BIBL. 7 REF.Article
MIKORSTRUKTURIERUNG VON FOTOSCHABLONEN MITTELS NICHTREAKTIVER HOCHFREQUENZIONENAETZUGN = MICROSTRUCTURATION DE MODELES PHOTO OU MILIEU DE CIRCUITS DE HAUTE FREQUENCE NON REACTIFSSPANGENBERG B; GORANCHEV BG; ORLINOV VI et al.1982; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1982; VOL. 87; NO 4; PP. 313-322; ABS. ENG; BIBL. 10 REF.Article