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A novel two component positive photoresist for deep UV lithographyPAWLOWSKI, G; DAMMEL, R; LINDLEY, C. R et al.Microelectronic engineering. 1990, Vol 11, Num 1-4, pp 491-495, issn 0167-9317Conference Paper

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Effects of selected histamine H₃ receptor antagonists on tele-methylhistamine levels in rat cerebral cortexYATES, S. L; TEDFORD, C. E; GREGORY, R et al.Biochemical pharmacology. 1999, Vol 57, Num 9, pp 1059-1066, issn 0006-2952Article

Chemical and lithographic aspects of organic deep UV BARCsPADMANABAN, M; KANG, W.-B; KIMURA, K et al.SPIE proceedings series. 1998, pp 206-218, isbn 0-8194-2778-0, 2VolConference Paper

Techniques to print sub-0.2 μm contact holesARAMAKI, K; HAMADA, T; LEE, D. K et al.SPIE proceedings series. 2000, pp 738-749, isbn 0-8194-3617-8Conference Paper

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The ALPS project release 1.3 : Open-source software for strongly correlated systemsALBUQUERQUE, A. F; ALET, F; IGARASHI, R et al.Journal of magnetism and magnetic materials. 2007, Vol 310, Num 2, pp 1187-1193, issn 0304-8853, 7 p., 2Conference Paper