Relatively low temperature synthesis of graphene by radio frequency plasma enhanced chemical vapor depositionQI, J. L; ZHENG, W. T; ZHENG, X. H et al.Applied surface science. 2011, Vol 257, Num 15, pp 6531-6534, issn 0169-4332, 4 p.Article

Field emission properties of vertically aligned thin-graphite sheets/graphite-encapsulated Cu particlesWANG, S. M; TIAN, H. W; MENG, Q. N et al.Applied surface science. 2012, Vol 258, Num 18, pp 6930-6937, issn 0169-4332, 8 p.Article

Synthesis and analysis of silicon nanowire below Si―Au eutectic temperatures using very high frequency plasma enhanced chemical vapor depositionHAMIDINEZHAD, Habib; WAHAB, Yussof; OTHAMAN, Zulkafli et al.Applied surface science. 2011, Vol 257, Num 21, pp 9188-9192, issn 0169-4332, 5 p.Article

Deposition of a-C:H films on UHMWPE substrate and its wear-resistanceDONG XIE; HENGJUN LIU; XINGRUI DENG et al.Applied surface science. 2009, Vol 256, Num 1, pp 284-288, issn 0169-4332, 5 p.Article

Selective deposition of silicon at room temperature using DC microplasmasWILSON, Chester G; GIANCHANDANI, Yogesh B.IEEE transactions on plasma science. 2007, Vol 35, Num 3, pp 573-577, issn 0093-3813, 5 p.Article

Low-temperature formation of silicon nitride films using pulsed-plasma CVD under near atmospheric pressureMATSUMOTO, M; INAYOSHI, Y; SUEMITSU, M et al.Applied surface science. 2008, Vol 254, Num 19, pp 6208-6210, issn 0169-4332, 3 p.Conference Paper

Phase transition of hydrogenated SiGe thin films in plasma-enhanced chemical vapor depositionSUN JIN YUN; JUN KWAN KIM; SEONG HYUN LEE et al.Thin solid films. 2013, Vol 546, pp 362-366, issn 0040-6090, 5 p.Conference Paper

Carbon nanotube growth from metallic nanoparticles deposited by pulsed-laser deposition on different substratesGAILLARD, Mireille; BOULMER-LEBORGNE, Chantal; SEMMAR, Nadjib et al.Applied surface science. 2012, Vol 258, Num 23, pp 9237-9241, issn 0169-4332, 5 p.Conference Paper

Broadband antireflection of silicon nanorod arrays prepared by plasma enhanced chemical vapor depositionDESHENG WANG; ZHIBO YANG; FEI LI et al.Applied surface science. 2011, Vol 258, Num 3, pp 1058-1061, issn 0169-4332, 4 p.Article

Hard and relaxed a-SiN_xH_y films prepared by PECVD: Structure analysis and formation mechanismXIANGDONG XU; QIONG HE; TAIJUN FAN et al.Applied surface science. 2013, Vol 264, pp 823-831, issn 0169-4332, 9 p.Article

Fabrication of carbon nanoflowers by plasma-enhanced chemical vapor depositionXIYING MA; BAOHE YUAN.Applied surface science. 2009, Vol 255, Num 18, pp 7846-7850, issn 0169-4332, 5 p.Article

Effect of growth temperature on the morphology and bonded states of SnO₂ nanobasketsANSARI, S. G; DAR, M. A; KIM, Young-Soon et al.Applied surface science. 2007, Vol 253, Num 10, pp 4668-4672, issn 0169-4332, 5 p.Article

Photoluminescence in microcrystalline silicon films grown from argon diluted silaneYOON, Jong-Hwan; LEE, Joon-Yong; PARK, Dong-Hyun et al.Journal of non-crystalline solids. 2004, Vol 338-40, pp 465-468, issn 0022-3093, 4 p.Conference Paper

Solid-state nuclear magnetic resonance spectroscopy of low dielectric constant films from pulsed hydrofluorocarbon plasmasLAU, Kenneth K. S; GLEASON, Karen K.Journal of the Electrochemical Society. 1999, Vol 146, Num 7, pp 2652-2658, issn 0013-4651Article

CNX (Carbon-Nano-eXit) : a unique carbon-nano-structure to be employed for excellent electron-emittersHIRAKIL, H; JING, N; ZHANG, H et al.Physica status solidi. A, Applications and materials science (Print). 2007, Vol 204, Num 9, pp 3072-3077, issn 1862-6300, 6 p.Conference Paper

Case of via resistance increase during thermal cycleDRIZLIKH, Sergei; FRANCIS, Thomas.IEEE / SEMI advanced semiconductor manufacturing conference. 2004, pp 162-164, isbn 0-7803-8312-5, 1Vol, 3 p.Conference Paper

Microwave PECVD of micro-crystalline siliconSOPPE, Wim; DEVILEE, Camile; BIEBERICHER, Arja et al.sans titre. 2002, pp 1174-1177, isbn 0-7803-7471-1, 4 p.Conference Paper

Comparative study on thermal and plasma enhanced CVD grown carbon nanotubes from gas phase prepared elemental and binary catalyst particlesSCHAFFEL, Franziska; SCHÜNEMANN, Christoph; BUCHNER, Bernd et al.Physica status solidi. B. Basic research. 2008, Vol 245, Num 10, pp 1919-1922, issn 0370-1972, 4 p.Conference Paper

Carbon nanosheets by microwave plasma enhanced chemical vapor deposition in CH₄-Ar systemZHIPENG WANG; SHOJI, Mao; OGATA, Hironori et al.Applied surface science. 2011, Vol 257, Num 21, pp 9082-9085, issn 0169-4332, 4 p.Article

Effect of H₂ dilution on the surface composition of plasma-deposited silicon films from SiH₄MARRA, D. C; EDELBERG, E. A; NAONE, R. L et al.Applied surface science. 1998, Vol 133, Num 1-2, pp 148-151, issn 0169-4332Article

Controlled synthesis of aligned carbon nanotube arrays on catalyst patterned silicon substrates by plasma-enhanced chemical vapor depositionWANG, H; LIN, J; HUAN, C. H. A et al.Applied surface science. 2001, Vol 181, Num 3-4, pp 248-254, issn 0169-4332Article

Study of the CVD process sequences for an improved control of the Bias Enhanced Nucleation step on siliconSAADA, S; ARNAULT, J. C; TRANCHANT, N et al.Physica status solidi. A, Applications and materials science (Print). 2007, Vol 204, Num 9, pp 2854-2859, issn 1862-6300, 6 p.Conference Paper

Surface characteristics and corrosion behaviour of WE43 magnesium alloy coated by SiC filmLI, M; CHENG, Y; ZHENG, Y. F et al.Applied surface science. 2012, Vol 258, Num 7, pp 3074-3081, issn 0169-4332, 8 p.Article

Radiofrequency plasma beam deposition of various forms of carbon based thin films and their characterizationVIZIREANU, S; STOIC, S. D; MITU, B et al.Applied surface science. 2009, Vol 255, Num 10, pp 5378-5381, issn 0169-4332, 4 p.Conference Paper

Correlation between silicon-nitride film stress and composition : XPS and SIMS analysesVANZETTI, L; BAROZZI, M; GIUBERTONI, D et al.Surface and interface analysis. 2006, Vol 38, Num 4, pp 723-726, issn 0142-2421, 4 p.Conference Paper