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CARACTERISTIQUES THERMIQUES DE SF6HIROOKA K; SHIRAI M.1980; NIPPON KAGAKU KAISHI; JPN; DA. 1980; VOL. 8; NO 2; PP. 165-169; ABS. ENG; BIBL. 8 REF.Article

EFFECTS OF AN ELECTRIC FIELD ON ELECTRON ATTACHMENT TO SF6 IN LIQUID ETHANE AND PROPANEBAKALE G; SCHMIDT WF.1981; Z. NATURFORSCH., A; ISSN 0340-4811; DEU; DA. 1981; VOL. 36; NO 8; PP. 802-806; BIBL. 28 REF.Article

THE ABLATION OF QUARTZ WALL BY SF6 UNDER RADIOFREQUENCY DISCHARGEBRUNO G; CAPEZZUTO P; CRAMAROSSA F et al.1980; J. FLUOR. CHEM.; CHE; DA. 1980; VOL. 16; NO 3; PP. 209-227; BIBL. 13 REF.Article

HIGH-PRESSURE REACTIONS OF SMALL COVALENT MOLECULES. XII: INTERACTION OF PF3 AND SF6HAGEN AP; TERRELL DL.1981; INORG. CHEM.; ISSN 0020-1669; USA; DA. 1981; VOL. 20; NO 4; PP. 1325-1326; BIBL. DISSEM.Article

RATE DETERMINATION FOR F+CH4 BY REAL-TIME COMPETITIVE KINETICSFASANO DM; NOGAR NS.1982; CHEMICAL PHYSICS LETTERS; ISSN 0009-2614; NLD; DA. 1982; VOL. 92; NO 4; PP. 411-414; BIBL. 17 REF.Article

LASER INDUCED SULFUR PARTICULATE FORMATION.LIN ST; RONN AM.1978; CHEM. PHYS. LETTERS; NLD; DA. 1978; VOL. 56; NO 3; PP. 414-418; BIBL. 9 REF.Article

THE RADIOLYSIS OF HYDROGEN SULPHIDE IN THE PRESENCE OF SULPHUR HEXAFLUORIDESZAMREJ I; FORYS M.1981; RADIOCHEM. RADIOANAL. LETT.; ISSN 0079-9483; CHE; DA. 1981; VOL. 47; NO 1-2; PP. 89-92; BIBL. 7 REF.Article

CO2 LASER-INDUCED CHEMILUMINESCENCE IN SF6/HYDROCARBON MIXTURES: DEPENDENCE ON LASER FLUENCENUTT GF; ORR BJ.1979; OPT. COMMUNIC.; NLD; DA. 1979; VOL. 29; NO 1; PP. 57-61; BIBL. 14 REF.Article

GAS PHASE FLUORINATION OF CO2 BY SF6MALATESTA V; HACKETT PA; WILLIS C et al.1981; J. CHEM. SOC., CHEM. COMMUN.; ISSN 0022-4936; GBR; DA. 1981; NO 5; PP. 247-248; BIBL. 3 REF.Article

THERMAL UNIMOLECULAR REACTIONS IN THE FALL-OFF REGIME: A MASTER EQUATION ANALYSISLAWRANCE WD; KNIGHT AEW; GILBERT RG et al.1980; CHEM. PHYS. LETT.; ISSN 0009-2614; NLD; DA. 1980; VOL. 76; NO 1; PP. 113-116; BIBL. 8 REF.Article

UTILISATION D'UN RAYONNEMENT CONTINU DE LASER AU CO2 POUR LA CONDUITE ET L'ETUDE DES REACTIONS THERMIQUES EN PHASE GAZEUSE DANS DES CONDITIONS RIGOUREUSEMENT HOMOGENESSAMSONOV YU N; PETROV AK; MOLIN YU N et al.1979; KINET. I KATALIZ; SUN; DA. 1979; VOL. 20; NO 1; PP. 17-23; BIBL. 16 REF.Article

THERMOCHEMICAL STUDIES OF THE BF2 RADICALLAU KH; HILDENBRAND DL.1980; J. CHEM. PHYS.; ISSN 0021-9606; USA; DA. 1980; VOL. 72; NO 9; PP. 4928-4931; BIBL. 15 REF.Article

INFRARED LASER PHOTOCHEMISTRY OF MATRIX-ISOLATED MOLECULESCROCOMBE RA; SMYRL NR; MAMANTOV G et al.1978; J. AMER. CHEM. SOC.; USA; DA. 1978; VOL. 100; NO 20; PP. 6526-6527; BIBL. 7 REF.Article

REACTIONS OF THERMAL 18F ATOMS WITH GASEOUS C6H6VAN DER LEY M; VAN HALTEREN BW; BRINKMAN GA et al.1983; RADIOCHEMICAL AND RADIOANALYTICAL LETTERS; ISSN 0079-9483; CHE; DA. 1983; VOL. 57; NO 1; PP. 55-62; BIBL. 11 REF.Article

LASER-INDUCED THERMAL DIFFUSIONARISAWA T; KATO M; NARUSE Y et al.1982; CHEM. PHYS. LETT.; ISSN 0009-2614; NLD; DA. 1982; VOL. 86; NO 1; PP. 91-94; BIBL. 11 REF.Article

REACTIONS OF CCL, CCL2 AND CCLF RADICALSTIEE JJ; WAMPLER FB; RICE WW JR et al.1980; CHEM. PHYS. LETTERS; NLD; DA. 1980; VOL. 73; NO 3; PP. 519-521; BIBL. 7 REF.Article

STEPWISE BOND DISSOCIATION ENERGIES IN SULPHUR HEXAFLUORIDEKIANG T; ZARE RN.1980; J. AMER. CHEM. SOC.; USA; DA. 1980; VOL. 102; NO 12; PP. 4024-4029; BIBL. 30 REF.Article

SOME CHEMICAL REACTIONS OF SULFUR HEXAFLUORIDE WITH SILICON CONTAINING SPECIES STIMULATED BY CW CO2 LASER RADIATIONPOLA J; ENGST P; HORAK M et al.1979; COLLECT CZECHOSL. CHEM. COMMUNIC.; CSK; DA. 1979; VOL. 44; NO 7; PP. 2092-2095; BIBL. 21 REF.Article

PARAMETRIC STUDY OF THE MULTIPLE PHOTON DISSOCIATION PROCESS OF SULFUR HEXAFLUORIDECOSMA V; DEAC I; MERCEA V et al.1981; REV. ROUM. PHYS.; ISSN 0035-4090; ROM; DA. 1981; VOL. 26; NO 3; PP. 261-266; BIBL. 16 REF.Article

THERMAL ELECTRON ATTACHMENT RATE TO CCL4, CHCL3 CH2CL2, AND SF6AYALA JA; WENTWORTH WE; CHEN ECM et al.1981; J. PHYS. CHEM.; ISSN 0022-3654; USA; DA. 1981; VOL. 85; NO 26; PP. 3989-3994; BIBL. 22 REF.Article

INFRARED LASER INDUCED REACTION OF SF6 WITH SILICON SURFACESCHUANG TJ.1980; J. CHEM. PHYS.; ISSN 0021-9606; USA; DA. 1980; VOL. 72; NO 11; PP. 6303-6304; BIBL. 5 REF.Article

CALCULATION OF THERMOPHYSICAL PROPERTIES OF REACTING MIXTURE OF SF6 AND CU IN THE RANGE OF TEMPERATURES 1000 TO 30000 K AND PRESSURES 0-01 TO 1 MPAKMONICEK V; HOFFER V.1980; ACTA TECH. C.S.A.V.; CSK; DA. 1980; VOL. 25; NO 3; PP. 278-302; BIBL. 20 REF.Article

APPROACHES TO DISSOCIATION PROCESSES OF SF6 BY ONE OR TWO T.E.A. CO2 LASERSDUPRE J; DUPRE MAQUAIRE J; PINSON P et al.1978; INFRARED PHYS.; GBR; DA. 1978; VOL. 18; NO 3; PP. 185-191; BIBL. 15 REF.Article

SELECTIVE DISSOCIATION OF SF6 BY PULSED CO2 LASER RADIATIONDEAC I; COSMA V; MERCEA V et al.1981; REV. ROUM. PHYS.; ISSN 0035-4090; ROM; DA. 1981; VOL. 26; NO 3; PP. 255-259; BIBL. 12 REF.Article

CO2 LASER-INDUCED FORMATION OF CARBONYL FLUORIDE AND SULFUR TETRAFLUORIDE FROM CARBON MONOXIDE AND SULFUR HEXAFLUORIDEPOLA J.1980; COLLECT. CZECH. CHEM. COMMUN.; ISSN 0010-0765; CSK; DA. 1980; VOL. 45; NO 11; PP. 2890-2894; BIBL. 18 REF.Article

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