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Results 1 to 25 of 284

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SYMMETRICAL AND ASYMMETRICAL X-RAY SECTION TOPOGRAPHS OF ION-IMPLANTED SILICON.LEFELD SOSNOWSKA M; ZIELINSKA ROHOZINSKA E.1976; PHYS. STATUS SOLIDI, A; ALLEM.; DA. 1976; VOL. 35; NO 1; PP. K1-K3; H.T. 2; BIBL. 12 REF.Article

AN ANNEALING STUDY OF SILICON IMPLANTED BY P+ IONSOREL V.1979; SCRIPTA FAC. SCI. NAT. UNIV. PURKYN. BRUN.; CSK; DA. 1979; VOL. 9; NO 3; PP. 29-40; ABS. RUS; BIBL. 14 REF.Article

IONIZATION ENHANCED ANNEALING IN P AND AS IMPLANTED SI LAYERS.SUSKI J; KRYNICKI J; RZEWUSKI H et al.1976; RAD. EFFECTS; G.B.; DA. 1976; VOL. 30; NO 2; PP. 125-126; BIBL. 4 REF.Article

THE THERMAL OXIDATION OF ION-IMPLANTED ZIRCONIUM = OXYDATION THERMIQUE DU ZR IMPLANTE D'IONSBENTINI GG; BERTI M; CARNERA A et al.1980; CORROS. SCI.; ISSN 0010-938X; GBR; DA. 1980; VOL. 20; NO 1; PP. 27-39; BIBL. 28 REF.Article

A SIMPLE APPROACH TO THE ANALYSIS OF ION COLLISION CASCADE IN SOLIDS BASED ON THE SHOCK WAVE MODELRAUSCHENBACH B; HOHMUTH K.1983; PHYSICA STATUS SOLIDI. (A). APPLIED RESEARCH; ISSN 0031-8965; DDR; DA. 1983; VOL. 75; NO 1; PP. 159-168; ABS. GER; BIBL. 34 REF.Article

FORMATION OF BLISTER DEFECTS IN ANODIC ELECTRODEPOSITED RESIN FILMS ON ALUMINIUM = BILDUNG VON BLASENDEFEKTEN BEIM ANODISCHEN ELEKTROPLATTIEREN VON KUNSTHARZFILMEN AUF ALUMINIUM = FORMATION DE SOUFFLURES LORS DU DEPOT ELECTROLYTIQUE ANODIQUE DE FILMS DE RESINE SYNTHETIQUE SUR DE L'ALUMINIUMBAKER BR.1981; MET. FINISH.; USA; DA. 1981-03; VOL. 79; NO 3; PP. 47-52; BIBL. 4 REF.Article

REACTIONS D'OXYDO-REDUCTION ET D'ACIDITE DANS LE DISULFATE DE POTASSIUM FONDU A 430OC. APPLICATION A LA CATALYSE D'OXYDATION DU BUTENE-1 PAR L'OXYGENE.DURAND A.1977; ; S.L.; DA. 1977; PP. (234P.); BIBL. 5 P. 1/2; (THESE DOCT. SCI. PHYS.; PIERRE ET MARIE CURIE PARIS VI)Thesis

CORRELATION BETWEEN STRUCTURAL DEFECTS AND OPTICAL PROPERTIES IN ION-IMPLANTED SILICONWESCH W; GLASER E; GOETZ G et al.1981; PHYS. STATUS SOLIDI (A), APPL. RES.; ISSN 0031-8965; DDR; DA. 1981; VOL. 65; NO 1; PP. 225-232; ABS. GER; BIBL. 17 REF.Article

ION BOMBARDMENT INDUCED AMORPHOUS LAYERS ON SINGLE CRYSTAL STAINLESS STEEL. A COMBINED RUTHERFORD BACKSCATTERING AND TRANSMISSION ELECTRON MICROSCOPY STUDY = COUCHES AMORPHES INDUITES PAR BOMBARDEMENT IONIQUE SUR DE L'ACIER INOXYDABLE MONOCRISTALLIN. ETUDE PAR RETRODIFFUSION DE RUTHERFORD ET MICROSCOPIE ELECTRONIQUE EN TRANSMISSION COMBINEESGRANT WA; WHITTON JL; WILLIAMS JS et al.1980; RAD. EFFECTS; GBR; DA. 1980; VOL. 49; NO 1-3; PP. 65-69; BIBL. 10 REF.Conference Paper

ETUDE DES REACTIONS D'OXYDO-REDUCTION DU TRICHLORURE DE PHOSPHORE ET DE L'OXYCHLORURE DE VANADIUMV) AVEC DES SILICAGELS RENFERMANT DU VANADIUM(V) ET DU PHOSPHORE(IIIMALYGIN AA; VOLKOVA AN; KOL'TSOV SI et al.1976; ZH. OBSHCH. KHIM.; S.S.S.R.; DA. 1976; VOL. 46; NO 10; PP. 2166-2169; BIBL. 12 REF.Article

ELECTRON SPIN AND CYCLOTRON RESONANCE OF LASER ANNEALED SILICONGOLTZENE A; MULLER JC; SCHWAB C et al.1980; REV. PHYS. APPL.; ISSN 0035-1687; FRA; DA. 1980; VOL. 15; NO 1; PP. 21-23; ABS. FRE; BIBL. 7 REF.Article

PRIMARY DEFECTS IN LOW-FLUENCE ION-IMPLANTED SILICONWANG KL.1980; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1980; VOL. 36; NO 1; PP. 48-50; BIBL. 11 REF.Article

THE INVESTIGATION OF RADIATION DAMAGE BY ELECTRON BEAM ABSORPTION MEASUREMENTS.FRITZSCHE CR; ROTHEMUND W.1978; APPL. PHYS.; DEU; DA. 1978; VOL. 16; NO 4; PP. 339-343; BIBL. 9 REF.Article

ION INDUCED CARBON CONTAMINATION AND RECOIL IMPLANTATION.NAEHRING FK; SCHMIDT A; SCHONEICH J et al.1977; PHYS. STATUS SOLIDI, A; ALLEM.; DA. 1977; VOL. 44; NO 2; PP. K141-K145; BIBL. 15 REF.Article

THEORETICAL OSCILLATOR STRENGTHS FOR SOME TRANSITIONS IN P(III), AS(III), SB(III) AND BI(III).MIGDALEK J.1976; J. QUANT. SPECTROSC. RAD. TRANSFER; G.B.; DA. 1976; VOL. 16; NO 5; PP. 385-388; BIBL. 7 REF.Article

THE ABSORPTION SPECTRUM OF DIATOMIC PHOSPHORUS BETWEEN 1370 AND 600 A.CARROLL PK; MITCHELL PI.1975; PROC. R. SOC. LONDON, A; G.B.; DA. 1975; VOL. 342; NO 1628; PP. 93-111; H.T. 2; BIBL. 22 REF.Article

DOPAGE DU SILICIUM PAR DES IONS DE PETITE ENERGIE A TEMPERATURE ELEVEE DU SUPPORTKACHURIN GA; LOVYAGIN RN; STEPINA NP et al.1981; FIZ. TEH. POLUPROVODN.; ISSN 0015-3222; SUN; DA. 1981; VOL. 15; NO 2; PP. 290-295; BIBL. 13 REF.Article

CORRELATION OF THE STRUCTURE AND ELECTRICAL PROPERTIES OF ION-IMPLANTED AND LASER-ANNEALED SILICONCULLIS AG; WEBBER HC; CHEW NG et al.1980; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1980; VOL. 36; NO 7; PP. 547-550; BIBL. 20 REF.Article

THE MECHANISMS OF IMPURITY REDISTRIBUTION ON LASER-ANNEALING OF ION-IMPLANTED SEMICONDUCTORSDVURECHENSKY AV; KACHURIN GA; ANTONENKO AK et al.1978; RAD. EFFECTS; GBR; DA. 1978; VOL. 37; NO 3-4; PP. 179-181; BIBL. 7 REF.Article

AMORPHISME DE MATERIAUX SEMICONDUCTEURS SOUS L'ACTION DES IONS DE HAUTE ENERGIEZHUKOVSKIJ PV; STEL'MAKH VF; TKACHEV VD et al.1978; FIZ. TEKH. POLUPROVODN.; SUN; DA. 1978; VOL. 12; NO 9; PP. 1812-1815; BIBL. 16 REF.Article

FORMATION DE DEFAUTS DANS L'ARSENIURE DE GALLIUM PAR IMPLANTATION D'IONS PHOSPHORETASHLYKOV IS.1980; FIZ. TEH. POLUPROVODN.; ISSN 0015-3222; SUN; DA. 1980; VOL. 14; NO 11; PP. 2146-2151; BIBL. 12 REF.Article

LASER IRRADIATION OF SILICON CONTAINING MISFIT DISLOCATIONSHOFKER WK; OOSTHOEK DP; EGGERMONT GEJ et al.1979; APPL. PHYS. LETTERS; USA; DA. 1979; VOL. 34; NO 10; PP. 690-692; BIBL. 11 REF.Article

VOIDS IN ION-IMPLANTED SILICON.ROMANOV SI; SMIRNOV LS.1978; RAD. EFFECTS; GBR; DA. 1978; VOL. 37; NO 1-2; PP. 121-126; BIBL. 43 REF.Article

INFRA RED PHOTODETACHMENT THRESHOLD MEASUREMENTS: LI- AND P-.FELDMANN D.1976; Z. PHYS. A; DTSCH.; DA. 1976; VOL. 277; NO 1; PP. 19-25; BIBL. 27 REF.Article

PRODUCTION AND DECAY OF DOUBLE L VACANCIES IN ARGON AND PHOSPHORUS.RUDD ME; FASTRUP B; DAHL P et al.1973; PHYS. REV., A; U.S.A.; DA. 1973; VOL. 8; NO 1; PP. 220-225; BIBL. 14 REF.Article

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