A SIMPLE MASK ALIGNER AND PRINTING FRAME FOR CONFORMABLE PHOTOMASK LITHOGRAPHYSMILOWITZ B; LANG RJ.1980; IEEE TRANS. ELECTRON DEVICES; ISSN 0018-9383; USA; DA. 1980; VOL. 27; NO 11; PP. 2165-2167; BIBL. 3 REF.Article

PHOTOMASK MANUFACTURING. REQUIREMENTS, CAPABILITIES AND TRENDSJACOBSON DS.1979; CIRCUITS MANUF.; USA; DA. 1979; VOL. 19; NO 10; PP. 46-58; (6 P.); BIBL. 1 REF.Article

THEORY AND PRACTICE OF IMAGE FORMATION BY THE PHOTOPROJECTION METHOD OF SUBMICRON PATTERNS.VAN DEN BERG HAM; RUIGROK JJM.1978; APPL. PHYS.; GERM.; DA. 1978; VOL. 16; NO 3; PP. 279-287; BIBL. 19 REF.Article

AN ECONOMIC PHOTOMASK PROCESSING SCHEME FOR THE SMALL LABORATORY.JAGGERS KA.1978; INTERNATION. J. ELECTR. ENGNG EDUC.; G.B.; DA. 1978; VOL. 15; NO 1; PP. 41-52; ABS. FR. ALLEM. ESP.; BIBL. 4 REF.Article

UNTERSUCHUNG DER DECKUNGSGENAUIGKEIT ZWEIER AUFEINANDERFOLGENDER FOTOSCHABLONENAUF TESTSCH EIBEN = ETUDE DE LA PRECISION DE RECOUVREMENT DE DEUX MASQUES PHOTOGRAPHIQUES SUCCESSIFS SUR UNE LAME D'ESSAIPAUER M; HUSZKA Z; PUSKAS L et al.1979; NACHR.-TECH., ELEKTRON.; DDR; DA. 1979; VOL. 29; NO 5; PP. 214-217Article

AUTOMATED PHOTOMASK INSPECTION.NOVOTNY DB; CIARLO DR.1978; SOLIDE STATE TECHNOL.; USA; DA. 1978; VOL. 21; NO 5; PP. 51-76 (10P.); BIBL. 32 REF.Article

THE SILICON REPEATERBOUWER AG; BOUWHUIS G; VAN HEEK HF et al.1977; PHILIPS TECH. REV.; NLD; DA. 1977; VOL. 37; NO 11-12; PP. 330-333; BIBL. DISSEM.Article

COMPUTER-AIDED CCD/LSI PHOTOMASK LAYOUT AND DOCUMENTATION TECHNIQUE USING NESTED CELLSGEER RG.1980; SOLID STATE TECHNOL.; USA; DA. 1980; VOL. 23; NO 5; PP. 86-90; BIBL. 2 REF.Article

ONE-STEP REPAIR OF TRANSPARENT DEFECTS IN HARD-SURFACE PHOTOLITHOGRAPHIC MASKS VIA LASER PHOTODEPOSITIONEHRLICH DJ; OSGOOD RM JR; SILVERSMITH DJ et al.1980; IEEE ELECTRON DEVICE LETT.; USA; DA. 1980; VOL. 1; NO 6; PP. 101-103; BIBL. 5 REF.Article

A PRODUCTION-COMPATIBLE MICROELECTRONIC TEST PATTERN FOR EVALUATING PHOTOMASK MISALIGNMENTRUSSELL TJ; MAXWELL DA.1979; NATION. BUR. STAND., SPEC. PUBL.; USA; DA. 1979; NO 400-51; 31 P.; BIBL. DISSEM.Serial Issue

AUTOMATED EQUIPMENT FOR 100% INSPECTION OF PHOTOMASKS.LEVY K.1978; SOLIDE STATE TECHNOL.; USA; DA. 1978; VOL. 21; NO 5; PP. 60-71 (8P.); BIBL. 5 REF.Article

AUTOMATIC ALIGNMENT CONSIDERATIONS IN WAFER FABRICATION.DENNING PA.1976; SOLID STATE TECHNOL.; U.S.A.; DA. 1976; VOL. 19; NO 5; PP. 43-47; BIBL. 3 REF.Article

AUTOMATIC PHOTOMASK INSPECTION BECOMES A REALITYUCHIYAMA Y.1980; J. ELECTRON. ENGNG; JPN; DA. 1980; VOL. 17; NO 159; PP. 42-44; BIBL. 6 REF.Article

PHOTOMASK LINEWIDTH MEASUREMENTSWYT SA; ROSBERRY FW; NYYSSONEN D et al.1978; CIRCUITS MANUF.; USA; DA. 1978; VOL. 18; NO 9; PP. 20-26; (4 P.)Article

IMPROVED TECHNIQUES FOR PROXIMITY MASK ALIGNMENT.CLARK KG; OKUTSU K.1975; MICROELECTRONICS; G.B.; DA. 1975; VOL. 6; NO 4; PP. 51-59; BIBL. 10 REF.Article

TECHNOLOGICAL IMPLICATIONS IN THE PHOTOMASKING PROCESS.O'MALLEY AJ.1975; SOLID STATE TECHNOL.; U.S.A.; DA. 1975; VOL. 18; NO 6; PP. 40-45Article

DESIGN OF A PATTERN ON A PHOTOMASK-LIKE PHYSICAL STANDARD FOR EVALUATION AND CALIBRATION OF LINEWIDTH-MEASURING SYSTEMS.SWYT DA.1978; SOLID STATE TECHNOL.; U.S.A.; DA. 1978; VOL. 21; NO 1; PP. 35-42; BIBL. 10 REF.Article

YIELD-AREA ANALYSIS: PART II - EFFECTS OF PHOTOMASK ALIGNMENT ERRORS ON ZERO YIELD LOCIKIM CS; HAM WE.1978; R.C.A. REV.; USA; DA. 1978; VOL. 39; NO 4; PP. 565-576; BIBL. 9 REF.Article

MASK DEFECT INSPECTION. MANUAL SAMPLING TECHNIQUES AND AUTOMATIC 100% INSPECTION.LEVY K; SANDLAND P.1977; CIRCUITS MANUF.; U.S.A.; DA. 1977; VOL. 17; NO 12; PP. 28-31; BIBL. 5 REF.Article

THIN FILM ANALYSIS OF PHOTOMASK COATINGSMCGUIRE GE; METZGAR TD; SHAH RV et al.1979; J. ELECTROCHEM. SOC.; USA; DA. 1979; VOL. 126; NO 4; PP. 1075-1078; BIBL. 19 REF.Article

MEASURING TECHNOLOGY OF THE MACROPATTERNS.YOSHIDA S.1978; BULL. JAP. SOC. PRECIS. ENGNG; JAP.; DA. 1978; VOL. 12; NO 1; PP. 10-13Article

GLAS-MIKROPLATTEN WERDEN FUER EISENOXID-FOTOPLATTEN VERWENDET. = UTILISATION DES MICROPLAQUES DE VERRE POUR DES PLAQUES PHOTOGRAPHIQUES A L'OXYDE DE FER1977; MICROTECNIC; SUISSE; DA. 1977; NO 1; PP. 7Article

LE PHOTOREPETEUR MONO-OBJECTIF UNIVERSEL UER, UN NOUVEL APPAREIL PHOTOLITHOGRAPHIQUE DE PRECISION DU VEB CARL ZEISS JENA.DEGENKOLBE E; GARTNER W; GUTCKE R et al.1977; REV. IENA; ALLEM.; DA. 1977; VOL. 17; NO 4; PP. 168-174; BIBL. 2 REF.Article

EMULSION MASK PROCESSING TECHNIQUES.LASKY D.1975; SOLID STATE TECHNOL.; U.S.A.; DA. 1975; VOL. 18; NO 6; PP. 46-50; BIBL. 5 REF.Article

APPLICATION OF PHOTOLITHOGRAPHY TO DEVELOPMENT OF PHOTOCATHODES FOR ELECTRON OPTICAL IMAGING DEVICESSINGH S; RANGARAJAN LM; PISHORADY TU et al.1980; J. INSTIT. ELECTRON. TELECOMMUNIC. ENGRS; IND; DA. 1980; VOL. 26; NO 3; PP. 190-191; BIBL. 4 REF.Article