Pascal and Francis Bibliographic Databases

Help

Search results

Your search

kw.\*:("PHOTOLITHOGRAPHIE")

Document Type [dt]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Publication Year[py]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Discipline (document) [di]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Language

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Author Country

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Origin

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Results 1 to 25 of 9374

  • Page / 375
Export

Selection :

  • and

SMALL-ANGLE DIFFUSING SCREENS FOR PHOTOLITHOGRAPHIC CAMERA ILLUMINATION SYSTEMSKING MC; BERRY DH.1972; APPL. OPT.; U.S.A.; DA. 1972; VOL. 11; NO 11; PP. 2460-2462; BIBL. 2 REF.Serial Issue

PHOTOLITHOGRAPHIE UV DE COURTE LONGUEUR D'ONDE A BASE DE DECHARGES PLASMODYNAMIQUES DE GRANDE INTENSITE D'UN COMPRESSEUR DE MAGNETO-PLASMAKOZLOV NP; KAMRUKOV AS; KASHNIKOV GN et al.1983; ZURNAL TEHNICESKOJ FIZIKI; ISSN 0044-4642; SUN; DA. 1983; VOL. 53; NO 3; PP. 601-603; BIBL. 5 REF.Article

ADVANCED 1X PROJECTION PHOTOLITHOGRAPHYHAKEY M; STRAUB W.1982; J. ELECTRON. MATER.; ISSN 0361-5235; USA; DA. 1982; VOL. 11; NO 4; PP. 813-830; BIBL. 7 REF.Article

PHOTOFABRICATION TECHNOLOGY FOR MICROELECTRONICS.POSSLEY G.1974; ELECTR. PACKAG. PRODUCT.; U.S.A.; DA. 1974; VOL. 14; NO 7; PP. 180-188 (6P.); BIBL. 8 REF.Article

MOLECULAR WEIGHT ANALYSIS OF THE CONDENSATION PRODUCT OF 4-DIAZO-DIPHENYLAMINE BISULFATE AND FORMALDEHYDESHIMAZU KI.1973; PHOTOGR. SCI. ENGNG; U.S.A.; DA. 1973; VOL. 17; NO 1; PP. 33-37; BIBL. 13 REF.Serial Issue

IMPLEMENTATION OF PHOTOMASKS FOR GUIDED WAVE OPTICAL COMPONENTS BY A STEP- AND -REPEAT PROCESSHOFFMANN D; LANGMANN U; OPPERMANN W et al.1981; FIBER INTEGR. OPT.; ISSN 0146-8030; USA; DA. 1981; VOL. 3; NO 4; PP. 401-411; BIBL. 5 REF.Article

PROJECTION LITHOGRAPHY WITH HIGH NUMERICAL APERTURE OPTICSOLDHAM WG; NEUREUTHER AR.1981; SOLID STATE TECHNOL.; ISSN 0038-111X; USA; DA. 1981; VOL. 24; NO 5; PP. 106-140; 7 P.; BIBL. 5 REF.Article

THE IMPACT OF PHOTORESIST ON IMAGE SIZEROTTMAN HR.1982; J. APPL. PHOTOGR. ENG.; ISSN 0098-7298; USA; DA. 1982; VOL. 8; NO 2; PP. 101-104; BIBL. 1 REF.Article

LASER IMAGING OF ELECTRONIC CIRCUITRY: AN ALTERNATIVE TO THE PHOTOMASK PROCESS1981; INSUL., CIRCUITS; ISSN 0020-4544; USA; DA. 1981; VOL. 27; NO 10; PP. 112Article

RECTANGULAR-PROFILE DIFFRACTION GRATING FROM SINGLE-CRYSTAL SILICONJOSSE M; KENDALL DL.1980; APPL. OPT.; USA; DA. 1980; VOL. 19; NO 1; PP. 72-76; BIBL. 11 REF.Article

FABRICATION TECHNIQUES FOR MICRODEVICES IN SOFT SUPERCONDUCTORSBERCHIER JL; SANCHEZ DH.1978; REV. SCI. INSTRUM.; USA; DA. 1978; VOL. 49; NO 10; PP. 1452-1459; BIBL. 34 REF.Article

TRENDS IN SEMICONDUCTOR PHOTOLITHOGRAPHY.MARKSTEIN HW.1977; ELECTRON. PACKAG. PRODUCT.; U.S.A.; DA. 1977; VOL. 17; NO 3; PP. 25-33 (6P.); BIBL. 2 REF.Article

FABRICATION OF BUBBLE MEMORY CHIPS.TAKAHASHI M; NISHIDA H; KASAI T et al.1974; I.E.E.E. TRANS. MAGNET.; U.S.A.; DA. 1974; VOL. 10; NO 4; PP. 1067-1071; BIBL. 5 REF.Article

OPTICAL LIMITATION IN FINE PATTERN PHOTOLITHOGRAPHY.WADA Y; UEHARA K.1974; JAP. J. APPL. PHYS.; JAP.; DA. 1974; VOL. 13; NO 12; PP. 2014-2018; BIBL. 9 REF.Article

PHOTOLITHOGRAPHIC MASK ALIGNMENT USING MOIRE TECHNIQUESKING MC; BERRY DH.1972; APPL. OPT.; U.S.A.; DA. 1972; VOL. 11; NO 11; PP. 2455-2459; BIBL. 7 REF.Serial Issue

OPTICAL LITHOGRAPHY: THE IMPLICATIONS OF THE ELECTROMAGNETIC FIELD THEORYVAN DEN BERG HAM; VAN DEN BERG PM.1981; IEEE TRANS. ELECTRON DEVICES; ISSN 0018-9383; USA; DA. 1981; VOL. 28; NO 12; PP. 1535-1543; BIBL. 25 REF.Article

OBJECTIFS POUR LA PHOTOLITHOGRAVURE DE PROJECTIONGRAMMATIN AP; LARINA RM; GORBUNOVA VA et al.1976; OPT.-MEKH. PROMYSHL.; S.S.S.R.; DA. 1976; NO 11; PP. 60-69; BIBL. 26 REF.Article

PRACTICAL AUTOMATION FOR PHOTOLITHOGRAPHIC WAFER PROCESSING.HARRELL S.1974; SOLID STATE TECHNOL.; U.S.A.; DA. 1974; VOL. 17; NO 8; PP. 47-49; BIBL. 1 REF.Article

THE SEMICONDUCTOR IN MANUFACTURECLARK KG.1972; MICROELECTRONICS; G.B.; DA. 1972; VOL. 4; NO 3; PP. 31-36Serial Issue

KOSTENOPTIMIERUNG BEIM VERSCHLEISSMATERIAL AM BEISPIEL DER SCHABLONENNUTZUNG IN DER FOTOLITHOGRAFIE = L'OPTIMALISATION DES FRAIS DU MATERIEL D'USURE PRESENTEE A L'EXEMPLE DE L'UTILISATION DE MASQUES DANS LA PHOTOLITHOGRAPHIEBALARIN M.1982; NACHRICHTENTECHNIK. ELEKTRONIK; ISSN 0323-4657; DDR; DA. 1982; VOL. 32; NO 12; PP. 490-494; BIBL. 2 REF.Article

BELEUCHTUNGSOPTIK IN FOTOLITHOGRAPHISCHEN BELICHTUNGSEINHEITEN = SYSTEME OPTIQUE D'ECLAIRAGE DANS LES DISPOSITIFS D'EXPOSITION EN PHOTOLITHOGRAPHIELEIPOLD H; SYMANOWSKI C.1980; FEINGERAETETECHNIK; ISSN 0014-9683; DDR; DA. 1980; VOL. 29; NO 12; PP. 561-564; ABS. ENG/FRE; BIBL. 6 REF.Article

SINGLE-STEP OPTICAL LIFT-OFF PROCESSHATZAKIS M; CANAVELLO BS; SHAW JM et al.1980; IBM J. RES. DEVELOP.; ISSN 0018-8646; USA; DA. 1980; VOL. 24; NO 4; PP. 452-460; BIBL. 19 REF.Article

UV EXPOSURE SYSTEMS FOR PRINTED CIRCUIT MANUFACTURE.1978; CIRCUITS MANUF.; U.S.A.; DA. 1978; VOL. 18; NO 5; PP. 45-48Article

RESINE PHOTOSENSIBLE NEGATIVE A BASE DE PLEINOMERES DE CYCLOHEXADIENE-1,3 POUR L'OBTENTION DE RESEAUX OPTIQUES ET D'ECHELLES PAR UNE METHODE DE PHOTOLITHOGRAPHIENAUMOVA SF; FLEJSHER AI; YURINA O YU et al.1978; OPT.-MEKH. PROMYSHL.; S.S.S.R.; DA. 1978; VOL. 45; NO 2; PP. 40-41; BIBL. 5 REF.Article

NEW GUNN-EFFECT THREE-TERMINAL PLUSE REGENERATOR BY PLANAR PHOTOLITHOGRAPHY.HARIU T; HARTNAGEL HL.1974; INTERNATION. J. ELECTRON.; G.B.; DA. 1974; VOL. 37; NO 4; PP. 451-455; BIBL. 3 REF.Article

  • Page / 375