REMOVAL OF PHOTORESIST FILM RESIDUES FROM WAFER SURFACESPETERS DA; DECKERT CA.1979; J. ELECTROCHEM. SOC.; USA; DA. 1979; VOL. 126; NO 5; PP. 883-886; BIBL. 7 REF.Article

CHARACTERIZATION OF POSITIVE RESIST DEVELOPMENTO'TOOLE MM; GRANDE WJ.1981; ELECTRON DEVICE LETT.; ISSN 0193-8576; USA; DA. 1981; VOL. 2; NO 12; PP. 311-313; BIBL. 8 REF.Article

MECHANICAL CLEANING OF PC BOARDSPELTON C.1979; ELECTRON. PACKAG. PRODUCT.; USA; DA. 1979; VOL. 19; NO 7; PP. 29-30Article

RELIABLE FABRICATION OF PWBS WITH DRY FILM PHOTORESISTSWOPSCHALL RH.1983; ELECTRI.ONICS; ISSN 512907; USA; DA. 1983; VOL. 29; NO 4; PP. 33-37Article

PHOTOETCHING RESEARCH AT THE CRANFIELD INSTITUTE OF TECHNOLOGY: A REVIEWSTEVENS GWW.1982; J. APPL. PHOTOGR. ENG.; ISSN 0098-7298; USA; DA. 1982; VOL. 8; NO 2; PP. 90-100; BIBL. 26 REF.Article

THE IMPACT OF PHOTORESIST ON IMAGE SIZEROTTMAN HR.1982; J. APPL. PHOTOGR. ENG.; ISSN 0098-7298; USA; DA. 1982; VOL. 8; NO 2; PP. 101-104; BIBL. 1 REF.Article

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DRY FILMS FOR PC BOARD IMAGINGMARKSTEIN HW.1979; ELECTRON. PACKAG. PRODUCT.; USA; DA. 1979; VOL. 19; NO 12; PP. 39-46; (5 P.); BIBL. 2 REF.Article

FREE-STANDING PHOTORESIST FILMS FOR MICROLITHOGRAPHYLITTLE JW; CALLCOTT TA; ARAKAWA ET et al.1980; REV. SCI. INSTRUM.; ISSN 0034-6748; USA; DA. 1980; VOL. 51; NO 11; PP. 1581-1583; BIBL. 3 REF.Article

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REALISATION D'HOLOGRAMMES SUR LE PHOTORESIST POSITIF FP-383YASTREBOV AA; KOZENKOV VM; BARACHEVSKIJ VA et al.1980; ZH. NAUCHN. PRIKL. FOTOGR. KINEMATOGR.; SUN; DA. 1980; VOL. 25; NO 2; PP. 137-139; BIBL. 4 REF.Article

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TITANIUM DIOXIDE FILMS TO IMPROVE PHOTORESIST ADHESIONMARINACE JC; MCGIBBON RC.1982; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1982; VOL. 129; NO 10; PP. 2389-2390; BIBL. 3 REF.Article

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PHOTORESIST ADHESION FAILURE ON SIO₂ FILMS.1978; CIRCUITS MANUF.; USA; DA. 1978-06; PP. 22-28; (4 P.); BIBL. 4 REF.Article

HIGH TEMPERATURE RESISTANT FILM PATTERNS FROM PHOTOREACTIVE POLYMERIC PRECURSORSRUBNER R; KUEHN E; KOLODZIEJ G et al.1977; COLLOQUE INTERNATIONAL SUR LA MICROLITHOGRAPHIE, MICROELECTRONIQUE, OPTIQUE; FRA; DA. 1977; DGRST-7771946; PP. 255-259; ABS. FRE; BIBL. 8 REF.Conference Paper

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FACTORS AFFECTING ADHESION OF LITHOGRAPHIC MATERIALSMITTAL KL.1979; SOLID STATE TECHNOL.; USA; DA. 1979; VOL. 22; NO 5; PP. 89-100; (8 P.); BIBL. 27 REF.Article

MODELISATION DES RESINES POSITIVES ET APPLICATION A LA PROJECTION DE STRUCTURES FINES SUR SILICIUMBROCHET A; DUBROEUQ G.1977; COLLOQUE INTERNATIONAL SUR LA MICROLITHOGRAPHIE, MICROELECTRONIQUE, OPTIQUE; FRA; DA. 1977; DGRST-7771946; PP. 239-248; ABS. ENG; BIBL. 11 REF.Conference Paper

MODELE POUR LA DISSOLUTION DES PHOTORESISTS EN COUCHES MONOMOLECULAIRESBARRAUD ANDRE.1981; ; FRA; DA. 1981; CEA/N-2183; 18 P.; 30 CM; BIBL. 10 REF.Report

ERZEUGUNG OPTISCHER BAUELEMENTE MIT KOHAERENTER STRAHLUNG UND IHRE ANWENDUNGEN = L'OBTENTION DE COMPOSANTS OPTIQUES A L'AIDE DE LA LUMIERE COHERENTE ET LEURS APPLICATIONS. I. LENTILLES A RESEAU ZONEREICHEL W.1979; FEINGERAETETECHNIK; DDR; DA. 1979; VOL. 28; NO 2; PP. 60-62; BIBL. 46 REF.Article