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Results 1 to 25 of 75

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REPLICATION OF 175-A LINES AND SPACES IN POLYMETHYLMETHACRYLATE USING X-RAY LITHOGRAPHYFLANDERS DC.1980; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1980; VOL. 36; NO 1; PP. 93-96; BIBL. 18 REF.Article

INFLUENCE DE LA PRESSION SUR LES PROPRIETES D'ELECTRET DES DIELECTRIQUES POLAIRESTUTOVAN V; SCUTARU V.1971; AN. STI. UNIV. "AL. I. CUZA" IASI, 1B; ROMAN.; DA. 1971; VOL. 17; NO 2; PP. 121-127; ABS. ROUM.; BIBL. 5 REF.Serial Issue

THERMALLY STIMULATED DISCHARGE CURRENTS IN TUBULAR MAGNETOELECTRETS OF POLYMETHYL METHACRYLATERUDRA KANT SRIVASTAVA; QURESHI MS; BHATNAGAR CS et al.1978; JAP. J. APPL. PHYS.; JPN; DA. 1978; VOL. 17; NO 9; PP. 1537-1542; BIBL. 7 REF.Article

A CLOSER LOOK AT LASER DAMAGE IN PMMA.FELIX MP; NACHBAR W.1974; APPL. PHYS. LETTERS; U.S.A.; DA. 1974; VOL. 25; NO 1; PP. 25-27; BIBL. 5 REF.Article

THE BEHAVIOUR OF HOMOCHARGE IN PERSPEX THERMOELECTRETS.NATARAJAN S.1975; JAP. J. APPL. PHYS.; JAP.; DA. 1975; VOL. 14; NO 8; PP. 1145-1147; BIBL. 9 REF.Article

TIME EVOLUTION OF DEVELOPED CONTOURS IN POLY-(METHYL METHACRYLATE) ELECTRON RESIST.GREENEICH JS.1974; J. APPL. PHYS.; U.S.A.; DA. 1974; VOL. 45; NO 12; PP. 5264-5268; BIBL. 16 REF.Article

HARD RADIATION EFFECTS IN X-RAY LITHOGRAPHYZNAMIROWSKI Z; CZARCZYNSKI W.1980; ELECTRON. LETTERS; GBR; DA. 1980; VOL. 16; NO 5; PP. 178-179; BIBL. 2 REF.Article

EXPLANATION OF THE TWO-RING DIFFRACTION PHENOMENON OBSERVED BY MORAN AND KAMINOW.FORSHAW MRB.1974; APPL. OPT.; U.S.A.; DA. 1974; VOL. 13; NO 1; PP. 2; BIBL. 5 REF.Article

OPTIMIZATION OF EXPOSURE AND DEVELOPMENT PARAMETERS FOR ELECTRON-BEAM-WRITTEN PMMA STRUCTURESZEITLER HU; HIEKE EK.1979; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1979; VOL. 126; NO 8; PP. 1430-1432; BIBL. 11 REF.Article

VARIATION OF MAGNETIC SUSCEPTIBILITY OF PERSPEX MAGNETOELECTRETS.MANIKA BANDOPADHYAYA; KHARE ML.1975; INDIAN J. PURE APPL. PHYS.; INDIA; DA. 1975; VOL. 13; NO 1; PP. 19-22; BIBL. 11 REF.Article

DEEP UV LITHOGRAPHY.BURN JENG LIN.1975; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1975; VOL. 12; NO 6; PP. 1317-1320; BIBL. 8 REF.; (SYMP. ELECTRON ION PHOTON BEAM TECHNOL. 13. PROC.; COLORADO SPRINGS; 1975)Conference Paper

LITHIUM-ION-BEAM EXPOSURE OF PMMA-LAYERS WITHOUT PROXIMITY-EFFECTSPEIDEL R; BEHRINGER U.1980; OPTIK; DEU; DA. 1980; VOL. 54; NO 5; PP. 439-444; ABS. ENG; BIBL. 3 REF.Article

MEASUREMENT OF LATERAL COMPRESSIVE STRESSES UNDER SCHOCK LOADINGGUPTA YM; KEOUGH DD; HENLEY D et al.1980; APPL. PHYS. LETTERS; ISSN 0003-6951; USA; DA. 1980; VOL. 37; NO 4; PP. 395-397; BIBL. 16 REF.Article

FINE PATTERN FABRICATION USING ION BEAM ETCHINGFURUYA S; KOBAYASHI K; YAMAMOTO S et al.1979; FUJITSU SCI. TECH. J.; JPN; DA. 1979; VOL. 15; NO 4; PP. 111-120; BIBL. 9 REF.Article

SURFACE RELIEF STRUCTURES WITH LINEWIDTHS BELOW 2000 A.FLANDERS DC; SMITH HI; LEHMANN HW et al.1978; APPL. PHYS. LETTERS; U.S.A.; DA. 1978; VOL. 32; NO 2; PP. 112-114; BIBL. 14 REF.Article

DOSIMETRES PLASTIQUES POUR RAYONNEMENTS IONISANTS DE HAUTE ENERGIEKARADZHOV AG; TODOROV VS; TUSHLEKOVA KN et al.1975; JADRE. ENERG.; BALG.; DA. 1975; VOL. 2; PP. 106-110; ABS. RUSSE ANGL.; BIBL. 10 REF.Article

FABRICATION OF THIN FILM INTERDIGITAL TRANSDUCERS FOR SURFACE ACOUSTIC WAVE DEVICES OPERATING AT GIGAHERTZ FREQUENCIESSEILER DG; CAMPBELL CK.1979; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1979; VOL. 62; NO 1; PP. 109-114; BIBL. 10 REF.Article

TRACKING DUE TO OVERVOLTAGES ON ARTIFICIAL CAVITIES IN PERSPEX.SINGH BP; PRABHANSKER V.1974; INDIAN. J. TECHNOL.; INDIA; DA. 1974; VOL. 12; NO 1; PP. 16-19; BIBL. 14 REF.Article

LES PRODUITS DE TRAITEMENT DE LA PIERRE DE TAILLE ET LA LUTTE CONTRE L'IRREVERSIBILITE DES PROCESSUS D'ALTERATIONAMOROSO GG; FELIX C.1979; MATER. TECH.; ISSN 0032-6895; FRA; DA. 1979; VOL. 67; NO 3; PP. 108Article

GAMMA DOSE MEASUREMENTS BY OPTICAL ABSORPTION, ELECTRICAL CONDUCTIVITY AND MECHANICAL HARDNESS.IBRAHIM EMH; SAYED AM; DAWOOD RI et al.1978; NUCL. INSTRUM. METHODS; NETHERL.; DA. 1978; VOL. 150; NO 3; PP. 555-560; BIBL. 19 REF.Article

PERMITIVITY MEASUREMENT OF A THIN SLAB CENTRALLY LOCATED IN A RECTANGULAR WAVEQUIDE.TSANKOV MA.1975; J. PHYS. E; G.B.; DA. 1975; VOL. 8; NO 11; PP. 963-966; BIBL. 19 REF.Article

A HIGH-SENSITIVITY COMPOSITE POLY-(METHYL METHACRYLATE) RESIST.HORWITZ CM.1978; APPL. PHYS. LETTERS; USA; DA. 1978; VOL. 32; NO 12; PP. 803-805; BIBL. 9 REF.Article

THE SCATTERING CENTERS IN DIELECTRIC THIN FILM OPTICAL WAVEGUIDES.MORI H; ITAKURA M.1975; JAP. J. APPL. PHYS.; JAP.; DA. 1975; VOL. 14; NO 12; PP. 1917-1924; BIBL. 7 REF.Article

EXIGENCES RELATIVES AUX ELEMENTS OPTIQUES FONDUS A PARTIR DE POLYMETHACRYLATE DE METHYLESMIRNOV VI; ZUBAKOV VG.1975; OPT.-MEKH. PROMYSHL.; S.S.SR.; DA. 1975; VOL. 42; NO 1; PP. 38-42; BIBL. 5 REF.Article

RAYLEIGH SCATTERING OF MOESSBAUER GAMMA -RAYS IN THE AMORPHOUS POLYMER POLYMETHYL METHACRYLATEALBANESE G; DERIU A; GHEZZI C et al.1979; NUOVO CIMENTO, B; ITA; DA. 1979; VOL. 51; NO 2; PP. 313-326; ABS. ITA; BIBL. 8 REF.Article

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