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COMBUSTION MIXTE DU GAZ NATUREL ET DU MAZOUT. = MIXED COMBUSTION OF NATURAL GAS AND FUEL OILPORTRAIT LM.1975; TECH. MOD.; FR.; DA. 1975; VOL. 67; NO 7-8; PP. 38-44 (5P.); BIBL. 3 REF.Article

SUR LA FORMATION RETARDEE D'IONS A L'EXTERIEUR D'UNE CIBLE SOUMISE A UN BOMBARDEMENT IONIQUEBERNHEIM M; BLAISE G; SLODZIAN G et al.1973; INTERNATION. J. MASS SPECTROM. ION PHYS.; NETHERL.; DA. 1973; VOL. 10; NO 3; PP. 293-308; ABS. ANGL.; BIBL. 20 REF.Serial Issue

LES DIELECTRIQUES EN COUCHES MINCES PAR PULVERISATION CATHODIQUEREIBER LM.sdIN: C.R. SYMP. PULVERISATION CATHOD. APPL.; NICE; 1972; PARIS; MAPREN; DA. S.D.; PP. 53-90; BIBL. 2 P.Conference Paper

LES CARACTERISTIQUES DU COURANT D'IONS DU CIRCUIT DE CATHODE DANS UN SYSTEME HF DE PULVERISATION PAR BOMBARDEMENT IONIQUETSUKADA T; HOSOKAWA N.1975; J. VACUUM SOC. JAP.; JAP.; DA. 1975; VOL. 18; NO 11; PP. 405-408; BIBL. 2 REF.Article

DEPOT DE STRUCTURES MULTICOUCHES A L'AIDE D'UN DISPOSITIF DE PULVERISATION IONIQUE HAUTE FREQUENCE COMPORTANT DEUX CIBLESOBUCHOWICZ F; KAZIMIERCZUK W.1974; PRACE OSRODKA BADAWCZO-ROZWOJOW. ELEKTRON. PROZNIOW.; POLSKA; DA. 1974; VOL. 1; NO 1; PP. 71-77; ABS. ANGL. RUSSE; BIBL. 5 REF.Article

BREVET 2.233.563 (B) (7420802). A 14 JUIN 1974. LANCE DE PULVERISATION DE COMBUSTIBLES LIQUIDESsdPatent

CHARGED PARTICLE SPUTTERING: DISTORTION OF TRAJECTORIES BY THE INCIDENT BEAM FIELDBRYCE P; KELLY JC.1972; J. PHYS.; G.B.; DA. 1972; VOL. 5; NO 13; PP. 1604-1614; BIBL. 6 REF.Serial Issue

ETUDE HOLOGRAPHIQUE DE LA PULVERISATION TRES FINE DANS UN BRULEUR A INJECTION TOURBILLONNAIRE. = HOLOGRAPHIE STUDY OF FINE PULVERIZATION IN A TURBULENT INJECTION BORNERCOULON C; ROYER H.1975; ISL-2-75; FR.; DA. 1975; PP. 1-22; H.T. 17; ABS. ALLEM.; BIBL. 9 REF.Report

TEMPERATURE RISE DURING FILM DEPOSITION BY RF AND DC SPUTTERINGLAU SS; MILLS RH; MUTH DG et al.1972; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1972; VOL. 9; NO 4; PP. 1196-1202; BIBL. 13 REF.Serial Issue

LA PULVERISATION DU FUEL OIL LOURD PAR DES COMBUSTIBLES GAZEUX = USING GASEOUS FUELS TO SPRAY HEAVY FUEL OILLADURELLI A; CLAUS G; LEBLANC P et al.1980; ASS. TECH. INDUSTR. GAZ. FR, C.R. CONGR.; FRA; DA. 1980; VOL. 96; PP. 790-808; ABS. ENG/GERConference Paper

CROISSANCE DE COUCHE MINCE DE TANTALE PAR PULVERISATION HFFUJIOKA T; FUJINAMI T.1972; J. VACUUM SOC JAP.; JAP.; DA. 1972; VOL. 15; NO 10; PP. 362-368; BIBL. 7 REF.Serial Issue

ELECTRICAL PROPERTIES OF DIELECTRIC THIN FILMS OF THE TANTALUM OXIDE-QUARTZ SYSTEM PREPARED BY R.F. REACTIVE SPUTTERING.UMEZAWA T; YAJIMA S.1975; THIN SOLID FILMS; NETHERL.; DA. 1975; VOL. 29; NO 1; PP. 43-52; BIBL. 7 REF.Article

ETUDE PAR SPECTROMETRIE DE MASSE DE LA PULVERISATION CATHODIQUE REACTIVE HAUTE FREQUENCESHINOKI F.1977; BULL. ELECTROTECH. LAB.; JAP.; DA. 1977; VOL. 41; NO 8; PP. 64-70; ABS. ANGL.; BIBL. 16 REF.Article

THE INFLUENCE OF SPUTTERING AND TRANSPORT MECHANISMS ON TARGET ETCHING AND THIN FILMS GROWTH IN RF SYSTEMS. II. TRANSPORT AND DEPOSITION PROCESSESHOLLAND L; PRIESTLAND CRD.1972; VACUUM; G.B.; DA. 1972; VOL. 22; NO 4; PP. 143-149; BIBL. 19 REF.Serial Issue

MECHANISM OF RF REACTIVE SPUTTERINGSHINOKI F; ITOH A.1975; J. APPL. PHYS.; U.S.A.; DA. 1975; VOL. 46; NO 8; PP. 3381-3384; BIBL. 10 REF.Article

PROPERTIES OF ZIRCONIUM NITRIDE FILM RESISTORS DEPOSITED BY REACTIVE RF SPUTTERING.IZUMI K; MASANOBU T; ARIYOSHI H et al.1975; I.E.E.E. TRANS. PARTS HYBRID. PACKAG.; U.S.A.; DA. 1975; VOL. 11; NO 2; PP. 105-107; BIBL. 8 REF.Article

PBTE RF-SPUTTERED INFRARED DETECTORS.CORSI C.1974; APPL. PHYS. LETTERS; U.S.A.; DA. 1974; VOL. 24; NO 3; PP. 137-139; BIBL. 18 REF.Article

ETUDE DU PROCESSUS DE PULVERISATION CATHODIQUE REACTIVEBITNER LR; DANILINA TI.1979; MIKROELEKTRONIKA; SUN; DA. 1979; VOL. 8; NO 1; PP. 71-73; BIBL. 6 REF.Article

SPUTTERING OF SILICON AND GALLIUM ARSENIDE WITH MEDIUM ENERGY INTENSE ION BEAMS OF ARGON AND XENON.PEARMAIN K; UNVALA BA.1975; VACUUM; G.B.; DA. 1975; VOL. 25; NO 1; PP. 3-7; BIBL. 30 REF.Article

BREVET 2.287.648 (A1) (7434694). - 8 OCTOBRE 1974. DISPOSITIF DE CHAUDIERE A VAPORISATION EN VASE CLOS.sdPatent

ELECTRODE POUR PULVERISATION IONIQUE H.FDOROZHKO EV; SAVITSKIJ VG.1975; PRIBORY TEKH. EKSPER.; S.S.S.R.; DA. 1975; NO 1; PP. 236-237; BIBL. 3 REF.Article

CYLINDRICAL DIODE CONTINUOUS VACUUM SPUTTERING EQUIPMENT FOR LABORATORY AND HIGH VOLUME PRODUCTIONGEORGE CH.1973; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1973; VOL. 10; NO 2; PP. 393-397; BIBL. 5 REF.Serial Issue

THE ENERGY SPECTRA OF SPUTTERED IONSDENNIS E; MACDONALD RJ.1972; RAD. EFFECTS; G.B.; DA. 1972; VOL. 13; NO 3; PP. 243-248; BIBL. 8 REF.Serial Issue

IMPROVED DC SPUTTERING RATES FOR REEDBLADE CONTACT DEPOSITIONGUTTENSOHN AE JR; GOVEDNIK RE; JANNINCK RF et al.1973; VACUUM; G.B.; DA. 1973; VOL. 23; NO 1; PP. 21Serial Issue

OBSERVATIONS OF SPUTTERED THIN FILM GROWTHSHERMAN DM; MAA JS; HUTCHINSON TE et al.1973; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1973; VOL. 10; NO 1; PP. 155-159; BIBL. 22 REF.Serial Issue

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