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PHOTOCHEMISTRY OF THE GAS-SOLID INTERFACE. THE SYSTEM 1,3-PENTADIENE-PYREXDAUBENDIEK RL; MCMILLAN GR.1973; J. AMER. CHEM. SOC.; U.S.A.; DA. 1973; VOL. 95; NO 5; PP. 1374-1382; BIBL. 33 REF.Serial Issue

A new method for the evaluation of thermal conductivity and thermal diffusitivity from transient hot strip measurementsSABUGA, W; HAMMERSCHMIDT, U.International journal of thermophysics. 1995, Vol 16, Num 2, pp 557-565, issn 0195-928XConference Paper

Le choix de la composition optimale de la charge pour la production de couvercles en verre pyrexGORSKAYA, A. YA; GORBUNOVA, T. F; KADASHEVICH, EH. S et al.Steklo i keramika. 1989, Num 1, pp 26-27, issn 0131-9582Article

POTENTIALS OF GLASS MEMBRANES IN MOLTEN BINARY NITRATESVAN REENEN TJ; DE WET WJ.1973; J. PHYS. CHEM.; U.S.A.; DA. 1973; VOL. 77; NO 13; PP. 1676-1678; BIBL. 9 REF.Serial Issue

Adhesive-free bonding of Zerodur glass to siliconWARIS, M; AHMED, M.Applied surface science. 2006, Vol 252, Num 20, pp 7327-7330, issn 0169-4332, 4 p.Article

Characterization of a microfluidic device fabricated using a photosensitive sheetITO, Takeshi; KAWAGUCHI, Taku; MIYOSHI, Hiroko et al.Journal of micromechanics and microengineering (Print). 2007, Vol 17, Num 3, pp 432-438, issn 0960-1317, 7 p.Article

Pyrex world firstGlass (Redhill). 1991, Vol 68, Num 10, pp 425-427, issn 0017-0984, 2 p.Article

Strongly accelerated and humidity-independent drying of nanochannels induced by sharp cornersEIJKEL, J. C. T; DAN, B; REEMEIJER, H. W et al.Physical review letters. 2005, Vol 95, Num 25, pp 256107.1-256107.4, issn 0031-9007Article

Glass etching assisted by femtosecond pulse modificationCHIENLIU CHANG; ABE, Takashi; ESASHI, Masayoshi et al.Sensors and materials. 2003, Vol 15, Num 3, pp 137-145, issn 0914-4935, 9 p.Article

Production of N, H, O, and C atoms in flowing microwave dischargesRICARD, A; JAOUL, C; GABORIAU, F et al.Surface & coatings technology. 2004, Vol 188-89, pp 287-293, issn 0257-8972, 7 p.Conference Paper

INFRARED SPECTRA OF SEVERAL GLASSES AT HIGH PRESSURESFERRARO JF; MANGHNANI MH; QUATTROCHI A et al.1972; PHYS. CHEM. GLASSES; G.B.; DA. 1972; VOL. 13; NO 4; PP. 116; ABS. ALLEM. FRSerial Issue

PROPR. MECANIQUES DE LA SURFACE MODIFIEE DU VERRESIL'VESTROVICH SI; KOSHEL'KOVA VS.1971; MOSKOV. KHIM.-TEKHNOL. INST. D.I. MENDELEEVA, TRUDY; S.S.S.R.; DA. 1971; NO 68; PP. 26-30; BIBL. 13 REF.Serial Issue

Femtosecond laser microstructuring of materialsAMEER-BEG, S; PERRIE, W; RATHBONE, S et al.Applied surface science. 1998, Vol 127-29, pp 875-880, issn 0169-4332Conference Paper

A STUDY OF THE SEPARATION POSSIBILITIES OF CATIONS USING GLASS MEMBRANESSTEYN WM; DE WET WJ.1972; SEPAR. SCI.; U.S.A.; DA. 1972; VOL. 7; NO 5; PP. 457-464; BIBL. 15 REF.Serial Issue

CONSTRUCTION OF A PYROLYSIS TUBEWALLS F.1972; CHEM. AND INDUSTRY; G.B.; DA. 1972; NO 17; PP. 681-682Serial Issue

Determination of the viscosity-temperature curve for glasses on the basis of fixed viscosity points determined by hot stage microscopyPASCUAL, M. J; PASCUAL, L; DURAN, A et al.Physics and chemistry of glasses. 2001, Vol 42, Num 1, pp 61-66, issn 0031-9090Article

High-speed machining of glass materials by laser-induced plasma-assisted ablation using a 532-nm laserZHANG, J; SUGIOKA, K; MIDORIKAWA, K et al.Applied physics. A, Materials science & processing (Print). 1998, Vol 67, Num 4, pp 499-501, issn 0947-8396Article

Optimization of an amorphous silicon mask PECVD process for deep wet etching of Pyrex glassILIESCU, Ciprian; JIANMIN MIAO; TAY, Francis E. H et al.Surface & coatings technology. 2005, Vol 192, Num 1, pp 43-47, issn 0257-8972, 5 p.Article

THE MECHANICAL PROPERTIES OF CARBON FIBRE REINFORCED PYREX GLASSPHILLIPS DC; SAMBELL RAJ; BOWEN DH et al.1972; J. MATER. SCI.; G.B.; DA. 1972; VOL. 7; NO 12; PP. 1454-1464; BIBL. 10 REF.Serial Issue

DIRECT MEASUREMENT OF ULTRASONIC STONELEY WAVES.CLAUS RO; PALMER CH.1977; APPL. PHYS. LETTERS; U.S.A.; DA. 1977; VOL. 31; NO 8; PP. 547-548; BIBL. 10 REF.Article

DISPOSITIVO PARA MEDIDAS DE POTENCIAL DE SEDIMENTACION. DETERMINACION DEL POTENCIAL ZETA DEL VIDRIO PIREX = DISPOSITIF DE MESURE DU POTENTIEL DE SEDIMENTATION. DETERMINATION DU POTENTIEL ZETA DU PYREXBRUQUE JM; GONZALEZ CABALLERO F; PARDO G et al.1975; AN. FIS.; ESP.; DA. 1975; VOL. 71; NO 3; PP. 239-243; ABS. ANGL.; BIBL. 9 REF.Article

Micro structuring of borosilicate glass by high-temperature micro-formingSCHUBERT, Andreas; EDELMANN, Jan; BURKHARDT, Thomas et al.Microsystem technologies. 2006, Vol 12, Num 8, pp 790-795, issn 0946-7076, 6 p.Article

Determination of the non-relaxation (reflection) probability of metastable Ar(3P2) atoms on a Pyrex surfaceMACKO, Peter; SADEGHI, Nader.Plasma sources science & technology (Print). 2004, Vol 13, Num 2, pp 303-308, issn 0963-0252, 6 p.Article

The effect of the flexure testing procedure on the fracture statistics of glassesMIGLIORE, A. R; ZANOTTO, E. D.Glass technology. 1995, Vol 36, Num 2, pp 65-66, issn 0017-1050Article

Technique for measuring thermal diffusivity/conductivity of small thermal-insulator specimensMILLER, M. S; KOTLAR, A. J.Review of scientific instruments. 1993, Vol 64, Num 10, pp 2954-2960, issn 0034-6748Article

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