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FILMS ET COUCHES DE METAUX LANTHANIDESLISHENKO LG; NAZAROVA TS; ROZEN AA et al.1972; PRIBORY TEKH. EKSPER.; S.S.S.R.; DA. 1972; NO 4; PP. 243-244; BIBL. 6 REF.Serial Issue

CHEMICAL VAPOR DEPOSITION OF THIN-FILM PLATINUMRAND MJ.1973; J. ELECTROCHEM. SOC.; U.S.A.; DA. 1973; VOL. 120; NO 5; PP. 686-693; BIBL. 21 REF.Serial Issue

Etude des propriétés protectrices de molécules organiques vis-à-vis de la corrosion du zinc en milieu liquide et en milieu atmosphérique = Study of organic molecules inhibitive properties on zinc corrosion in aqueous and atmospheric conditionsHuygues Des Etages, Lydia; Fiaud, Christian.1991, 148 p.Thesis

CRISTALLISATION DU ZINC EN PHASE VAPEURGRIBOVSKIJ SV; KVATER LI; FRISHBERG IV et al.1975; IZVEST. AKAD. NAUK S.S.S.R., METALLY; S.S.S.R.; DA. 1975; NO 5; PP. 44-46; BIBL. 5 REF.Article

The application of photo-reduction of thin cuprous iodide film for metal image formationSHIMIDZU, N; MASUDA, H; OHNO, S et al.Chemistry Letters. 1984, Num 6, pp 961-964, issn 0366-7022Article

Vapour deposition of engineering coatings = Dépôt en phase vapeur des revêtements technologiquesEDWARDS, J.Transactions of the Institute of Metal Finishing. 1986, Vol 64, Num 4, pp 17-23, issn 0020-2967Article

Evolution des dépôts par voie sèche (PVD et CVD) = Evolution of dry coatings (PVD and CVD)ZEGA, B.Le Vide, les couches minces. 1986, Num 232, pp 3-12, issn 0223-4335Conference Paper

SAFETY IN CHEMICAL VAPOR DEPOSITION = SECURITE DANS LES DEPOTS EN PHASE VAPEURHAMMOND ML.1980; SOLID STATE TECHNOL.; ISSN 0038-111X; USA; DA. 1980; VOL. 23; NO 12; PP. 104-109; BIBL. 7 REF.Article

Kinetics of physical and chemical deposition of a substance from the gas phase in channelsLEVDANSKII, V. V; SMOLIK, J.Journal of engineering physics and thermophysics. 2001, Vol 74, Num 5, pp 1247-1252, issn 1062-0125Article

ETUDE DU PROCESSUS DE PRECIPITATION DES COUCHES MINCES DE AL A PARTIR DE LA PHASE VAPEURDOMRACHEV GA; ZHUK BV; KHAMYLOV VK et al.1976; DOKL. AKAD. NAUK S.S.S.R.; S.S.S.R.; DA. 1976; VOL. 226; NO 4; PP. 839-842; BIBL. 2 REF.Article

Fabrication techniques for high-quality optical fibersARNAB SARKAR.Fiber and integrated optics. 1985, Vol 5, Num 2, pp 135-149, issn 0146-8030Article

Uniaxial textured (001) metal film formation via YBa2Cu3O7 /SrTiO3 /metal trilayersPARK, S. J; NORTON, D. P.Surface & coatings technology. 2006, Vol 200, Num 20-21, pp 5778-5781, issn 0257-8972, 4 p.Article

From bunsen to VLSI : 150 years of growth in chemical vapor deposition technologyALLENDORF, M.The Electrochemical Society interface. 1998, Vol 7, Num 1, pp 36-39, issn 1064-8208, 3 p.Article

Anticorrosion et anti-usure des pièces mécaniques = Corrosion and wear resistance of mechanical partsPOURPRIX, Y.Galvano organo traitements de surface. 1986, Vol 55, Num 566, pp 341-342, issn 0982-7870Article

OBTAINING TEMPERATURE PARAMETERS FOR EVAPORATION BY SOLVING THE INVERTED PROBLEM OF THERMAL CONDUCTIVITYANISHCHENKO LM; LAVRENYUK S YU.1982; FIZIKA I HIMIJA. OBRABOTKI MATERIALOV; ISSN 0015-3214; SUN; DA. 1982; NO 6; PP. 26-28; BIBL. 3 REF.Article

VAPOR DEPOSITION OF SILVER, GOLD AND PALLADIUM ON CARBON AND SILICON DIOXIDE IN ION-PUMPED VACUUM.HAMILTON JF; LOGEL PC.1974; THIN SOLID FILMS; NETHERL.; DA. 1974; VOL. 23; NO 1; PP. 89-100; BIBL. 10 REF.Article

Grown-in vacancy-type defects in poly-and single crystalline silicon investigated by positron annihilationDANNEFAER, S; AVALOS, V; ANDERSEN, O et al.EPJ. Applied physics (Print). 2007, Vol 37, Num 2, pp 213-218, issn 1286-0042, 6 p.Article

Controlling the growth of CVD carbon from methane on transition metal substratesLI, Wei-Na; DING, Yun-Shuang; SUIB, Steven L et al.Surface & coatings technology. 2005, Vol 190, Num 2-3, pp 366-371, issn 0257-8972, 6 p.Article

Large size preform with PCVD process for high quality and low cost fiberKANG XIE; SHUGIANG ZHANG; QINGRONG HAN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2005, pp 60190N.1-60190N.4, issn 0277-786X, isbn 0-8194-6050-8, 2VolConference Paper

P.V.D. hard coatings: new dimension in surface technology = Revêtements durs par dépôt physique en phase vapeur: une nouvelle dimension en technologie de surfaceMUENZ, W. D.Le Vide, les couches minces. 1986, Num 232, pp 13-25, issn 0223-4335Conference Paper

Les perspectives du traitement ionique = Future of ionic treatmentMICHEL, H.Traitement thermique (Paris). 1983, Num 179, pp 41-48, issn 0041-0950Article

VAPOR PHASE PROCEDURE CUTS SOLDERING TIME, REDUCES DEFECTS1982; INSUL., CIRCUITS; ISSN 0020-4544; USA; DA. 1982; VOL. 28; NO 10; PP. 35-36Article

CHEMICAL VAPOR DEPOSITION OF SUPERCONDUCTING NB3GE HAVING HIGH TRANSITION TEMPERATURES.BRAGINSKI AI; ROLAND GW.1974; APPL. PHYS. LETTERS; U.S.A.; DA. 1974; VOL. 25; NO 12; PP. 762-763; BIBL. 12 REF.Article

GRAVIMETRIC STUDY OF GROWTH KINETICS OF BISMUTH THIN FILMS GROWN BY VAPOUR DEPOSITIONFUJIWARA S; TERAJIMA H.1973; PHILOS. MAG.; G.B.; DA. 1973; VOL. 27; NO 4; PP. 853-864; BIBL. 22 REF.Serial Issue

Crystalline CrV0.95P0.05O4 catalyst for the vapor-phase oxidation of picolinesTAKEHIRA, K; SHISHIDO, T; SONG, Z et al.Catalysis today. 2004, Vol 91-92, pp 7-11, issn 0920-5861, 5 p.Conference Paper

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