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Messtechnische Erfassung der Bildleistung photolithographischer Objektive durch Wellenflächenanalyse = Estimation métrologique des performances image en photolithogravure par analyse du front d'onde = Metrological assessment of the imaging performance of photolithographic objectives by wave front analysisFREITAG, W; GROSSMANN, W; GRUNEWALD, U et al.Experimentelle Technik der Physik. 1988, Vol 36, Num 6, pp 417-428, issn 0014-4924Article

Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)Martin, Patrick M; Naber, Robert J.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6444-9, 2Vol, pagination multiple, isbn 0-8194-6444-9Conference Proceedings

Thin-Film Processing Realities for Tbit/in² RecordingFONTANA, Robert E; ROBERTSON, Neil; HETZLER, Steven R et al.IEEE transactions on magnetics. 2008, Vol 44, Num 11, pp 3617-3620, issn 0018-9464, 4 p., 2Conference Paper

A micropatterned carbohydrate display for tissue engineering by self-assembly of heparinSATO, Hajime; MIURA, Yoshiko; SAITO, Nagahiro et al.Surface science. 2007, Vol 601, Num 18, pp 3871-3875, issn 0039-6028, 5 p.Conference Paper

Optical microlithography XXIII (23-25 February 2010, San Jose, California, United States)Dusa, Mircea V; Conley, Willard.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 2 vol, 2, isbn 978-0-8194-8054-5 0-8194-8054-1Conference Proceedings

Optical microlithography XXII (24-27 February 2009, San Jose, California, United States)Levinson, Harry J; Dusa, Mircea V.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 2 vol, 2, isbn 978-0-8194-7527-5 0-8194-7527-0Conference Proceedings

More evolved PGSD (Proximity Gap Suction Developer) for controlling movement of dissolution productsSAKURAI, Hideaki; OPPATA, Yukio; KAMEI, Shigenori et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 63494J.1-63494J.8, issn 0277-786X, isbn 0-8194-6444-9, 2VolConference Paper

Photolithography at 193 nmROTHSCHILD, M; GOODMAN, R. B; HARTNEY, M. A et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 2989-2996, issn 1071-1023Conference Paper

Cost-effective SU-8 micro-structures by DUV excimer laser lithography for label-free biosensingSANZA, F. J; LAGUNA, M. F; PUCHADES, R et al.Applied surface science. 2011, Vol 257, Num 12, pp 5403-5407, issn 0169-4332, 5 p.Conference Paper

Development of SMD 32.768 kHz tuning fork type crystals Part III : Design optimization of mass-production capable quartz tuning fork resonatorsLEE, Sungkyu; MOON, Yangho; SEO, Won-Seon et al.International journal of materials research. 2007, Vol 98, Num 3, pp 239-245, issn 1862-5282, 7 p.Article

Advances in resist materials and processing technology XXVII (22-24 February 2010, San Jose, California, United States)Allen, Robert D; Somervell, Mark Howell.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 2 vol, 2, isbn 978-0-8194-8053-8 0-8194-8053-3Conference Proceedings

Optical microlithography XXI (26-29 February 2008, San Jose, California, USA)Levinson, Harry J; Dusa, Mircea V.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7109-3, 3 v, isbn 978-0-8194-7109-3Conference Proceedings

157-nm Photomask handling and infrastructure: Requirements and feasibilityCULLINS, Jerry; MUZIO, Ed.SPIE proceedings series. 2001, pp 52-60, isbn 0-8194-4032-9, 2VolConference Paper

Prospects for using existing resists for evaluating 157-nm imaging systemsFEDYNYSHYN, Theodore H; KUNZ, Roderick R; DORAN, Scott P et al.SPIE proceedings series. 2000, pp 335-346, isbn 0-8194-3617-8Conference Paper

Application of development-free vapor photolithography in etching silicon nitrideXIAOYIN HONG; SHENGQUAN DUAN; JIANPING LU et al.SPIE proceedings series. 1998, pp 478-486, isbn 0-8194-2776-4Conference Paper

Optical microlithography XX (27 February-2 March 2007, San Jose, California, USA)Flagello, Donis G.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6639-6, 3 v, isbn 978-0-8194-6639-6Conference Proceedings

Microparticles of all shapes and chemistriesMUKHOPADHYAY, Rajendrani.Analytical chemistry (Washington, DC). 2006, Vol 78, Num 13, pp 4247-4247, issn 0003-2700, 1 p.Article

Fabrication of micro-pyramid prisms array with coding gray-tone mask methodLIU QIAN; GAO FUHUA; GAO FENG et al.SPIE proceedings series. 2003, pp 116-122, isbn 0-8194-5056-1, 7 p.Conference Paper

Polymers for 157 nm photoresist applications : A progress reportPATTERSON, Kyle; YAMACHIKA, Mikio; CONLEY, Willard et al.SPIE proceedings series. 2000, pp 365-374, isbn 0-8194-3617-8Conference Paper

A simple method of photomask yield optimization by defect inspectionGUPTA, S. N; BAGCHI, A. K; KUNDU, N. N et al.Microelectronics and reliability. 1984, Vol 24, Num 4, pp 625-627, issn 0026-2714Article

Suppression of resist contamination during photolithography on carbon nanomaterials by a sacrificial layerLEE, Shih-Wei; MUOTH, Matthias; HELBLING, Thomas et al.Carbon (New York, NY). 2014, Vol 66, pp 295-301, issn 0008-6223, 7 p.Article

Photomask technology 2007 (18-21 September, 2007, Monterey, California, USA)Naber, Robert J; Kawahira, Hiroichi.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6887-1, 3 vol, isbn 978-0-8194-6887-1Conference Proceedings

High power injection lock 6kHz 60W laser for ArF dry/wet lithographyMIZOGUCHI, Hakaru; INOUE, T; YOSHINO, M et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6197-0, vol 2, 615425.1-615425.10Conference Paper

Optical microlithography XVII (Santa Clara CA, 24-27 January 2004)Smith, Bruce W.SPIE proceedings series. 2004, isbn 0-8194-5290-4, 3Vol, XXIII, 2008 p, isbn 0-8194-5290-4Conference Proceedings