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Photomask and next-generation lithography mask technology XV (16-18 April 2008, Yokohama, Japan)Horiuchi, Toshiyuki.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2 v, 2, isbn 978-0-8194-7243-4 0-8194-7243-3Conference Proceedings

Hotspot management in which mask fabrication errors are consideredKARIYA, Mitsuyo; YAMANAKA, Eiji; YOSHIDA, Kenji et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70282U.1-70282U.8, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Influence of mask surface processing on CD-SEM imagingHAUPTMANN, Marc; ENG, Lukas M; RICHTER, Jan et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702830.1-702830.8, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Mask Shot Count Reduction Strategies in the OPC FlowWORD, James; MIZUUCHI, Keisuke; SAI FU et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70283F.1-70283F.11, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Mask process effect aware OPC modelingKOO, Kyoil; LEE, Sooryong; HONG, Minjong et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70283E.1-70283E.8, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

The Lithography Technology for the 32 nm HP and BeyondDUSA, Mircea; ARNOLD, Bill; FINDERS, Jo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702810.1-702810.11, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

A Study of Mask Specification in Spacer Patterning TechnologyMUKAI, Hidefumi; KOBAYASHI, Yuuji; YAMAGUCHI, Shinji et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702812.1-702812.8, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Case Study : The Impact of VSB FracturingDILLON, Brian; NORRIS, Tim.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70280F.1-70280F.9, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

In-situ Chamber Clean for Chromium Etch ApplicationZHIGANG MAO; XIAOYI CHEN; KNICK, David et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702823.1-702823.8, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Mask Transmission Resonance in bi-layer masksPHILIPSEN, Vicky; DE BISSCHOP, Peter; MESUDA, Kei et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702815.1-702815.8, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

OPC model enhancement using parameter sensitivity methodologyWARD, Brian S; DRAPEAU, Martin.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70280N.1-70280N.11, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

An extraction of repeating patterns from OPCed layout dataYOSHIHIRO, Fujimoto; SHOJI, Masahiro; KATO, Kokoro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702836.1-702836.10, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Evaluation of Hotspot analysis flow using Mask ModelKAWASHIMA, Satoshi; HAYANO, Katsuya; KUWAHARA, Naoko et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702838.1-702838.8, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Impact of Illumination Source Symmetrization in OPCSTURTEVANT, John L; LE HONG; JAYARAM, Srividya et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70283M.1-70283M.10, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Inspectability of PSM masks for the 32nm node using STARlight2+HUANG, Chain-Ting; CHENG, Yung-Feng; KUO, Shih-Ming et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70282P.1-70282P.8, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Mask image position correction for double patterning lithographySAITO, Masato; ITOH, Masamitsu; IKENAGA, Osamu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70280D.1-70280D.9, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Separable OPC Models for Computational LithographyLIU, Hua-Yu; QIAN ZHAO; WENJIN SHAO et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70280X.1-70280X.11, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

The Ultimate Chrome Absorber in Photomask-makingHASHIMOTO, Masahiro; IWASHITA, Hiroyuki; KOMINATO, Atsushi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702804.1-702804.8, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

The source of carbon contamination for EUV Mask productionKIM, Yongdae; LEE, Junsik; CHOI, Yongkyoo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70281U.1-70281U.7, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

UV NIL mask making and imprint evaluationFUJII, Akiko; SAKAI, Yuko; MOHRI, Hiroshi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70281W.1-70281W.12, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Verification of Mask Manufacturing Load Estimation (MiLE)NAGAMURA, Yoshikazu; NARUKAWA, Shogo; KATO, Masahiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702837.1-702837.9, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Die-to-database mask inspection with variable sensitivityTSUCHIYA, Hideo; TOKITA, Masakazu; NOMURA, Takehiko et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70282I.1-70282I.8, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Impact of Patterning Strategy on Mask Fabrication Beyond 32nmMIMOTOGI, Shoji; HIGAKI, Tomotaka; TAKAHATA, Kazuhiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702814.1-702814.9, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Logic Device Scaling Trend in ITRS 2007IMAI, Kiyotaka.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, PART I, 702802.1-702802.8, 2Conference Paper

Novel model of haze generation on photomaskAKUTSU, Haruko; YAMAGUCHI, Shinji; OTSUBO, Kyo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702829.1-702829.11, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

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