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Penetration of water vapour into narrow channels during steam sterilization processesVAN DOORNMALEN, J. P. C. M; VERSCHUEREN, M; KOPINGA, K et al.Journal of physics. D, Applied physics (Print). 2013, Vol 46, Num 6, issn 0022-3727, 065201.1-065201.7Article

Quantitative detection of plasma-generated radicals in liquids by electron paramagnetic resonance spectroscopyTRESP, H; HAMMER, M. U; WINTER, J et al.Journal of physics. D, Applied physics (Print). 2013, Vol 46, Num 43, issn 0022-3727, 435401.1-435401.8Article

Complex Responses of Microorganisms as a Community to a Flowing Atmospheric PlasmaBAYLISS, Danny L; WALSH, James L; IZA, Felipe et al.Plasma processes and polymers (Print). 2012, Vol 9, Num 6, pp 597-611, issn 1612-8850, 15 p.Article

Nonthermal-plasma-mediated animal cell deathKIM, Wanil; WOO, Kyung-Chul; KIM, Gyoo-Cheon et al.Journal of physics. D, Applied physics (Print). 2011, Vol 44, Num 1, issn 0022-3727, 013001.1-013001.7Article

Workshop on atomic and molecular collision data for plasma modelling: database needs for semiconductor plasma processing : THE 20TH EUROPEAN SECTIONAL CONFERENCE ON ATOMIC AND MOLECULAR PHYSICS OF IONIZED GASESMAKABE, Toshiaki; TATSUMI, Tetsuya.Plasma sources science & technology (Print). 2011, Vol 20, Num 2, issn 0963-0252, 024014.1-024014.6Article

Thermodynamical and plasma-driven kinetic growth of high-aspect-ratio nanostructures: effect of hydrogen terminationLEVCHENKO, I; OSTRIKOV, K; XU, S et al.Journal of physics. D, Applied physics (Print). 2009, Vol 42, Num 12, issn 0022-3727, 125207.1-125207.6Article

Plasmas froids radiofréquenceCHABERT, Pascal; RAIMBAULT, Jean-Luc.Images de la physique. 2009, pp 27-34, issn 0290-0041, 8 p.Article

Special Issue on Plasma-Based Surface Modification and Treatment TechnologiesCHU, Paul K; YUKIMURA, Ken; XIUBO TIAN et al.IEEE transactions on plasma science. 2009, Vol 37, Num 7, issn 0093-3813, 68 p., 1Serial Issue

Micro- and Mesostructures in Plasma Polymers of TrichloroethyleneCRUZ, Guillermo J; GUADALUPE OLAYO, Ma; FERNANDEZ, Gilberto et al.IEEE transactions on plasma science. 2009, Vol 37, Num 9, pp 1675-1682, issn 0093-3813, 8 p., 1Article

Recombination of O and H Atoms on the Surface of Nanoporous DielectricsRAKHIMOVA, Tatyana V; BRAGINSKY, Oleg V; KOVALEV, Alexander S et al.IEEE transactions on plasma science. 2009, Vol 37, Num 9, pp 1697-1704, issn 0093-3813, 8 p., 1Article

Characterization of neutral beam source using dc cold cathode discharge and its application processes : Neutral Beam ProcessesICHIKI, Katsunori; HATAKEYAMA, Masahiro.Journal of physics. D, Applied physics (Print). 2008, Vol 41, Num 2, issn 0022-3727, 024003.1-024003.14Article

Ion energy and angular distributions into the wafer-focus ring gap in capacitively coupled dischargesBABAEVA, Natalia Y; KUSHNER, Mark J.Journal of physics. D, Applied physics (Print). 2008, Vol 41, Num 6, issn 0022-3727, 062004.1-062004.4Article

Liquid crystal alignment on the two-directionally processed substrates : Comparison of mechanical rubbing and plasma beam alignmentWU, K. Y; HWANG, J; LEE, C.-Y et al.Thin solid films. 2008, Vol 517, Num 2, pp 905-908, issn 0040-6090, 4 p.Article

RIE texturing optimization for thin c-Si solar cells in SF₆/O₂ plasmaYOO, J; KIM, Kyunghae; THAMILSELVAN, M et al.Journal of physics. D, Applied physics (Print). 2008, Vol 41, Num 12, issn 0022-3727, 125205.1-125205.7Article

Nonthermal Medical/Biological Treatments Using Ionized Gases and Electromagnetic FiledsJOSHI, Ravindra P; AKIYAMA, Hidenori; FRIDMAN, Alexander et al.IEEE transactions on plasma science. 2008, Vol 36, Num 4, issn 0093-3813, 80 p., 3Serial Issue

Simulations of Distributed Voltages in Full-Body Biomodels Using Symmetric Factorization With Massively Parallel Solvers in Response to External PulsingMISHRA, Ashutosh; JOSHI, Ravindra P.IEEE transactions on plasma science. 2008, Vol 36, Num 4, pp 1673-1679, issn 0093-3813, 7 p., 3Article

Model Assessment of Cell Membrane Breakdown in Clusters and Tissues Under High-Intensity Electric PulsingJOSHI, Ravindra P; MISHRA, Ashutosh; SCHOENBACH, Karl H et al.IEEE transactions on plasma science. 2008, Vol 36, Num 4, pp 1680-1688, issn 0093-3813, 9 p., 3Article

Porous SiOCH, SOCH and SiO₂ etching in high density fluorocarbon plasma with a pulsed biasRABALLAND, Vanessa; CARTRY, Gilles; CARDINAUD, Christophe et al.Plasma processes and polymers (Print). 2007, Vol 4, Num 5, pp 563-573, issn 1612-8850, 11 p.Article

Plasma/reactor walls interactions in advanced gate etching processesRAMOS, R; CUNGE, G; JOUBERT, O et al.Thin solid films. 2007, Vol 515, Num 12, pp 4846-4852, issn 0040-6090, 7 p.Conference Paper

Methane and Ethane Decomposition in an Atmospheric-Pressure Plasma JetSANCHEZ-GONZALEZ, Rodrigo; KIM, Yongho; ROSOCHA, Louis A et al.IEEE transactions on plasma science. 2007, Vol 35, Num 6, pp 1669-1676, issn 0093-3813, 8 p., 1Article

SiO₂ and Si₃N₄ etch mechanisms in NF₃/hydrocarbon plasmaMACHIMA, Puthajat; HERSHKOWITZ, Noah.Journal of physics. D, Applied physics (Print). 2006, Vol 39, Num 4, pp 673-684, issn 0022-3727, 12 p.Article

Strategies to improve the adhesion of rubbers to adhesives by means of plasma surface modificationMARTIN-MARTINEZ, J. M; ROMERO-SANCHEZ, M. D.EPJ. Applied physics (Print). 2006, Vol 34, Num 2, pp 125-138, issn 1286-0042, 14 p.Article

Generation of surface-treating plasma by a superadiabatic compression ballistic plasmatronSHMELEV, Vladimir; PODOYNITSYN, Sergey; VASILIK, Nikolay et al.IEEE transactions on plasma science. 2006, Vol 34, Num 6, pp 2588-2593, issn 0093-3813, 6 p., 2Article

Localized germanium-on-insulator patterns on Si by novel etching scheme in CF₄/O₂ plasmaRAMANA MURTHY, B; BALASUBRAMANIAN, N; BALAKUMAR, S et al.Thin solid films. 2006, Vol 504, Num 1-2, pp 77-80, issn 0040-6090, 4 p.Conference Paper