kw.\*:("Plasma deposition")
Results 1 to 25 of 2626
Selection :
Ultra-small platinum and gold nanoparticles by arc plasma depositionSANG HOON KIM; YOUNG EUN JEONG; HEONPHIL HA et al.Applied surface science. 2014, Vol 297, pp 52-58, issn 0169-4332, 7 p.Article
Influence of consumed power on structural and nano-mechanical properties of nano-structured diamond-like carbon thin filmsDWIVEDI, Neeraj; KUMAR, Sushil; RAWAL, Ishpal et al.Applied surface science. 2014, Vol 300, pp 141-148, issn 0169-4332, 8 p.Article
Proceedings of the 4th International Conference on Microelectronics and Plasma Technology ICMAP 2012, Jeju, KoreaLEE, Nae-Eung; HYUN WOO KIM; CHEE WON CHUNG et al.Thin solid films. 2013, Vol 547, issn 0040-6090, 302 p.Conference Proceedings
The 3rd International Conference on Microelectronics and Plasma Technology (ICMAP) 2011LEE, Nae-Eung; SHI, J. J; KINOSHITA, Keijo et al.Thin solid films. 2012, Vol 521, issn 0040-6090, 277 p.Conference Proceedings
Pulsed high-power plasmas for deposition of nanostructured thin filmsAWAKOWICZ, Peter; CZARNETZKI, Uwe.Journal of physics. D, Applied physics (Print). 2013, Vol 46, Num 8, issn 0022-3727, [147 p.]Serial Issue
Special Issue on Plasma-Based Surface Modification and Treatment TechnologiesCHU, Paul K; YUKIMURA, Ken; XIUBO TIAN et al.IEEE transactions on plasma science. 2009, Vol 37, Num 7, issn 0093-3813, 68 p., 1Serial Issue
Improved blue response and efficiency of a-Si: H solar cells rapidly deposited from disilane using a dual chamber plasma systemRAJESWARAN, G; VANIER, P. E; CORDERMAN, R. R et al.IEEE photovoltaic specialists conference. 18. 1985, pp 1271-1276Conference Paper
Surface modification of aligned carbon nanotube arrays for electron emitting applicationsPATIL, A; VAIA, R; DAI, L et al.Synthetic metals. 2005, Vol 154, Num 1-3, pp 229-232, issn 0379-6779, 4 p.Conference Paper
Pulsed DC discharge for synthesis of conjugated plasma polymerized aniline thin filmBARMAN, Tapan; PAL, Arup R.Applied surface science. 2012, Vol 259, pp 691-697, issn 0169-4332, 7 p.Article
Study of Ti addition in channel layers for In―Zn―O thin film transistorsYAO QIJUN; LI SHUXIN; ZHANG QUN et al.Applied surface science. 2011, Vol 258, Num 4, pp 1460-1463, issn 0169-4332, 4 p.Article
On the relationship between the structure and the barrier performance of plasma deposited silicon dioxide-like filmsCOCLITE, Anna Maria; MILELLA, Antonella; D'AGOSTINO, Riccardo et al.Surface & coatings technology. 2010, Vol 204, Num 24, pp 4012-4017, issn 0257-8972, 6 p.Article
Integration of optical waveguides with micro-incandescent lightREHDER, G; CARRENO, M. N. P; ALAYO, M. I et al.Journal of non-crystalline solids. 2008, Vol 354, Num 19-25, pp 2538-2543, issn 0022-3093, 6 p.Conference Paper
Properties of thin film silicon, prepared at high growth rate in a wide range of thicknessesKOCKA, J; MATES, T; LEDINSKY, M et al.Journal of non-crystalline solids. 2008, Vol 354, Num 19-25, pp 2451-2454, issn 0022-3093, 4 p.Conference Paper
Local bonding in PECVD-SiOxNy filmsCRIADO, D; ALAYO, M. I; FANTINI, M. C. A et al.Journal of non-crystalline solids. 2006, Vol 352, Num 9-20, pp 1298-1302, issn 0022-3093, 5 p.Conference Paper
Determination of functionalized gold nanoparticles incorporated in hydrophilic and hydrophobic microenvironments by surface modification of quartz crystal microbalanceWU, Tsui-Hsun; LIAO, Shu-Chuan; CHEN, Ying-Fang et al.Applied surface science. 2013, Vol 274, pp 418-424, issn 0169-4332, 7 p.Article
Thin plasma-polymerized layers of hexamethyldisiloxane for humidity sensor developmentGUERMAT, N; BELLEL, A; SAHLI, S et al.Thin solid films. 2009, Vol 517, Num 15, pp 4455-4460, issn 0040-6090, 6 p.Article
Growth chemistry of nanocrystalline silicon and germanium filmsDALAL, Vikram L; MUTHUKRISHNAN, Kamal; XUEJUN NIU et al.Journal of non-crystalline solids. 2006, Vol 352, Num 9-20, pp 892-895, issn 0022-3093, 4 p.Conference Paper
Progress in amorphous and nanocrystalline silicon solar cellsGUHA, Subhendu; YANG, Jeffrey.Journal of non-crystalline solids. 2006, Vol 352, Num 9-20, pp 1917-1921, issn 0022-3093, 5 p.Conference Paper
The role of ion-bulk interactions during high rate deposition of microcrystalline silicon by means of the multi-hole-cathode VHF plasmaSMETS, A. H. M; KONDO, M.Journal of non-crystalline solids. 2006, Vol 352, Num 9-20, pp 937-940, issn 0022-3093, 4 p.Conference Paper
The deposition mechanism of atmospheric pressure glow plasma polymerized hexafluoropropene: Gas phase analysis of HFP plasmaOZAKI, Ren; KOGOMA, Masuhiro; TANAKA, Kunihito et al.Thin solid films. 2010, Vol 518, Num 13, pp 3566-3569, issn 0040-6090, 4 p.Conference Paper
Tunable Bragg filter using silicon compound filmsMARTINS, G. S. P; CARVALHO, D. O; ALAYO, M. I et al.Journal of non-crystalline solids. 2008, Vol 354, Num 19-25, pp 2816-2820, issn 0022-3093, 5 p.Conference Paper
Amorphous Silicon Nitride : a suitable alloy for optical multilayered structuresRICCIARDI, C; BALLARINI, V; GIORGIS, F et al.Journal of non-crystalline solids. 2006, Vol 352, Num 9-20, pp 1294-1297, issn 0022-3093, 4 p.Conference Paper
Fabry-Perot resonance enhancement-inhibition of spontaneous light emission from a-C:H thin filmsTOTH, S; VERES, M; FÜLE, M et al.Journal of non-crystalline solids. 2006, Vol 352, Num 9-20, pp 1336-1339, issn 0022-3093, 4 p.Conference Paper
Silicon-carbon films deposited at low substrate temperatureAMBROSONE, G; COSCIA, U; LETTIERI, S et al.Journal of non-crystalline solids. 2006, Vol 352, Num 9-20, pp 1371-1375, issn 0022-3093, 5 p.Conference Paper
High-rate deposition of nanocrystalline silicon using the expanding thermal plasma techniqueKESSELS, W. M. M; HOUSTON, I. J; NADIR, K et al.Journal of non-crystalline solids. 2006, Vol 352, Num 9-20, pp 915-918, issn 0022-3093, 4 p.Conference Paper