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Passing of electron beams through a laminated electronoresistKORNYUSHKIN, YU. D.Physica status solidi. A. Applied research. 1986, Vol 95, Num 1, pp K81-K86, issn 0031-8965Article

Selective masking effects of WO₃ resist on impurity diffusion and oxidation in siliconBABA, M; ABE, S; IKEDA, T et al.Japanese journal of applied physics. 1987, Vol 26, Num 9, pp 1561-1564, issn 0021-4922, 1Article

Poly(alkenylsilane sulfone)s as positive electron beam resists for two-layer systemsGOZDZ, A. S; CRAIGHEAD, H. G; BOWDEN, M. J et al.Polymer engineering and science. 1986, Vol 26, Num 16, pp 1123-1128, issn 0032-3888Article

Metal lift-off using a trilevel resist system for electron beam lithographyETRILLARD, J; BELLESSA, J; IZRAEL, A et al.Microelectronic engineering. 1987, Vol 7, Num 1, pp 11-20, issn 0167-9317Article

Chemical amplification electron beam positive resist process free from surface insoluble layerFUJINO, T; MAEDA, H; KUMADA, T et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1993, Vol 11, Num 6, pp 2773-2778, issn 1071-1023Conference Paper

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Effects of molecular weights and polydispersity on the properties of poly(trifluoroethyl methacrylate) as a positive x ray and electron resistDELAIRE, J. A; LAGARDE, M; BROUSSOUX, D et al.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1990, Vol 8, Num 1, pp 33-38, issn 0734-211X, 6 p.Article

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Polymers in conventional and alternative lithography for the fabrication of nanostructuresACIKGOZ, Canet; HEMPENIUS, Mark A; HUSKENS, Jurriaan et al.European polymer journal. 2011, Vol 47, Num 11, pp 2033-2052, issn 0014-3057, 20 p.Article

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New-high-resolution and high-sensitivity deep UV, X-ray, and electron-beam resistsHATZAKIS, M; STEWART, K. J; SHAW, J. M et al.Journal of the Electrochemical Society. 1991, Vol 138, Num 4, pp 1076-1079, issn 0013-4651Article

Density Multiplication and Improved Lithography by Directed Block Copolymer AssemblyRUIZ, Ricardo; HUIMAN KANG; DETCHEVERRY, Francois A et al.Science (Washington, D.C.). 2008, Vol 321, Num 5891, pp 936-939, issn 0036-8075, 4 p.Article

Preparation of Substituted N-Methacryloxy Phthalimides for E-Beam LithographyGUNTUPALLI, Maheedhar; WILKINS, Cletus W; CASSIDY, Patrick E et al.International journal of polymeric materials (Print). 2008, Vol 57, Num 4-6, pp 442-451, issn 0091-4037, 10 p.Article

A radiation-crosslinkable thiophene copolymerKOCK, T. J. J. M; DE RUITER, B.Synthetic metals. 1996, Vol 79, Num 3, pp 215-218, issn 0379-6779Article

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Relationship between electron sensitivity and chemical structures of polymers as electron beam resists. VI: Electron sensitivity of various acetalized poly(vinyl alcohol)sOGUCHI, K; SANUI, K; OGATA, N et al.Polymer engineering and science. 1989, Vol 29, Num 6, pp 353-358, issn 0032-3888Article

On the Monte Carlo simulation program «RESIS» for electron exposure of resistsDESHMUKH, P. R; KHOKLE, W. S.Solid-state electronics. 1989, Vol 32, Num 4, pp 261-268, issn 0038-1101Article

A polymer complex as a new type of electron beam resist for dry developmentYONEYAMA, S; OGUCHI, K; WATANABE, M et al.Polymer engineering and science. 1988, Vol 28, Num 14, pp 912-915, issn 0032-3888Article

Dry developable resist in E-beam and SR lithographyTSUDA, M; OIKAWA, S; YABUTA, M et al.Polymer engineering and science. 1986, Vol 26, Num 16, pp 1148-1152, issn 0032-3888Article

Synthèse et études des résines microlithographiques renfermant des unités tétrathiafulvalènes sensibles aux U. V. et aux électronsMungroo, Aumduth; Schue, François.1986, 167 p.Thesis

MMP-2 Detective Silicon Nanowire Biosensor Using Enzymatic Cleavage ReactionCHOI, Jin-Ha; KIM, Han; KIM, Hyun-Soo et al.Journal of biomedical nanotechnology (Print). 2013, Vol 9, Num 4, pp 732-735, issn 1550-7033, 4 p.Article

Development of a multineedle electroresistivity probe for measuring bubble characteristics in molten metal bathsIGUCHI, M; NAKATANI, T; KAWABATA, H et al.Metallurgical and materials transactions. B, Process metallurgy and materials processing science. 1997, Vol 28, Num 3, pp 409-416, issn 1073-5615Article

Critical dimension control of poly-butene-sulfone resist in electron beam lithographyNAKAMURA, K; SHY, S. L; HUANG, C. C et al.Japanese journal of applied physics. 1994, Vol 33, Num 12B, pp 6989-6992, issn 0021-4922, 1Article