Pascal and Francis Bibliographic Databases

Help

Search results

Your search

kw.\*:("Polymère photosensible")

Document Type [dt]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Publication Year[py]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Discipline (document) [di]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Language

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Author Country

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Origin

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Results 1 to 25 of 2490

  • Page / 100
Export

Selection :

  • and

Monomer diffusion rates in photopolymer material. Part II. High-frequency gratings and bulk diffusionCLOSE, C. E; GLEESON, M. R; MOONEY, D. A et al.Journal of the Optical Society of America. B, Optical physics (Print). 2011, Vol 28, Num 4, pp 842-850, issn 0740-3224, 9 p.Article

Azobenzene photomechanics: prospects and potential applicationsMAHIMWALLA, Zahid; YAGER, Kevin G; MAMIYA, Jun-Ichi et al.Polymer bulletin (Berlin. Print). 2012, Vol 69, Num 8, pp 967-1006, issn 0170-0839, 40 p.Article

The study and application of dual-wavelength (red and blue) sensitive water-resisting photopolymerYANG WEI; ZHANG HELING; YANGQIANG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 68320Z.1-68320Z.6, issn 0277-786X, isbn 978-0-8194-7007-2Conference Paper

Monomer diffusion rates in photopolymer material. Part I. Low spatial frequency holographic gratingsCLOSE, C. E; GLEESON, M. R; SHERIDAN, J. T et al.Journal of the Optical Society of America. B, Optical physics (Print). 2011, Vol 28, Num 4, pp 658-666, issn 0740-3224, 9 p.Article

Two-way diffusion model for short-exposure holographic grating formation in acrylamide- based photopolymerBABEVA, Tsvetanka; NAYDENOVA, Izabela; MACKEY, Dana et al.Journal of the Optical Society of America. B, Optical physics (Print). 2010, Vol 27, Num 2, pp 197-203, issn 0740-3224, 7 p.Article

NPDD model: A tool for photopolymer enhancementGLEESON, Michael R; JINXIN GUO; SHUI LIU et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8074, issn 0277-786X, isbn 978-0-8194-8664-6, 807407.1-807407.15Conference Paper

Development of technologies for layer-by-layer laser synthesis of 3D parts in Russia and BelarusVASILTSOV, V. V; GREZEV, A. N; EVSEEV, A. V et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 673111.1-673111.9, issn 0277-786X, isbn 978-0-8194-6889-5, 1VolConference Paper

Formation des liaisons d'adhésion au moyen d'un photoresistSKOROBOGATOV, A. A; ALEKSEEV, O. V; SHVIDKAYA, N. YU et al.Plastičeskie massy. 1983, Num 9, pp 17-18, issn 0554-2901Article

Switchable liquid crystalline photopolymer media for holographyJIAN ZHANG; SPONSLER, M. B.Journal of the American Chemical Society. 1992, Vol 114, Num 4, pp 1506-1507, issn 0002-7863Article

Analysis of holographic grating formation in photopolymer with a dynamic diffusion modelTAO ZHANG; SHIQUAN TAO; QINAN LI et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7851, issn 0277-786X, isbn 978-0-8194-8381-2, 785113.1-785113.7Conference Paper

Maximum effective optical thickness of the gratings recorded in photopolymersGALLEGO, S; ORTUNO, M; NEIPP, C et al.Proceedings of SPIE, the International Society for Optical Engineering. 2005, pp 107-117, issn 0277-786X, isbn 0-8194-5812-0, 1Vol, 11 p.Conference Paper

Dynamic viscoelastic measurements of photosensitive polymersWATANABE, K; AMARI, T; OTSUBO, Y et al.Journal of applied polymer science. 1984, Vol 29, Num 1, pp 57-66, issn 0021-8995Article

Properties of multilayer nonuniform holographic structuresPEN, E. F; RODIONOV, M. Yu.Quantum electronics (Woodbury). 2010, Vol 40, Num 10, pp 919-924, issn 1063-7818, 6 p.Article

Holographic scattering in phenanthrenequinone-doped poly(methyl methacrylate) bulk photopolymersHONGPENG LIU; DAN YU; XIUDONG SUN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7125, issn 0277-786X, isbn 978-0-8194-7359-2 0-8194-7359-6, 1Vol, 71250G.1-71250G.5Conference Paper

Novel negative-type soluble photosensitive polyimides : Synthesis and characterizationBERRADA, M; CARRIER, F; COUTIN, B et al.Chemistry of materials. 1996, Vol 8, Num 5, pp 1029-1034, issn 0897-4756Article

Curing study of a preimidized photosensitive polyimideRICH, D. C; SICHEL, E. K; CEBE, P et al.Polymer engineering and science. 1996, Vol 36, Num 17, pp 2179-2187, issn 0032-3888Article

Rapid prototyping shapes up as low-cost modeling alternativeLINDSAY, K. F.Modern plastics international. 1990, Vol 20, Num 11, pp 75-78, issn 0026-8283, 4 p.Article

Photo-crosslinking of poly(2,3-epoxypropyl methacrylate) with imino sulfonatesSHIRAI, M; MASUDA, T; TSUNOOKA, M et al.Die Makromolekulare Chemie. Rapid communications. 1984, Vol 5, Num 10, pp 689-693, issn 0173-2803Article

Low-temperature luminescence spectra and fluorescence lifetimes of polycytidylic acid in polyalcoholic glassesVECER, J; HERMAN, P; BERANEK, J et al.Photochemistry and photobiology. 1993, Vol 57, Num 5, pp 792-795, issn 0031-8655Article

SUR LA FORMATION DE FILMS DE RESINE PHOTOSENSIBLE PAR LA METHODE DE CENTRIFUGATIONPARAMONOV AL; PROKHOTSKIJ YU M.1976; ZH. NAUCH. PRIKL.; S.S.S.R.; DA. 1976; VOL. 21; NO 2; PP. 85-88; BIBL. 11 REF.Article

PHOTOACTIVE POLYMERS: THE PHOTOPHYSICAL ASPECTSFOX RB.1975; AMER. CHEM. SOC., DIV. POLYM. CHEM., POLYM. PREPR.; U.S.A.; DA. 1975; VOL. 16; NO 2; PP. 177-181; BIBL. 4 REF.; (AM. CHEM. SOC., DIV. POLYM. CHEM. MEET. PREPR.; CHICAGO; 1975)Conference Paper

UTILISATION DE LA METHODE D'ANALYSE THERMOGRAVIMETRIQUE (ATG) POUR L'EVALUATION DE LA THERMOSTABILITE DES COMPOSES PHOTOSENSIBLESANDRIANOVA AV; VOSKOBOJNIK GA; KOZLOVA TP et al.1973; TRUDY KHIM. KHIM. TEKHNOL.; S.S.S.R.; DA. 1973; NO 3; PP. 91-92; BIBL. 3 REF.Article

UN SYSTEME CYREL, POUR LA CONFECTION DE PLAQUES PHOTOPOLYMERES POUR LA FLEXOGRAPHIE1975; EMBALLAGES; FR.; DA. 1975; NO 326; PP. 109Article

EMPLOI DE RESINES PHOTOSENSIBLESWARASHINA T; AKAMATSU K.1975; J. JAP. SOC. COLOUR MATER.; JAP.; DA. 1975; VOL. 48; NO 8; PP. 502-508; BIBL. 16 REF.Article

BREVET 2.238.953 (A1) (7425432). A 23 JUILLET 1974. PROCEDE POUR L'OBTENTION DE MASQUE PROTECTEUR CONTRE LES ULTRAVIOLETSsdPatent

  • Page / 100