A flexible and efficient approach to E-beam proximity effect correction - PYRAMIDLEE, Soo-Young.Surface and interface analysis. 2005, Vol 37, Num 11, pp 919-926, issn 0142-2421, 8 p.Conference Paper

Extraction of the point-spread function in electron-beam lithography using a cross geometrySCHEFZYK, D; BIESINGER, D. E. F; WHARAM, D. A et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 1091-1094, issn 0167-9317, 4 p.Conference Paper

New proximity effect correction for under 100nm patternsSHOJI, Masahiro; HORIUCHI, Nobuyasu; CHIKANAGA, Tomoyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6194-6, 2Vol, VOL 2,615128.1-615128.10Conference Paper

Superconducting proximity effect in single-crystal Sn nanowiresHAIDONG LIU; ZUXIN YE; HONG ZHANG et al.Physica. B, Condensed matter. 2008, Vol 403, Num 5-9, pp 1542-1543, issn 0921-4526, 2 p.Conference Paper

Dependence of proximity-induced supercurrent on junction length in multilayer-graphene Josephson junctionsKANDA, A; SATO, T; GOTO, H et al.Physica. C. Superconductivity. 2010, Vol 470, Num 20, pp 1477-1480, issn 0921-4534, 4 p.Conference Paper

Gate-controlled superconducting proximity effect in ultrathin graphite filmsSATO, T; MORIKI, T; TANAKA, S et al.Physica. E, low-dimentional systems and nanostructures. 2008, Vol 40, Num 5, pp 1495-1497, issn 1386-9477, 3 p.Conference Paper

Theoretical study of superconducting proximity effect in single and multi-layered grapheneHAYASHI, Masahiko; YOSHIOKA, Hideo; KANDA, Akinobu et al.Physica. C. Superconductivity. 2010, Vol 470, Num SUP1, issn 0921-4534, S846-S847Conference Paper

Fabrication of ultrashort graphene Josephson junctionsTOMORI, H; KANDA, A; GOTO, H et al.Physica. C. Superconductivity. 2010, Vol 470, Num 20, pp 1492-1495, issn 0921-4534, 4 p.Conference Paper

Proximity effect in ferromagnet-antiferromagnet systemsMOROSOV, A. I; SIGOV, A. S.Journal of magnetism and magnetic materials. 2003, Vol 258-59, pp 388-390, issn 0304-8853, 3 p.Article

Characterization of the interface between a normal metal and a superconductor using magnetic screeningSOULEN, R. J; CLAASSEN, J. H; OSOFSKY, M. S et al.IEEE transactions on applied superconductivity. 2003, Vol 13, Num 2, pp 2838-2841, issn 1051-8223, 4 p., 3Conference Paper

Scanner-dependent Optical Proximity EffectsTYMINSKI, Jacek K; MATSUYAMA, Tomoyuki; NAKASHIMA, Toshiharu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 72740U.1-72740U.9, 2Conference Paper

Observation of a novel, inelastic, charge-imbalance relaxation process in superconductor-insulator-normal-metal tunnel junctionsLEMBERGER, T. R; YEN, Y.Physical review. B, Condensed matter. 1984, Vol 29, Num 11, pp 6384-6386, issn 0163-1829Article

Proximity effect sandwiches containing local spin fluctuationsTANG, I. M; ROONGKEADSAKOON, S.Journal of low temperature physics. 1984, Vol 56, Num 5-6, pp 441-460, issn 0022-2291Article

Tunable ion-swelling for nanopatterning of macroscopic surfaces: The role of proximity effectsNAGY, N; ZOLNAI, Z; FÜLÖP, E et al.Applied surface science. 2012, Vol 259, pp 331-337, issn 0169-4332, 7 p.Article

Enhancing the rules for optical proximity correction to improve process latitudeMARTIN, Brian; ARTHUR, Graham.SPIE proceedings series. 2001, pp 631-636, isbn 0-8194-4030-2Conference Paper

GAP MEASUREMENT IN PROXIMITY REPLICATION SYSTEMSFROSCH A; MANNSDOERFER W; SCHEUING C et al.1977; COLLOQUE INTERNATIONAL SUR LA MICROLITHOGRAPHIE, MICROELECTRONIQUE, OPTIQUE; FRA; DA. 1977; DGRST-7771946; PP. 125Conference Paper

Expanding the process window and reducing the optical proximity effect by post-exposure delayKU, Chin-Yu; SHIEH, Jia-Min; CHIOU, Tsann-Bim et al.Journal of the Electrochemical Society. 2001, Vol 148, Num 8, pp G434-G438, issn 0013-4651Article

Proton beam writing of three-dimensional nanostructures in hydrogen silsesquioxaneVAN KAN, Jeroen A; BETTIOL, Andrew A; WATT, Frank et al.Nano letters (Print). 2006, Vol 6, Num 3, pp 579-582, issn 1530-6984, 4 p.Article

Fluctuation paraconductivity in superconducting multilead structures above the transition temperatureTAKANE, Yositake.Journal of the Physical Society of Japan. 2001, Vol 70, Num 2, pp 498-504, issn 0031-9015Article

Les effets de proximité en microlithographie : caractérisation et étude des méthodes de correction = Proximity effects in microlithography : characterization and evaluation of the correction strategiesToublan, Olivier; Guillemot, Nadine.1999, 190 p.Thesis

Strategy to manipulate the optical proximity effect by post-exposure bake processingGAU, T.-S; WANG, C.-M; DAI, C.-M et al.SPIE proceedings series. 1998, pp 885-891, isbn 0-8194-2779-9Conference Paper

Proximity effect reduction in x-ray mask making using thin silicon dioxide layersRHEE, K. W; MA, D. I; PECKERAR, M. C et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 3062-3066, issn 1071-1023Conference Paper

A new method for correcting proximity and fogging effects by using the EID model of variable shaped beam for 65- nm nodePARK, Eui-Sang; CHO, Hyun-Joon; KIM, Jin-Min et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-5853-8, 2Vol, Part 1, 58-65Conference Paper

Flexible sparse and dense OPC algorithmsCOBB, Nick.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-5853-8, 2Vol, Part 2, 693-702Conference Paper

Influence of underlayer reflection on optical proximity effects in sub-quarter micron lithographySEKIGUCHI, A; UESAWA, F; TAKEUCHI, K et al.SPIE proceedings series. 1998, pp 347-355, isbn 0-8194-2779-9Conference Paper