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ARGON ENTRAPMENT IN METAL FILMS BY DC TRIODE SPUTTERING.LEE WWY; OBLAS D.1975; J. APPL. PHYS.; U.S.A.; DA. 1975; VOL. 46; NO 4; PP. 1728-1732; BIBL. 16 REF.Article

OBSERVATION OF TWIN FAULTS IN SPUTTER-DEPOSITED HIGH-PURITY NICKELWANG R; DAHLGREN SD.1975; J. MATER. SCI.; G.B.; DA. 1975; VOL. 10; NO 8; PP. 1456-1458; BIBL. 4 REF.Article

EFFECTS OF DEPOSITION TEMPERATURE AND SUBSTRATE BIAS ON ORIENTATION AND HARDNESS OF THICK SPUTTER DEPOSITED BERYLLIUM FOILSPATTEN JW; MCCLANAHAN ED.1973; J. LESS-COMMON METALS; NETHERL.; DA. 1973; VOL. 30; NO 3; PP. 351-359; BIBL. 8 REF.Serial Issue

APPLICATIONS OF SPUTTERING-PAST, PRESENT AND FUTURE.WEINIG S.1974; IN: SCI. TECHNOL. SURF. COATING. NATO ADV. STUDY INST.; LONDON; 1972; LONDON; ACAD. PRESS; DA. 1974; PP. 386-392Conference Paper

Comportement d'un film mince de cuivre sur un substrat de cordiérite = Thermal behaviour of copper layers on cordierite substrateGondolf, Marc; Guille, Jean-Louis.1991, 169 p.Thesis

Sputter coating = Revêtement par pulvérisation cathodiqueHOWSON, R. P.Surfacing journal. 1983, Vol 14, Num 2, pp 27-32, issn 0307-7365Article

SPUTTERING AND ITS APPLICATIONS - THE PRESENT STATUS. = DEPOT PAR PULVERISATION CATHODIQUE ET SES APPLICATIONS, ETAT ACTUELCAMBEY LA; WEINIG S.1978; IN: INTERN. CONF. ADVANCES SURFACE COATING TECHNOL.; LONDON; 1978; ABINGTON, CAMBRIDGE; WELDG INST.; DA. 1978; PP. 45-52; D'APRES ANALYSE DE WELDG INST.Conference Paper

CHARACTERIZATION OF SILVER COATINGS DEPOSITED FROM A HOLLOW CATHODE SOURCEAMH G; MCLEOD PS; WILLIAMS DG et al.1974; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1974; VOL. 11; NO 4; PP. 663-665; BIBL. 11 REF.; (CONF. STRUCT. PROP. RELATIONSHIPS THICK FILMS BULK COATINGS. PROC.; SAN FRANCISCO; 1974)Conference Paper

THE BASIC PRINCIPLES OF SPUTTER DEPOSITION.HOLLAND L.1974; IN: SCI. TECHNOL. SURF. COATING. NATO ADV. STUDY INST.; LONDON; 1972; LONDON; ACAD. PRESS; DA. 1974; PP. 369-385; BIBL. 1 P.Conference Paper

SPUTTER DEPOSITION OF THIN FILMS: THEORY AND EXPERIMENT = DEPOT DE COUCHES MINCES PAR PULVERISATION CATHODIQUE: THEORIE ET EXPERIENCEDOWNER D.1975; SURFG J.; G.B.; DA. 1975; VOL. 6; NO NO 3; PP. 1-5; BIBL. 20 REF.Article

ELECTRON EFFECTS IN SPUTTERING AND COSPUTTERING.CHAMPMAN BN; DOWNER D; GUIMARAES LJM et al.1974; J. APPL. PHYS.; U.S..A.; DA. 1974; VOL. 45; NO 5; PP. 2115-2120; BIBL. 14 REF.Article

CO-SPUTTERING. ITS LIMITATIONS AND POSSIBILITIES.HANAK JJ.1975; VIDE; FR.; DA. 1975; NO 175; PP. 11-18; BIBL. 32 REF.Article

COLUMNAR GRAINS AND TWINS IN HIGH-PURITY SPUTTER-DEPOSITED COPPERDAHLGREN SD.1974; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1974; VOL. 11; NO 4; PP. 832-836; BIBL. 13 REF.; (CONF. STRUCT. PROP. RELATIONSHIPS THICK FILMS BULK COATINGS. PROC.; SAN FRANCISCO; 1974)Conference Paper

SPUTTERING OF RHODIUM FILMSCOX REL; HERSEE SD.1972; THIN SOLID FILMS; NETHERL.; DA. 1972; VOL. 11; NO 2; PP. 323-328; BIBL. 3 REF.Serial Issue

LOIS DE VARIATION EN FONCTION DE LA TEMPERATURE DE LA COMPOSANTE IONIQUE DE LA PULVERISATION CATHODIQUE DES METAUX REFRACTAIRES DANS UNE ATMOSPHERE D'OXYGENEADYLOV AA; VEKSLER VI; REZNIK AM et al.1975; IZVEST. AKAD. NAUK NZ. S.S.R., FIZ.-MAT. NAUK; S.S.S.R.; DA. 1975; VOL. 19; NO 2; PP. 81-83; BIBL. 5 REF.Article

INVESTIGATION OF HOLLOW CATHODE EFFECTS ON THE STRUCTURE OF BULK FILMSSTOWELL WR; CHAMBERS D.1974; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1974; VOL. 11; NO 4; PP. 653-656; BIBL. 5 REF.; (CONF. STRUCT. PROP. RELATIONSHIPS THICK FILMS BULK COATINGS. PROC.; SAN FRANCISCO; 1974)Conference Paper

BREVET 2.260.451 (A1) (7504327). A 12 FEVRIER 1975. PROCEDE D'ELABORATIONS D'UNE CONFIGURATION DE COUCHE SUR UN SUBSTRATsdPatent

METALIZING NONCONDUCTORS. VIII. SPUTTERINGGROSHART E.1973; METAL FINISHG; U.S.A.; DA. 1973; VOL. 11; NO 1; PP. 44-48Serial Issue

BREVET 2.132.033 (B) (7209791). A 21 MARS 1972. DISPOSITIF DE REVETEMENT DE PLAQUES DE GRANDE SURFACE EN VERRE OU AUTRES MATIERES PAR PULVERISATION CATHODIQUEsdPatent

BREVET 2.139.841 (B) (7214368). A 18 AVRIL 1972. PROCEDE DE DEPOT DE COUCHES MAGNETISABLES SUR UN SUBSTRAT PAR PULVERISATION CATHODIQUEsdPatent

LA PULVERISATION CATHODIQUE.CATIER E.1978; TRAITEMENTS DE SURFACE; FR.; DA. 1978; NO 160; PP. 7-20Article

EFFECTS OF DEPOSITION PARAMETERS ON PROPERTIES OF RF SPUTTERED MOLYBDENUM FILMSNOWICKI RS; BUCKLEY WD; MACKINTOSH WD et al.1974; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1974; VOL. 11; NO 4; PP. 675-679; BIBL. 14 REF.; (CONF. STRUCT. PROP. RELATIONSHIPS THICK FILMS BULK COATINGS. PROC.; SAN FRANCISCO; 1974)Conference Paper

DISPOSITIFS POUR LA PRODUCTION DE FILTRES INTERFERENTIELS DE BANDE ETROITE PAR LA METHODE DE PULVERISATION CATHODIQUELAVRISHCHEV AP.1974; OPT.-MEKH. PROMYSL.; S.S.S.R.; DA. 1974; NO 6; PP. 44-47; BIBL. 4 REF.Article

SPUTTER COATINGS. ITS PRINCIPLES AND POTENTIALTHORNTON JA.1973; S.A.E. TRANS.; U.S.A.; DA. 1973; VOL. 82; NO 3; PP. 1787-1805; BIBL. 1 P. 1/2Article

BREVET 2.324.755 (A1) (75 28778). - 19 SEPTEMBRE 1975. DISPOSITIF DE PULVERISATION CATHODIQUE DE GRANDE VITESSE DE DEPOT.sdPatent

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