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Structural and elastic properties of zirconium nitrite-aluminium nitride multilayersMENG, W. J; EESLEY, G. L; SVINARICH, K. A et al.Physical review. B, Condensed matter. 1990, Vol 42, Num 7A, pp 4881-4884, issn 0163-1829Article

Characterization of radio frequency unbalanced magnetronsWINDOW, B; HARDING, G. L.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1992, Vol 10, Num 5, pp 3300-3304, issn 0734-2101Article

Radio frequency sputtering process of a polytetrafluoroethylene target and characterization of fluorocarbon polymer filmsMARECHAL, N; PAULEAU, Y.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1992, Vol 10, Num 3, pp 477-483, issn 0734-2101Article

Influence of synthesis conditions on optical and electrical properties of CaTiO₃:Pr³⁺ thin films deposited by radiofrequency sputtering for electroluminescent deviceSARAKHA, Ludovic; BEGOU, Thomas; GOULLET, Antoine et al.Surface & coatings technology. 2011, Vol 205, issn 0257-8972, S250-S253, SUP2Conference Paper

Preparation of a BiFeO₃/LaNiO₃ multiferroic oxide superlattice structure by RF magnetron sputteringLIU, Yen-Ting; CHIU, Shang-Jui; LEE, Hsin-Yi et al.Surface & coatings technology. 2011, Vol 206, Num 7, pp 1666-1672, issn 0257-8972, 7 p.Conference Paper

Characterization of Ag_x(Ge₂Sb₂Te₅)_{1- x} thin film by RF magnetron sputteringDONG HUN KIM; MYUNG SUN KIM; KIM, Ran-Young et al.Materials characterization. 2007, Vol 58, Num 5, pp 479-484, issn 1044-5803, 6 p.Article

Evolution of the Er environment in a-Si:H under annealing: ion implantation versus co-depositionTESSLER, L. R; PIAMONTEZE, C; MARTINS ALVES, M. C et al.Journal of non-crystalline solids. 2000, Vol 266-69, pp 598-602, issn 0022-3093, 5 p., aConference Paper

Static characteristics of piezoelectric thin film buckling actuatorWAKABAYASHI, S; SAKATA, M; GOTO, H et al.Japanese journal of applied physics. 1996, Vol 35, Num 9B, pp 5012-5014, issn 0021-4922, 1Conference Paper

Sputtering of semiconductive TiO₂ thin films and evaluation of their sensitivity to NO gasKUWANO, S; ITOH, Y; HATAKEYAMA, Y et al.Hyomen gijutsu. 1994, Vol 45, Num 8, pp 800-804, issn 0915-1869Article

An introduction to sputtering of magnetic and magneto-optic thin films for data recordingWILLIAMS, E. W.Journal of magnetism and magnetic materials. 1991, Vol 95, Num 3, pp 356-364, issn 0304-8853Article

R.F. diode sputteringLOGAN, J. S.Thin solid films. 1990, Vol 188, Num 2, pp 307-321, issn 0040-6090, 15 p.Article

Preparation of cubic boron nitride films by RF sputteringMIENO, M; YOSHIDA, T.Japanese journal of applied physics. 1990, Vol 29, Num 7, pp L1175-L1177, issn 0021-4922, 2Article

Improved magnetron sputtering systems using ring-type permanent magnetsOHNUMA, T; ISHII, M; KUROKO, T et al.Japanese journal of applied physics. 1989, Vol 28, Num 7, pp 1286-1287, issn 0021-4922, 2 p.Article

Structure dependence in the hydrogenation of acetylene over columnar Pd filmTAMAKI, J; IMANAKA, T.Bulletin of the Chemical Society of Japan. 1988, Vol 61, Num 5, pp 1800-1802, issn 0009-2673Article

Epitaxial MnCdHgTe layers obtained by RF sputtering in mercury plasmaKAVYCH, Volodymyr; LOZYNSKA, Maria; MANSUROV, Leonid et al.SPIE proceedings series. 2003, pp 434-439, isbn 0-8194-4986-5, 6 p.Conference Paper

Effect of heat treatment on electric properties of Bi₄Ti₃O₁₂ thin films by two-dimensional RF magnetron sputteringKUDOH, K; HIGUCHI, T; IWASA, M et al.Proceedings - IEEE International Symposium on Applications of Ferroelectrics. 2002, pp 167-170, issn 1099-4734, isbn 0-7803-7414-2, 4 p.Conference Paper

Joining AlN ceramic to metals with R.F. sputtering filmWLOSINSKI, W; ZHU, S.Advances in science and technology. 1999, pp C987-C994, isbn 88-86538-14-6, 5VolConference Paper

New forms of hydrogen-free amorphous carbon filmsLOGOTHETIDIS, S; GIOTI, M; LIOUTAS, C et al.Carbon (New York, NY). 1998, Vol 36, Num 5-6, pp 539-543, issn 0008-6223Conference Paper

X-ray structural analysis of multilayered Co/noble metal filmsYAMANE, H; MAENO, Y; KOBAYASHI, M et al.Materials transactions - JIM. 1995, Vol 36, Num 6, pp 705-711, issn 0916-1821Article

A new high rate and low temperature sputtering method for small size magnetic targetHOSHI, Y; NAOE, M.IEEE transactions on magnetics. 1991, Vol 27, Num 6, pp 4870-4872, issn 0018-9464, 2Article

Y-Ba-Cu-O high temperature superconductor thin film preparation by pulsed laser deposition and RF sputtering : a comparative studyHABERMEIER, H.-U; BEDDIES, G; LEIBOLD, B et al.Physica. C. Superconductivity. 1991, Vol 180, Num 1-4, pp 17-25, issn 0921-4534Conference Paper

Surface morphology and crystal structures of as-grown BiSrCaCuO thin films prepared by RF magnetron sputtering from three targetsKURODA, K; KOJIMA, K; TANIOKU, M et al.Japanese journal of applied physics. 1989, Vol 28, Num 9, pp 1586-1592, issn 0021-4922, 7 p., 1Article

The characteristics of Cd_xSn_1―xO films prepared by RF magnetron sputtering from powder targetsZHOU, Y. W; LIU, X; WU, F. Y et al.Surface & coatings technology. 2013, Vol 228, issn 0257-8972, S150-S154, SUP1Conference Paper

Investigation of Si-M (M = Mo, Ti, or V) negative electrodes fabricated using RF/DC magnetron sputtering for lithium ion batteriesHWANG, Chang-Mook; PARK, Jong-Wan.Surface & coatings technology. 2010, Vol 205, issn 0257-8972, S439-S446, SUP1Conference Paper