Macroparticle contamination in cathodic arc coatings: generation, transport and controlBOXMAN, R. L; GOLDSMITH, S.Surface & coatings technology. 1992, Vol 52, Num 1, pp 39-50, issn 0257-8972Conference Paper

Ion sputtering targets electrolytically prepared = Cibles de pulvérisation par ions préparées électrolytiquementJOKIC, T; GONCIC, B.Applied surface science. 1986, Vol 25, Num 1-2, pp 213-216, issn 0169-4332Article

Polyurethane coating systems for cathodic electrodepositionRAMASRI, M; SRINIVASA RAO, G. S; SAMPATHKUMARAN, P. S et al.JCT, Journal of coatings technology. 1989, Vol 61, Num 777, pp 129-134, issn 0361-8773, 6 p.Article

Composition of magnetron-sputtered aluminum alloy filmsLIU, D. R; NORIAN, K. H.Thin solid films. 1989, Vol 173, Num 1, pp L115-L118, issn 0040-6090Article

An investigation of the sputtering process in the microwave-coupled hollow cathode discharge = Une étude du processus de pulvérisation dans la décharge d'une cathode creuse couplée microondeVIOLANTE, N; SENOFONTE, O; MARCONI, A et al.Canadian journal of spectroscopy. 1988, Vol 33, Num 2, pp 49-55, issn 0045-5105Article

Application of 60 mmΦ superconducting bulk magnet to magnetron sputteringMATSUDA, T; KASHIMOTO, S; IMAI, A et al.Physica. C. Superconductivity and its applications. 2003, Vol 392-96, pp 696-703, 8 p., 1Conference Paper

Formation of diamond-like carbon films by 50 Hz sputtering from dual graphite targetsAMORNKITBAMRUNG, V; SUTTISIRI, N.Surface & coatings technology. 1991, Vol 47, Num 1-3, pp 533-537, issn 0257-8972Conference Paper

A novel method of sputter deposition utilizing a hot-cathode penning ion sourceSHOJI, F; OURA, K.Japanese journal of applied physics. 1990, Vol 29, Num 5, pp L812-L814, issn 0021-4922, 2Article

Bestimmung der Wärmeleitfähigkeit von Festkörpern und Plasmapritzschichten = Détermination de la conductibilité thermique de solides et de couches déposées par plasma = Determination of thermal conductivity of solids and plasma-deposited filmsLEUZINGER, J. P; DUBLER, T.Sprechsaal (1976). 1988, Vol 121, Num 3, pp 198-200, issn 0341-0676Article

Magnetic properties of Dy(Tb)Co/Cr thin films for hybrid recordingLEE, Z. Y; JIN, F; WANG, K et al.Microsystem technologies. 2007, Vol 13, Num 2, pp 165-168, issn 0946-7076, 4 p.Conference Paper

Etude d'un capteur potentiométrique élaboré à partir d'alumine-bêta. Interprétation des phénomènes électrochimiques observés en présence de dioxyde de soufre et de monooxyde de carbone = Study of potentiometric sensor developed from sodium-beta alumina. Interpretation of electrochemical phenomena recorded under sulphur dioxide and carbon monoxideFascetta Visconte, Eliette; Lalauze, René.1993, 167 p.Thesis

Sputtered ain films for semiconductor lasersWANG DEHUANG; GUO LIANG; ZHU SUZHEN et al.Thin solid films. 1990, Vol 187, Num 1, pp 127-132, issn 0040-6090Article

Studies on the mechanism of atom formation and loss from the ATOM-SOURCE cathodic sputtering atomizer for atomic absorption spectrometryCHAKRABARTI, C. L; HEADRICK, K. L; HUTTON, J. C et al.Spectrochimica acta. Part B : Atomic spectroscopy. 1989, Vol 44, Num 4, pp 385-394, issn 0584-8547Article

Emission spectroscopy diagnostics of a magnetron sputter dischargeCOOK, J. G; DAS, S. R.Journal of applied physics. 1989, Vol 65, Num 5, pp 1846-1851, issn 0021-8979, 6 p.Article

Incline glass coaters and turnkey systemsDACHSELT, W.-D.Glass (Redhill). 1987, Vol 64, Num 5, pp 196-199, issn 0017-0984, 3 p.Article

Process and engineering benefits of sputter-ion-plated titanium nitride coatings = Procédé et bénéfices technologiques des dépôts ioniques pulvérisés de nitrure de titaneJACOBS, M. H.Surface & coatings technology. 1986, Vol 29, Num 3, pp 221-237, issn 0257-8972Conference Paper

Effects of the magnetic field and negatively biased substrate voltage on TiN film depositionUN-HAK HWANG.Journal of applied physics. 1991, Vol 69, Num 9, pp 6643-6646, issn 0021-8979Article

Preparation of YBCO thin films by means of a hollow cathode discharge sputtering deviceLUDWIG, F; HINKEL, V; SCHURIG, T et al.Physica. C. Superconductivity. 1991, Vol 180, Num 1-4, pp 85-89, issn 0921-4534Conference Paper

Deposition of optical thin films by pulsed laser assisted evaporationSANKUR, H. O; GUNNING, W.Applied optics. 1989, Vol 28, Num 14, pp 2806-2808, issn 0003-6935Article

Thermal stability of TiN films deposited onto silicon substratesPOITEVIN, J. M; MATHEO, D; LEMPERIERE, G et al.Thin solid films. 1989, Vol 176, Num 1, pp 7-11, issn 0040-6090, 5 p.Article

Les paramètres contrôlant la qualité des dépôts plasmas de céramiques et des cermets obtenus par projection plasma à la pression atmosphérique = Parameters controling quality of plasma coatings of ceramics and cermets produced by atmospheric pressure plasma sprayingFAUCHAIS, P; VARDELLE, A; VARDELLE, M et al.Le Vide, les couches minces. 1986, Num 232, pp 133-141, issn 0223-4335Conference Paper

Sputtered metal-silicon thin films studied by Auger electron spectroscopyPAYLING, R; HARDING, G. L; CRAIG, S et al.Applied surface science. 1985, Vol 24, Num 1, pp 11-17, issn 0169-4332Article

Flexible and performing upgrades of vacuum coatersBLONDEEL, Anja; VAN DE PUTTE, Ivan; VERLINDEN, Bart et al.Glass international. 2007, Vol 30, Num 8, pp 57-58, issn 0143-7836, 2 p.Article

Ultra sensitive low temperature metal oxide gas sensorsKIRIAKIDIS, G; KATSARAKIS, N; KATHARAKIS, M et al.International Semiconductor Conference. 2004, pp 325-331, isbn 0-7803-8499-7, 7 p.Conference Paper

Novel approach to sputtered tantalum film resistors with controlled pre-defined resistanceGOLAN, G; AXELEVITCH, A; MARGOLIN, R et al.Microelectronics journal. 2001, Vol 32, Num 1, pp 61-67, issn 0959-8324Article