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Results 1 to 25 of 831

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Simulation of ion beam sputtering with SDTrimSP, TRIDYN and SRIMHOFSÄSS, H; ZHANG, K; MUTZKE, A et al.Applied surface science. 2014, Vol 310, pp 134-141, issn 0169-4332, 8 p.Conference Paper

In situ ellipsometric study of optical properties of ultrathin filmsYAMAMOTO, M; NAMIOKA, T.Applied optics. 1992, Vol 31, Num 10, pp 1612-1621, issn 0003-6935Article

Sputter reduction of oxides by ion bombardment during auger depth profile analysisMITCHELL, D. F; SPROULE, G. I; GRAHAM, M. J et al.Surface and interface analysis. 1990, Vol 15, Num 8, pp 487-497, issn 0142-2421Article

Nickel catalysed sixfold ring clustering and graphitisation in C:Ni nanocomposites : A Raman analysisKRAUSE, M; ABRASONIS, G; KOLITSCH, A et al.Physica status solidi. B. Basic research. 2007, Vol 244, Num 11, pp 4236-4239, issn 0370-1972, 4 p.Conference Paper

Measurements of losses in high reflectance mirrors coated for λ=514.5 nmROBERTSON, N. A; STRAIN, K. A; HOUGH, J et al.Optics communications. 1989, Vol 69, Num 5-6, pp 345-348, issn 0030-4018Article

Angular-resolved ion-bean sputtering apparatus for large-area depositionMOTOHIRO, T; YAMADENA, H; TAGA, Y et al.Review of scientific instruments. 1989, Vol 60, Num 8, pp 2657-2665, issn 0034-6748Article

Cone formation on copper by ion-beam sputteringSEN, A. K; GHOSE, D.Journal of materials science letters. 1991, Vol 10, Num 22, pp 1304-1306, issn 0261-8028Article

Proposal for device transplantation using a focused ion beamOHNISHI, T; KAWANAMI, Y; ISHITANI, T et al.Japanese journal of applied physics. 1990, Vol 29, Num 1, pp L188-L190, issn 0021-4922, 2Article

Getting skin deep with ion beamsKEMPFER, L.Materials engineering. 1990, Vol 107, Num 4, pp 29-32, issn 0025-5319, 4 p.Article

Deposition of carbonaceous films using ECR plasma apparatus deposition of colorless, transparent and semiconducting film from methane plasmaFUJITA, T; MATSUMOTO, O.Journal of the Electrochemical Society. 1989, Vol 136, Num 9, pp 2624-2629, issn 0013-4651, 6 p.Article

A compact ion source using a hollow cathode discharge and its application to thin film formationTAKEUCHI, M; YANAGIDA, K; NAGASAKA, H et al.Thin solid films. 1986, Vol 144, Num 2, pp 281-288, issn 0040-6090Article

Development of hydrophobicity of mica surfaces by ion beam sputteringMETYA, Amaresh; GHOSE, Debabrata; NIHAR RANJAN RAY et al.Applied surface science. 2014, Vol 293, pp 18-23, issn 0169-4332, 6 p.Article

The effect of plasma impurities on the sputtering of tungsten carbideVÖRTLER, K; BJÖRKAS, C; NORDLUND, K et al.Journal of physics. Condensed matter (Print). 2011, Vol 23, Num 8, issn 0953-8984, 108502.1-108502.8Article

Innovative production of thin film laser componentsSCHERER, Michael; HAGEDORN, Harro; LEHNERT, Walter et al.Proceedings of SPIE, the International Society for Optical Engineering. 2005, pp 596319.1-596319.10, issn 0277-786X, isbn 0-8194-5981-X, 1VolConference Paper

Ion beam sputtering for progressive reduction of nanostructures dimensionsSAVOLAINEN, M; TOUBOLTSEV, V; KOPPINEN, P et al.Applied physics. A, Materials science & processing (Print). 2004, Vol 79, Num 7, pp 1769-1773, issn 0947-8396, 5 p.Article

Nanopatterning of silicon surfaces by low-energy ion-beam sputtering: dependence on the angle of ion incidenceGAGO, R; VAZQUEZ, L; CUERNO, R et al.Nanotechnology (Bristol. Print). 2002, Vol 13, Num 3, pp 304-308, issn 0957-4484, 5 p.Conference Paper

Faster compound analysis by mass spectrometry : the ToF revolutionHASKINS, Neville J.Journal of pharmaceutical and biomedical analysis. 2001, Vol 25, Num 5-6, pp 767-773, issn 0731-7085Article

Raman scattering studies on the C60 films deposited by ionized cluster beam deposition (ICBD) techniqueSHI, Y; FAN, X. J; GUO, H. X et al.Solid state communications. 1996, Vol 99, Num 6, pp 445-450, issn 0038-1098, 5 p.Article

An introduction to sputtering of magnetic and magneto-optic thin films for data recordingWILLIAMS, E. W.Journal of magnetism and magnetic materials. 1991, Vol 95, Num 3, pp 356-364, issn 0304-8853Article

Ion beam sputtering of in situ superconducting Y-Ba-Cu-O filmsKLEIN, J. D; YEN, A; CLAUSON, S. L et al.Journal of applied physics. 1990, Vol 67, Num 10, pp 6389-6393, issn 0021-8979Article

Multiple charging in electrospray ionization of poly(ethylene glycols)WONG, S. F; MENG, C. K; FENN, J. B et al.Journal of physical chemistry (1952). 1988, Vol 92, Num 2, pp 546-550, issn 0022-3654Article

Preferential growth and enhanced dielectric properties of Ba0.7Sr0.3TiO3 thin films with preannealed Pt bottom electrodeXIAOHONG ZHU; DEFAY, Emmanuel; AÏD, Marc et al.Journal of physics. D, Applied physics (Print). 2013, Vol 46, Num 10, issn 0022-3727, 105301.1-105301.6Article

Damage threshold investigations of high power laser optics under atmospheric and vacuum conditionsJENSEN, L; JUPE, M; MÄDEBACH, H et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 64030U.1-64030U.10, issn 0277-786X, isbn 978-0-8194-6501-6, 1VolConference Paper

Automated system for laser damage testing of coated opticsNESS, Dale C; STREATER, Alan D.Proceedings of SPIE, the International Society for Optical Engineering. 2005, pp 59912B.1-59912B.9, issn 0277-786X, isbn 0-8194-6013-3, 1VolConference Paper

Optical monitoring of rugate filtersLAPPSCHIES, Marc; GÖRTZ, Björn; RISTAU, Detlev et al.Proceedings of SPIE, the International Society for Optical Engineering. 2005, pp 59631Z.1-59631Z.9, issn 0277-786X, isbn 0-8194-5981-X, 1VolConference Paper

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