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kw.\*:("Pulverización reactiva")

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Results 1 to 25 of 845

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Combined sputter-ion and NEG pumpRÖMER, J. G. M.Vacuum. 1992, Vol 43, Num 5-7, pp 551-553, issn 0042-207XConference Paper

CuInSe2 Photovoltaic devices prepared by reactive sputteringLOMMASSON, T. C; TALIEH, H; MEAKIN, J. D et al.Photovoltaic specialists conference. 19. 1987, pp 1285-1290Conference Paper

Optical properties of ZnO : Al films prepared by reactive dc magnetron sputteringGHOSH, S; SARKAR, A; CHAUDHURI, S et al.Vacuum. 1991, Vol 42, Num 10-11, pp 645-648, issn 0042-207XArticle

Study on defects in reactively sputtered a-GeNx:H filmsGUANGHUA CHEN; FANGQUING ZHANG; WEI JIA et al.Physica status solidi. A. Applied research. 1989, Vol 114, Num 2, pp K171-K173, issn 0031-8965Article

Hysteresis effect in reactive sputtering: a problem of system stabilityKADLEC, S; MUSIL, J; VYSKOCIL, H et al.Journal of physics. D, Applied physics (Print). 1986, Vol 19, Num 9, pp L187-L190, issn 0022-3727Article

High reflectivity dielectric mirror deposition by reactive magnetron sputteringSCHERER, A; WALTHER, M; SCHIAVONE, L. M et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1992, Vol 10, Num 5, pp 3305-3311, issn 0734-2101Article

Reactive sputtering of RuO2 filmsKOLAWA, E; SO, F. C. T; FLICK, W et al.Thin solid films. 1989, Vol 173, Num 2, pp 217-224, issn 0040-6090, 8 p.Article

Indium-tin oxide deposition by d.c. reactive sputtering on a low softening point materialKAWADA, A.Thin solid films. 1990, Vol 191, Num 2, pp 297-303, issn 0040-6090Article

Microstructure and barrier properties of reactively sputtered Ti-W nitrideRAAIJMAKERS, I. J; SETALVAD, T; BHANSALI, A. S et al.Journal of electronic materials. 1990, Vol 19, Num 11, pp 1221-1230, issn 0361-5235Conference Paper

Blazed grating formation in a hollow cathode etcherGROSS, M; WU, Y; HORWITZ, C. M et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1989, Vol 7, Num 6, pp 3213-3216, issn 0734-2101Article

Modeling of reactive sputtering of compound materialsBERG, S; BLOM, H.-O; LARSSON, T et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1987, Vol 5, Num 2, pp 202-207, issn 0734-2101Article

Cellules solaires CdS/CuInS2, préparées par pulvérisation chimique sans airKAMOUN, N; BELGACEM, S; DACHRAOUI, M et al.Revue de physique appliquée. 1987, Vol 22, Num 9, pp 991-998, issn 0035-1687Article

Thermodynamic model of reactive sputtering processFADDEEVA, S; OSEGUERA, J.Surface engineering. 2012, Vol 28, Num 9, pp 639-645, issn 0267-0844, 7 p.Article

Microstructure and mechanical properties of (Al,Ti)(O,N) coatings prepared by reactive sputteringYAN LIU; YUNSHAN DONG; WENJI ZHAO et al.International journal of refractory metals & hard materials. 2007, Vol 25, Num 3, pp 271-274, issn 0958-0611, 4 p.Article

Propriétés colorimétriques de couches minces d'oxynitrures de titane élaborées par pulvérisation cathodique réactive = Colorimetric properties of titanium oxynitride thin films deposited by dc reactive sputteringCHAPPE, J. M; MARTIN, N; LINTYMER, J et al.Matériaux et techniques. 2006, Vol 94, Num 1, pp 31-37, issn 0032-6895, 7 p.Conference Paper

Time-resolved investigation of an asymmetric bipolar pulsed magnetron discharge : Influence of pressureDUNGER, Th; WELZEL, Th; WELZEL, St et al.Surface & coatings technology. 2005, Vol 200, Num 5-6, pp 1676-1682, issn 0257-8972, 7 p.Conference Paper

Cr-N hard coatings deposited by reactive magnetron sputtering : Application to forming toolsTERRAT, P; REYMOND, J.-J.Le Vide (1995). 1996, Vol 52, Num 280, issn 1266-0167, 180, 219-224 [7 p.]Article

Carbon matrix lifts gear performanceBARRETT, J.Eureka (Beckenham). 1995, Vol 15, Num 9, pp 51-52, issn 0261-2097Article

Modeling reactive sputtering process in symmetrical planar direct current magnetron systemsTSIOGAS, C. D; AVARITSIOTIS, J. N.Journal of applied physics. 1992, Vol 71, Num 10, pp 5173-5182, issn 0021-8979Article

Reactive sputtering of InP in N2 and N2/O2 plasmasSUNDARARAMAN, C. S; LAFONTAINE, H; POULIN, S et al.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1991, Vol 9, Num 3, pp 1433-1439, issn 0734-211XArticle

Dynamic control of reactive magnetron sputtering : a theoretical analysisSPENCER, A. G; HOWSON, R. P.Thin solid films. 1990, Vol 186, Num 1, pp 129-136, issn 0040-6090, 8 p.Article

High rate D.C. reactively sputtered metal-oxy-fluorine dielectric materialsHARDING, G. L.Thin solid films. 1986, Vol 138, Num 2, pp 279-287, issn 0040-6090Article

Influence of oxygen incorporation on the properties of magnetron sputtered hydrogenated amorphous germanium filmsSCHRÖDER, B; ANNEN, A; DRÜSEDAU, T et al.Applied physics letters. 1993, Vol 62, Num 16, pp 1961-1963, issn 0003-6951Article

Studies on glow-discharge characteristics during dc reactive magnetron sputteringMOHAN RAO, G; MOHAN, S.Journal of applied physics. 1991, Vol 69, Num 9, pp 6652-6655, issn 0021-8979Article

Reaktivbeschichtung eines Regenrückhaltebeckens = Revêtement réactif pour un bassin de rétention de la pluie = Reactive coating for a rain retention pondWEIL, J; INGWERSEN, H.Bautenschutz + Bausanierung. 1990, Vol 13, Num 4, pp 38-39, issn 0170-9267, 2 p.Article

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