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PHOTORESISTS FOR ELECTRONICS.FREY DW; HRYHORENKO EB.1978; ELECTRON. PACKAG. PRODUCT.; U.S.A.; DA. 1978; VOL. 18; NO 1; PP. 104-105Article

PHOTOPOLYMER MATERIAL FOR HOLOGRAPHY.BOOTH BL.1975; APPL. OPT.; U.S.A.; DA. 1975; VOL. 14; NO 3; PP. 593-601; BIBL. 10 REF.Article

PHOTORESIST STUDY REVEALS EXPOSURE TIME MORE CRITICAL THAN LIGHT INTENSITY.PARKER JL JR; HOLMES RR.1977; INSULAT. CIRCUITS; U.S.A.; DA. 1977; VOL. 23; NO 10; PP. 31-33Article

CHARACTERISTICS OF RELIEF PHASE HOLOGRAMS RECORDED IN PHOTORESISTS.BARTOLINI RA.1974; APPL. OPT.; U.S.A.; DA. 1974; VOL. 13; NO 1; PP. 129-139; BIBL. 27 REF.Article

THICKNESS VARIANCE OF SPUN-ON-PHOTORESIST.1978; CIRCUITS MANUF.; U.S.A.; DA. 1978; VOL. 18; NO 4; PP. 71-74; BIBL. 7 REF.Article

TROUBLE SHOOTING GUIDE FOR DRY FILM PHOTORESIST.WALLIG LP.1976; INSULAT. CIRCUITS; U.S.A.; DA. 1976; VOL. 22; NO 8; PP. 15-17Article

QUANTITATIVE EVALUATION OF PHOTORESIST PATTERNS IN THE 1-MU M RANGE.WIDMANN DW.1975; APPL. OPT.; U.S.A.; DA. 1975; VOL. 14; NO 4; PP. 931-934; BIBL. 5 REF.Article

REDUCTION OF PHOTORESIST STANDING-WAVE EFFECTS BY POST-EXPOSURE BAKE.WALKER EJ.1975; I.E.E.E. TRANS. ELECTRON DEVICES; U.S.A.; DA. 1975; VOL. 22; NO 7; PP. 464-466; BIBL. 3 REF.Article

A PHOTORESIST-CHARACTERIZATION APPROACH TO HYBRID-MICROCIRCUIT DIMENSIONAL CONTROL.SCHANTZ LE.1974; MICROELECTRONICS; G.B.; DA. 1974; VOL. 5; NO 4; PP. 25-31; BIBL. 6 REF.Article

WALL PROFILES PRODUCED DURING PHOTORESIST MASKED ISOTROPIC ETCHINGBRANDES RG; DUDLEY RH.1973; J. ELECTROCHEM. SOC.; U.S.A.; DA. 1973; VOL. 120; NO 1; PP. 140-142; BIBL. 2 REF.Serial Issue

RESINE PHOTOSENSIBLE NEGATIVE A BASE DE PLEINOMERES DE CYCLOHEXADIENE-1,3 POUR L'OBTENTION DE RESEAUX OPTIQUES ET D'ECHELLES PAR UNE METHODE DE PHOTOLITHOGRAPHIENAUMOVA SF; FLEJSHER AI; YURINA O YU et al.1978; OPT.-MEKH. PROMYSHL.; S.S.S.R.; DA. 1978; VOL. 45; NO 2; PP. 40-41; BIBL. 5 REF.Article

SENSITOMETRY OF PHOTORESISTS FOR MICROELECTRONICS.NOVOTNY DB.1977; PHOTOGR. SCI. ENGNG; U.S.A.; DA. 1977; VOL. 21; NO 6; PP. 351-355; BIBL. 9 REF.Article

CHARACTERIZATION OF POSITIVE PHOTORESIST.DILL FH; HORNBERGER WP; HAUGE PS et al.1975; I.E.E.E. TRANS. ELECTRON DEVICES; U.S.A.; DA. 1975; VOL. 22; NO 7; PP. 445-452; BIBL. 7 REF.Article

DRY FILM PHOTORESIST FOR ADDITIVE PLATING.POWELL H.1975; INSULAT. CIRCUITS; U.S.A.; DA. 1975; VOL. 21; NO 13; PP. 25-27Article

INTERFERENCE DIFFRACTION GRATINGS.HUTLEY MC.1974; SCI. PROGR.; G.B.; DA. 1974; VOL. 61; NO 243; PP. 301-321; BIBL. 19 REF.Article

MICRO-MINIATWIZED SOLID STATE DEVICES THROUGH PHOTO-RESIST.OM PRAKASH.1974; INDIAN J. PHYS.; INDIA; DA. 1974; VOL. 48; NO 5; PP. 458-463; H.T. 1; BIBL. 9 REF.Article

SIMULTANEOUS EXPOSURE AND DEVELOPMENT TECHNIQUE FOR MAKING GRATINGS ON POSITIVE PHOTORESIST.WON TIEN TSANG; SHYH WANG.1974; APPL. PHYS. LETTERS; U.S.A.; DA. 1974; VOL. 24; NO 4; PP. 196-199; BIBL. 12 REF.Article

APPLYING PHOTORESIST BY ROLLER COATINGTAMKE GW JR.1971; MANUF. ENGNG MANAG.; U.S.A.; DA. 1971; VOL. 68; NO 6; PP. 35-36Serial Issue

SUR LA FORMATION DE FILMS DE RESINE PHOTOSENSIBLE PAR LA METHODE DE CENTRIFUGATIONPARAMONOV AI; PROKHOTSKIJ YU M.1976; ZH. NAUCH. PRIKL.; S.S.S.R.; DA. 1976; VOL. 21; NO 2; PP. 85-88; BIBL. 11 REF.Article

EFFET DE LA COMPOSITION CHIMIQUE D'UNE COUCHE PHOTORESISTIVE POSITIVE SUR LA CONTRACTION ET L'ADHESION DES COUCHESKLETCHENKOV II; TEREKHOVA GV.1975; POLUPROVODN. TEKH. MIKROELEKTRON., U.S.S.R.; S.S.S.R.; DA. 1975; NO 20; PP. 95-97Article

PHOTORESISTS. IV B. APPLICATION OF PHOTORESISTS IN SEMICONDUCTOR MANUFACTURECLARK KG.1973; ELECTRON. COMPON.; G.B.; DA. 1973; VOL. 14; NO 17; PP. 751-758; BIBL. 42 REF.Serial Issue

PROJECTION MASK ALIGNMENT; A PRODUCTION TECHNIQUECLARK KG; JULEFF EM.1973; SOLID STATE TECHNOL.; U.S.A.; DA. 1973; VOL. 16; NO 6; PP. 37-41; BIBL. 2 REF.Serial Issue

DRY FILM RESIST TECHNOLOGY.WALKER P.1978; J. APPL. PHOTOGR. ENGNG; U.S.A.; DA. 1978; VOL. 4; NO 1; PP. 33-37; BIBL. 7 REF.Article

PHOTORESIST TRENDS IN SEMICONDUCTOR PROCESSING.LEVINTHAL DJ.1977; ELECTRON. PACKAG. PRODUCT.; U.S.A.; DA. 1977; VOL. 17; NO 11; PP. 49-50Article

LINEWIDTH VARIATIONS IN PHOTORESIST PATTERNS ON PROFILED SURFACES.WIDMANN DW; BINDER H.1975; I.E.E.E. TRANS. ELECTRON DEVICES; U.S.A.; DA. 1975; VOL. 22; NO 7; PP. 467-471; BIBL. 10 REF.Article

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