NEW CARBON FILM RESISTORS FEATURE ENHANCED CHARACTERISTICSKATO M; KANBARA S.1980; J. ELECTRON. ENGNG; JPN; DA. 1980; VOL. 17; NO 160; PP. 36-37Article

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RESISTANCE A COUCHE MINCE AU TANTALEKAMPA J; PASZKOWSKA H.1974; PRACE OSRODKA BADAWCZO-ROZWOJOW. ELECTRON. PROZNIOW.; POLSKA; DA. 1974; VOL. 2; NO 3; PP. 76-78; BIBL. 2 REF.Article

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REGLAGE DES RESISTANCES A COUCHES MINCES EN TANTALEPERTSEV AV; KISELEV VS; BASHAVNIKOV VA et al.1972; IZVEST. VYSSH. UCHEBN. ZAVED., RADIOELEKTRON.; S.S.S.R.; DA. 1972; VOL. 15; NO 5; PP. 626-630; BIBL. 4 REF.Serial Issue

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