THICK-FILM AND THIN-FILM RESISTOR NETWORKS MAKING RAPID PROGRESSNAGATANI R.1982; JEE, J. ELECTRON. ENG.; ISSN 0385-4507; JPN; DA. 1982; VOL. 19; NO 188; PP. 84-87Article

RESISTOR NETWORKS MARKET AND APPLICATIONSMETHVEN B.1979; NEW ELECTRON.; GBR; DA. 1979; VOL. 12; NO 10; PP. 106-111; (4 P.)Article

THE FUTURE OF THIN AND THICK FILM METAL RESISTORS.CROSSLEY A.1977; NEW ELECTRON.; G.B.; DA. 1977; VOL. 10; NO 10; PP. 82-89 (4P.)Article

A NOVEL APPROACH FOR HIGHER YIELD IN THICK-FILM RESISTORSMATKARI AK; MITHAL SK; KASARBADA C et al.1981; MICROELECTRONICS; ISSN 0026-2692; GBR; DA. 1981; VOL. 12; NO 2; PP. 32-34Article

ELECTRON-BEAM TRIMMING OF THIN AND THICK FILM RESISTOR NETWORKS.SCHILLER S; HEISIG U; PANZER S et al.1975; SOLID STATE TECHNOL.; U.S.A.; DA. 1975; VOL. 18; NO 7; PP. 38-44; BIBL. 6 REF.Article

RESISTORS. CARBON AND METAL FILMS TOPPING CARBON COMPS1979; EVAL. ENGNG; USA; DA. 1979; VOL. 18; NO 5; PP. 46-47Article

FUSE RESISTOR CONSISTING OF A METALLIC THIN FILM AND A POLYMERIZED ORGANIC FILM ON A SUBSTRATE.HORIGUCHI K; OZAWA PJ.1977; I.E.E.E. TRANS. PARTS HYBR. PACKAG.; U.S.A.; DA. 1977; VOL. 13; NO 4; PP. 368-371; BIBL. 1 REF.Article

EXCESS NOISE AND REFIRING PROCESSES IN THICK-FILM RESISTORSPRUDENZIATI M; MORTEN B; MASOERO A et al.1981; J. PHYS. D; ISSN 0022-3727; GBR; DA. 1981; VOL. 14; NO 7; PP. 1355-1362; BIBL. 9 REF.Article

A MINIATURE HIGH-VALUED RESISTORAWATAR SINGH.1981; VACUUM; ISSN 0042-207X; GBR; DA. 1981; VOL. 31; NO 2; PP. 129-130; BIBL. 9 REF.Article

THICK FILM RESISTOR RELIABILITY.OSBORNE S.1976; IN: INT. ELECTRON. PACKAG. PROD. CONF. PROC. TECH. PROGRAMME; BRIGHTON, ENGL.; 1976; SURBITON; KIVER COMMUNICATIONS; DA. 1976; PP. 58-63Conference Paper

ELECTRICAL TRANSPORT IN THICK FILM RESISTORSHILL RM.1979; EUROPEAN HYBRID MICROELECTRONICS CONFERENCE. 2/1978/GHENT; NLD; PIJNACKER: DUTCH EFFICIENCY BUREAU; DA. 1979; PP. 95-104; BIBL. 9 REF.Conference Paper

WIRE WOUND RESISTORS THE STATE OF THE ART.BROWN P.1978; NEW ELECTRON.; GBR; DA. 1978; VOL. 11; NO 15; PP. 24-25Article

RESISTOR NETWORK TRENDS.DOWLING NB.1977; EVAL. ENGNG; U.S.A.; DA. 1977-09; PP. 18Article

THICK FILM RESISTOR NETWORKS ACHIEVE COST REDUCTIONS FOR EXPANDED APPLICATIONSNISHIDA K.1980; J. ELECTRON. ENGNG; JPN; DA. 1980; VOL. 17; NO 160; PP. 40-61; (4 P.)Article

DESIGNING AND PROCESSING THICK FILM RESISTORSSERGENT JE; LANE GM.1979; ELECTRON. PACKAG. PRODUCT.; USA; DA. 1979; VOL. 19; NO 10; PP. 64-71; (7 P.)Article

NETWORKS: HOTTEST AREA IN RESISTORS1979; EVAL. ENGNG; USA; DA. 1979; VOL. 18; NO 5; PP. 38-42; (2 P.)Article

POWER WIREWOUND RESISTORS STILL PLAY IMPORTANT APPLICATION ROLESAKIMOTO Y.1979; J. ELECTRON. ENGNG; JPN; DA. 1979; VOL. 16; NO 148; PP. 40-42Article

METAL-FILM RESISTORS CHALLENGE BOTH PRECISION-WIREWOUND AND CARBON-COMPOSITION UNITS WITH HIGH PRECISION AND STABILITY, ALSO LOW NOISE AND LOW COSTANDERSON CV.1978; ELECTRON. DESIGN; USA; DA. 1978; VOL. 26; NO 17; PP. 122-126; BIBL. 5 REF.Article

D.I.Y. RESISTOR MAKER.BEAN JC.1977; NEW ELECTRON.; G.B.; DA. 1977; VOL. 10; NO 10; PP. 90-92 (2P.)Article

HIGH VOLTAGE STABLE THICK FILM RESISTORS.GARCIA PF; CHAMP SE; LARRY JR et al.1976; IN: INT. ELECTRON. PACKAG. PROD. CONF. PROC. TECH. PROGRAMME; BRIGHTON, ENGL.; 1976; SURBITON; KIVER COMMUNICATIONS; DA. 1976; PP. 22-31; BIBL. 9 REF.Conference Paper

THE CHEMISTRY AND STABILITY OF RUTHENIUM-BASED RESISTORSPIERCE JW; KUTY DW; LARRY JR et al.1982; SOLID STATE TECHNOLOGY; ISSN 0038-111X; USA; DA. 1982; VOL. 25; NO 10; PP. 85-93; BIBL. 7 REF.Article

NEW CARBON FILM RESISTORS FEATURE ENHANCED CHARACTERISTICSKATO M; KANBARA S.1980; J. ELECTRON. ENGNG; JPN; DA. 1980; VOL. 17; NO 160; PP. 36-37Article

STRAIN SENSITIVITY IN THICK-FILM RESISTORSCANALI C; MALAVASI D; MORTEN B et al.1980; I.E.E.E. TRANS. COMPON. HYBR. MANUFG TECHNOL.; USA; DA. 1980; VOL. 3; NO 3; PP. 421-423; BIBL. 15 REF.Article

STRAIN SENSITIVITY OF THICK-FILM RESISTORSSHAH JS.1980; I.E.E.E. TRANS. COMPON. HYBR. MANUFG TECHNOL.; USA; DA. 1980; VOL. 3; NO 4; PP. 554-564; BIBL. 13 REF.Article

TRACKING PERFORMANCE OF FILM RESISTORS: DEFINITIONS AND THEORYVAN NIE AG.1980; MICROELECTRON. RELIAB.; ISSN 0026-2714; GBR; DA. 1980; VOL. 20; NO 4; PP. 505-508; BIBL. 10 REF.Article