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Determination of complex index of immersion liquids at 193nmSTEHLE, Jean-Louis; PIEL, Jean-Philippe; CAMPILLO-CARRETO, Jose et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6197-0, vol 3, 61544G.1-61544G.7Conference Paper

Can DUV take us below 100 nm?FINDERS, Jo; JORRITSMA, Louis; EURLINGS, Mark et al.SPIE proceedings series. 2001, pp 153-165, isbn 0-8194-4032-9, 2VolConference Paper

Increased yield and tool life by reduction of DUV Photo contamination using Parts per trillion pure purge gasesLANDONI, Cristian; SUCCI, Marco; RABELLINO, Larry et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6195-4, 2Vol, vol 2, 61523K.1-61523K.10Conference Paper

Simultaneous scanning of the revolver undulator and monochromator at BL-19A of the photon factoryKAKIZAKI, A; OHKUMA, H; KINOSHITA, T et al.Review of scientific instruments. 1992, Vol 63, Num 1, pp 367-370, issn 0034-6748, 2AConference Paper

A practical solution to the critical problem of 193 nm reticle hazeHALBMAIER, Dave; OHYASHIKI, Yasushi; KISHKOVICH, Oleg et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70282G.1-70282G.7, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

A short period undulator for MAXAHOLA, H; MEINANDER, T.Review of scientific instruments. 1992, Vol 63, Num 1, pp 372-375, issn 0034-6748, 2AConference Paper

Approach for VUV positive resists using photodecomposable polymersKISHIMURA, Shinji; KATSUYAMA, Akiko; SASAGO, Masaru et al.SPIE proceedings series. 2000, pp 347-356, isbn 0-8194-3617-8Conference Paper

Characterization of low-order aberrations in the SEMATECH Albany MET toolNAULLEAU, Patrick; WATERMAN, Justin; DEAN, Kim et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65172Q.1-65172Q.9, issn 0277-786X, isbn 978-0-8194-6636-5Conference Paper

Lithography Cost of OwnershipSEIDEL, Phil.EUV lithography. SPIE Press Monograph. 2009, Vol 178, pp 585-641, isbn 978-0-8194-6964-9 978-0-4704-7155-5, 1Vol, 57 p.Book Chapter

Variability in the vacuum-ultraviolet transmittance of magnesium fluoride windowsHERZIG, H; FLEETWOOD, C. M; TOFT, A. R et al.Applied optics. 1992, Vol 31, Num 1, pp 110-114, issn 0003-6935Article

Extreme-ultraviolet optical constant determination near an absorption edgeSULLIVAN, B. T; MONTCALM, C.Applied optics. 1991, Vol 30, Num 28, pp 4010-4011, issn 0003-6935Article

Ultranarrow bandwith VUV-XUV laser systemCROMWELL, E; TRICKL, T; LEE, Y. T et al.Review of scientific instruments. 1989, Vol 60, Num 9, pp 2888-2892, issn 0034-6748Article

Environmental data from the Engineering Test StandKLEBANOFF, L. E; GRUNOW, P. A; GRAHAM, S et al.SPIE proceedings series. 2002, pp 310-315, isbn 0-8194-4434-0, 2VolConference Paper

The MEEF shall inherit the earthCONLEY, Will; GARZA, Cesar; DUSA, Mircea et al.SPIE proceedings series. 2001, pp 251-258, isbn 0-8194-4032-9, 2VolConference Paper

Transient decreases of Earth's far-ultraviolet dayglowFRANK, L. A; SIGWARTH, J. B.Geophysical research letters. 1997, Vol 24, Num 19, pp 2423-2426, issn 0094-8276Article

Spectral reflectance measurements using a precision multiple reflectometer in the UV and VUV rangeDA-KUI ZHUANG; TIAN-LI YANG.Applied optics. 1989, Vol 28, Num 23, pp 5024-5028, issn 0003-6935Article

Impact of EUV light scatter on CD control as a result of mask density changesKRAUTSCHIK, Christof; ITO, Masaaki; NISHIYAMA, Iwao et al.SPIE proceedings series. 2002, pp 289-301, isbn 0-8194-4434-0, 2VolConference Paper

A circular polarizer for the region of windowless VUV radiationDÖHRING, T; SCHÖNHENSE, G; HEINZMANN, U et al.Measurement science & technology (Print). 1992, Vol 3, Num 1, pp 91-97, issn 0957-0233Article

Projection Systems for Extreme Ultraviolet LithographyHUDYMA, Russell M; SOUFLI, Regina.EUV lithography. SPIE Press Monograph. 2009, Vol 178, pp 135-159, isbn 978-0-8194-6964-9 978-0-4704-7155-5, 1Vol, 25 p.Book Chapter

Photoresists for Extreme Ultraviolet LithographyBRAINARD, Robert L.EUV lithography. SPIE Press Monograph. 2009, Vol 178, pp 383-448, isbn 978-0-8194-6964-9 978-0-4704-7155-5, 1Vol, 66 p.Book Chapter

EUV Resist Based on Low Molecular Weight PHSSHIRAIL, Masamitsu; KUROSIMAL, Akitaka; OKAMURA, Haruyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692344.1-692344.7, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

STATUS OF DPP EUV SOURCE DEVELOPMENT FOR BETA/HVMYOSHIOKA, Masaki; ZINK, Peter; SCHRIEVER, Guido et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7140, issn 0277-786X, isbn 978-0-8194-7381-3 0-8194-7381-2, 71401F.1-71401F.12, 2Conference Paper

Preliminary results from key experiments on sources for EUV lithographyLEBERT, R; ASCHKE, L; POPRAWE, R et al.Microelectronic engineering. 2001, Vol 57-58, pp 87-92, issn 0167-9317Conference Paper

Rigorous electromagnetic simulation of EUV masks : influence of the absorber propertiesSCHIAVONE, Patrick; GRANET, Gérard; ROBIC, J. Y et al.Microelectronic engineering. 2001, Vol 57-58, pp 497-503, issn 0167-9317Conference Paper

Terrestrial plasmaspheric imaging by an extreme ultraviolet scanner on Planet-BNAKAMURA, M; YOSHIKAWA, I; YAMAZAKI, A et al.Geophysical research letters. 2000, Vol 27, Num 2, pp 141-144, issn 0094-8276Article

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