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Minimization of the shadow patterns produced by periodic mesh grids in extreme ultraviolet telescopesAUCHERE, Frédéric; RIZZI, Julien; PHILIPPON, Anne et al.Journal of the Optical Society of America. A, Optics, image science, and vision (Print). 2011, Vol 28, Num 1, pp 40-45, issn 1084-7529, 6 p.Article

Can DUV take us below 100 nm?FINDERS, Jo; JORRITSMA, Louis; EURLINGS, Mark et al.SPIE proceedings series. 2001, pp 153-165, isbn 0-8194-4032-9, 2VolConference Paper

The far-ultraviolet continuum of quasars and the universe at Z>4NETZER, H.The Astrophysical journal. 1985, Vol 289, Num 2, pp 451-456, issn 0004-637XArticle

Determination of complex index of immersion liquids at 193nmSTEHLE, Jean-Louis; PIEL, Jean-Philippe; CAMPILLO-CARRETO, Jose et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6197-0, vol 3, 61544G.1-61544G.7Conference Paper

EUV and x-ray optics (synergy between laboratory and space II)Hudec, R; Pina, Ladislav.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8076, issn 0277-786X, isbn 978-0-8194-8666-0, 1 vol, isbn 978-0-8194-8666-0Conference Proceedings

Advances in X-ray/EUV optics and components VI (22-24 August 2011, San Diego, California, United States)Morawe, Christian; Khounsary, Ali M; Goto, Shunji et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8139, issn 0277-786X, isbn 978-0-8194-8749-0, 1 vol, isbn 978-0-8194-8749-0Conference Proceedings

Future EUV/UV and visible space astrophysics missions and instrumentation (Waikoloa HI, 22-23 August 2002)Blades, J. Chris; Siegmund, Oswald H.W.SPIE proceedings series. 2003, isbn 0-8194-4633-5, XV, 702 p, isbn 0-8194-4633-5Conference Proceedings

Extreme ultraviolet astronomyBOWYER, S.Scientific American. 1994, Vol 271, Num 2, pp 32-39, issn 0036-8733Article

Excimer ions as possible candidates for VUV and XUV lasersSAUERBREY, R; LANGHOFF, H.IEEE journal of quantum electronics. 1985, Vol 21, Num 3, pp 179-181, issn 0018-9197Article

Extreme ultraviolet interferometry of warm dense matter in laser plasmasGARTSIDE, L. M. R; TALLENTS, G. J; RUS, B et al.Optics letters. 2010, Vol 35, Num 22, pp 3820-3822, issn 0146-9592, 3 p.Article

Comparisons between EUV at-wavelength metrological methodsSUGISAKI, Katsumi; OKADA, Masashi; OUCHI, Chidane et al.Proceedings of SPIE. 2005, pp 59210D.1-59210D.8, isbn 0-8194-5926-7, 1VolConference Paper

Normal incidence spectrophotometer with high-density transmission grating technology and high-efficiency silicon photodiodes for absolute solar extreme-ultraviolet irradiance measurements : Magnetospheric imagery and atmospheric remote sensingOGAWA, H. S; MCMULLIN, D. R; JUDGE, D. L et al.Optical engineering (Bellingham. Print). 1993, Vol 32, Num 12, pp 3121-3125, issn 0091-3286Article

Advances in X-ray/EUV optics and components V (2-3 August 2010, San Diego, California, United States)Khounsary, Ali M; Morawe, Christian; Goto, Shunji et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7802, issn 0277-786X, isbn 978-0-8194-8298-3, 1 vol, isbn 978-0-8194-8298-3Conference Proceedings

Advanced holographic methods in extreme ultraviolet interference lithographyTERHALLE, Bernd; LANGNER, Andreas; PÄIVÄNRANTA, Birgit et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8102, issn 0277-786X, isbn 978-0-8194-8712-4, 81020V.1-81020V.7Conference Paper

Predictive Modeling of EUV-Lithography: The Role of Mask, Optics, and Photoresist EffectsERDMANN, Andreas; EVANSCHITZKY, Peter; FENG SHAO et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8171, issn 0277-786X, isbn 978-0-8194-8797-1, 81710M.1-81710M.16Conference Paper

Analysis and Control of Thin Film Stresses during Extreme Ultraviolet Lithography Mask Blank FabricationLIANG ZHENG.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7848, issn 0277-786X, isbn 978-0-8194-8378-2, 78483G.1-78483G.8Conference Paper

A practical solution to the critical problem of 193 nm reticle hazeHALBMAIER, Dave; OHYASHIKI, Yasushi; KISHKOVICH, Oleg et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70282G.1-70282G.7, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Modeling EUVL Illumination SystemsSMITH, Daniel G.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7103, issn 0277-786X, isbn 978-0-8194-7333-2 0-8194-7333-2, 1Vol, 71030B.1-71030B.8Conference Paper

A short period undulator for MAXAHOLA, H; MEINANDER, T.Review of scientific instruments. 1992, Vol 63, Num 1, pp 372-375, issn 0034-6748, 2AConference Paper

Iridium/silicon multilayers for extreme ultraviolet applications in the 20―35 nm wavelength rangeZUPPELLA, Paola; MONACO, Gianni; JODY CORSO, Alain et al.Optics letters. 2011, Vol 36, Num 7, pp 1203-1205, issn 0146-9592, 3 p.Article

Extreme ultraviolet multilayer mirror with near-zero IR reflectanceSOER, W. A; GAWLITZA, P; VAN HERPEN, M. M. J. W et al.Optics letters. 2009, Vol 34, Num 23, pp 3680-3682, issn 0146-9592, 3 p.Article

Increased yield and tool life by reduction of DUV Photo contamination using Parts per trillion pure purge gasesLANDONI, Cristian; SUCCI, Marco; RABELLINO, Larry et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6195-4, 2Vol, vol 2, 61523K.1-61523K.10Conference Paper

Simultaneous scanning of the revolver undulator and monochromator at BL-19A of the photon factoryKAKIZAKI, A; OHKUMA, H; KINOSHITA, T et al.Review of scientific instruments. 1992, Vol 63, Num 1, pp 367-370, issn 0034-6748, 2AConference Paper

On the problem of extreme UV and X-ray lasersSOBEL'MAN, I. I; VINOGRADOV, A. V.Advances in atomic and molecular physics. 1985, Vol 20, pp 327-345, issn 0065-2199Article

ON THE FAR ULTRAVIOLET FLUX DISTRIBUTION OF THE ORION NEBULACARRUTHERS GR; HECKATHORN HM.1981; ASTROPHYS. LETT.; ISSN 0004-6388; USA; DA. 1981; VOL. 22; NO 1; PP. 135-141; BIBL. 16 REF.Article

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