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Effect of gas flow ratio on the microstructure and mechanical properties of boron phosphide films prepared by reactive magnetron sputteringJIA, Z. C; ZHU, J. Q; JIANG, C. Z et al.Applied surface science. 2011, Vol 258, Num 1, pp 356-360, issn 0169-4332, 5 p.Article

Synthesis of metal oxide thin films by reactive magnetron sputtering in Ar/O₂ mixtures : An experimental study of the chemical mechanismsSNYDERS, Rony; DAUCHOT, Jean-Pierre; HECQ, Michel et al.Plasma processes and polymers (Print). 2007, Vol 4, Num 2, pp 113-126, issn 1612-8850, 14 p.Article

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Influences of preparation methods on bipolar switching properties in copper nitride filmsQIANFEI ZHOU; QIAN LU; YONGNING ZHOU et al.Surface & coatings technology. 2013, Vol 229, pp 135-139, issn 0257-8972, 5 p.Conference Paper

Characterization of the hardness and the substrate fluxes during reactive magnetron sputtering of TiNMAHIEU, S; DEPLA, D; DE GRYSE, R et al.Surface & coatings technology. 2008, Vol 202, Num 11, pp 2314-2318, issn 0257-8972, 5 p.Conference Paper

Structural investigations of YSZ coatings prepared by DC magnetron sputteringBRIOIS, P; LAPOSTOLLE, F; DEMANGE, V et al.Surface & coatings technology. 2007, Vol 201, Num 12, pp 6012-6018, issn 0257-8972, 7 p.Article

Tribological properties of the Ti-Al-N thin films with different components fabricated by double-targeted co-sputteringXUECHAO LI; CHANGSHENG LI; YE ZHANG et al.Applied surface science. 2010, Vol 256, Num 13, pp 4272-4279, issn 0169-4332, 8 p.Article

Preparation and investigation of sputtered vanadium dioxide films with large phase-transition hysteresis loopsHUAFU ZHANG; ZHIMING WU; QIONG HE et al.Applied surface science. 2013, Vol 277, pp 218-222, issn 0169-4332, 5 p.Article

Reactive sputter deposition of metal containing hydrogenated amorphous carbon coatings exhibiting self-assembled alternating nanolayersTING, Jyh-Ming; WU, Wan-Yu.Surface & coatings technology. 2013, Vol 231, pp 2-5, issn 0257-8972, 4 p.Conference Paper

Yttria-stabilized zirconia thin films deposited by pulsed-laser deposition and magnetron sputteringHIDALGO, H; REGUZINA, E; MILLON, E et al.Surface & coatings technology. 2011, Vol 205, Num 19, pp 4495-4499, issn 0257-8972, 5 p.Article

Microstructure and mechanical properties of reactively sputtered Ti(O,N) coatingsYING WU; XINWEI WU; GUANGZE LI et al.International journal of refractory metals & hard materials. 2008, Vol 26, Num 5, pp 461-464, issn 0958-0611, 4 p.Article

Effect of carbon on TiAlCN coatings deposited by reactive magnetron sputteringXUHAI ZHANG; JIANQING JIANG; ZENG YUQIAO et al.Surface & coatings technology. 2008, Vol 203, Num 5-7, pp 594-597, issn 0257-8972, 4 p.Conference Paper

Al-N codoping and p-type conductivity in ZnO using different nitrogen sourcesLIPING ZHU; ZHIZHEN YE; FEI ZHUGE et al.Surface & coatings technology. 2005, Vol 198, Num 1-3, pp 354-356, issn 0257-8972, 3 p.Conference Paper

About the key factors driving the resistivity of AuO_x thin films grown by reactive magnetron sputteringDOLIQUE, V; THOMANN, A.-L; MILLON, E et al.Applied surface science. 2014, Vol 295, pp 194-197, issn 0169-4332, 4 p.Article

Titanium oxide thin film growth by magnetron sputtering: Total energy flux and its relationship with the phase constitutionCORMIER, P.-A; BALHAMRI, A; THOMANN, A.-L et al.Surface & coatings technology. 2014, Vol 254, pp 291-297, issn 0257-8972, 7 p.Article

V-alloyed ZrO₂ coatings with temperature homogenization function for high-temperature sliding contactsJANTSCHNER, O; WALTER, C; MURATORE, C et al.Surface & coatings technology. 2013, Vol 228, pp 76-83, issn 0257-8972, 8 p.Article

Rare-earth (Er, Nd)-doped Si nanostructures for integrated photonicsGOURBILLEAU, F; KHOMENKOVA, L; BREARD, D et al.Physica. E, low-dimentional systems and nanostructures. 2009, Vol 41, Num 6, pp 1034-1039, issn 1386-9477, 6 p.Article

Role of deposition parameters on microstmcture and mechanical properties of chromium oxide coatingsFEI LUO; XIAOLU PANG; KEWEI GAO et al.Surface & coatings technology. 2007, Vol 202, Num 1, pp 58-62, issn 0257-8972, 5 p.Article

Properties of magnetron sputtered Al-Si-N thin films with a low and high Si contentMUSIL, J; SAOEK, M; ZEMAN, P et al.Surface & coatings technology. 2008, Vol 202, Num 15, pp 3485-3493, issn 0257-8972, 9 p.Article

Characteristics of N-doped titanium oxide prepared by the large scaled DC reactive magnetron sputtering techniquePARK, Sang-Won; HEO, Jae-Eun.Separation and purification technology. 2007, Vol 58, Num 1, pp 200-205, issn 1383-5866, 6 p.Article

Combined reactive magnetron sputtering and plasma decomposition of non-volatile precursors to grow luminescent thin filmsGIL-ROSTRA, Jorge; YUBERO, Francisco; FERRER, Francisco J et al.Surface & coatings technology. 2013, Vol 222, pp 144-150, issn 0257-8972, 7 p.Article

Role of PVD oxide coatings on HK40 cast steel during short and long exposure to C-rich atmospheresSALAS, O; MELO-MAXIMO, D. V; OSEGUERA, J et al.Materials characterization. 2013, Vol 83, pp 58-67, issn 1044-5803, 10 p.Article

The deposition of crystallized TiO₂ coatings by closed field unbalanced magnetron sputter ion platingZHANG, X; COOKE, K; CARMICHAEL, P et al.Surface & coatings technology. 2013, Vol 236, pp 290-295, issn 0257-8972, 6 p.Article