Lithographic evaluation of one-component deep-UV resists containing o-nitrobenzyl ester moietiesSCHWALM, R.Journal of the Electrochemical Society. 1989, Vol 136, Num 11, pp 3471-3476, issn 0013-4651, 6 p.Article

Syntheses of telechelic oligo- and poly(carboxypiperazine)sSCHWALM, R; HEITZ, W.Die Makromolekulare Chemie. 1986, Vol 187, Num 6, pp 1415-1422, issn 0025-116XArticle

Tuning the mechanical properties of UV coatings towards hard and flexible systemsSCHWALM, R; HÄUSSLING, L; REICH, W et al.Progress in organic coatings. 1997, Vol 32, Num 1-4, pp 191-196, issn 0300-9440Conference Paper

An environmentally stable chemical amplified deep-UV resistFUNHOFF, D. J. H; BINDER, H; GOETHALS, M et al.Journal of information recording materials (1985). 1994, Vol 21, Num 4, pp 311-320, issn 0863-0453Article

Semi-crystalline thermoset resins: tailoring rheological properties in melt using comb structures with crystalline graftsCLAESSON, H; SCHEURER, C; MALMSTRÖM, E et al.Progress in organic coatings. 2004, Vol 49, Num 1, pp 13-22, issn 0300-9440, 10 p.Article

How to speed up the UV curing of water-based acrylic coatingsDECKER, C; MASSON, F; SCHWALM, R et al.JCT research. 2004, Vol 1, Num 2, pp 127-136, issn 1547-0091, 10 p.Conference Paper

Strahlungshärtung als Alternative zur thermischen Härtung : Perspektiven für Pulver- und Schmelzlacke : UV-härtbare Festharze = UV radiation curing as an alternative to thermal curingBINDER, H; BLUM, R; KÖNIGER, R et al.Farbe + Lack. 1999, Vol 105, Num 11, pp 38-46, issn 0014-7699, 5 p.Article

Simulation of proximity printingHENKE, W; WEISS, M; SCHWALM, R et al.Microelectronic engineering. 1990, Vol 10, Num 2, pp 127-152, issn 0167-9317, 26 p.Article

Thermal and photochemical curing of isocyanate and acrylate functionalized oligomersSTUDER, K; DECKER, C; BECK, E et al.European polymer journal. 2005, Vol 41, Num 1, pp 157-167, issn 0014-3057, 11 p.Article

Weathering resistance of waterbased UV-cured polyurethane-acrylate coatingsDECKER, C; MASSON, F; SCHWALM, R et al.Polymer degradation and stability. 2004, Vol 83, Num 2, pp 309-320, issn 0141-3910, 12 p.Article

Scratch resistance with UV and dual curable urethane acrylatesSCHWALM, R; BECK, E; PFAU, A et al.European coatings journal. 2003, Num 1-2, pp 39-46, issn 0930-3847, 6 p.Article

Dissolution inhibition-type photoresists for deep-UV lithographyFUNHOFF, D; BINDER, H; NGUYEN-KIM, S et al.Progress in organic coatings. 1992, Vol 20, Num 3-4, pp 289-300, issn 0300-9440Conference Paper

Diffraction effects in submicron contact or proximity printingHENKE, W; SCHWALM, R; WEISS, M et al.Microelectronic engineering. 1990, Vol 10, Num 2, pp 73-89, issn 0167-9317, 17 p.Article