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Results 1 to 25 of 44

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Thermal chemical vapour deposition of copper films from copper ethylacetoacetate : microstructure and electrical resistivityDEVI, A; SHIVASHANKAR, S. A.Journal of materials science letters. 1998, Vol 17, Num 5, pp 367-369, issn 0261-8028Article

Preparation of zinc oxide coatings by using newly designed metal-organic complexes of Zn: Effect of molecular structure of the precursor and surfactant over the crystallization, growth and luminescenceBRAHMA, Sanjaya; SHIVASHANKAR, S. A.Journal of alloys and compounds. 2014, Vol 584, pp 331-338, issn 0925-8388, 8 p.Article

Microwave irradiation-assisted method for the deposition of adherent oxide films on semiconducting and dielectric substratesBRAHMA, Sanjaya; SHIVASHANKAR, S. A.Thin solid films. 2010, Vol 518, Num 21, pp 5905-5911, issn 0040-6090, 7 p.Article

Large negative magnetoresistance and metal―insulator transition observed in MnO/C composite coatings grown on ceramic alumina by metalorganic chemical vapor depositionVARADE, Ashish; SHIVASHANKAR, S. A.Carbon (New York, NY). 2011, Vol 49, Num 4, pp 1401-1407, issn 0008-6223, 7 p.Article

Thermal analysis of metalorganic complexes of copper for evaluation as CVD precursorsDEVI, A; SHIVASHANKAR, S. A.Journal of thermal analysis and calorimetry. 1999, Vol 55, Num 1, pp 259-270, issn 1388-6150Article

Bimolecular processes in a low-density oxygen dischargeAWSCHALOM, D. D; SHIVASHANKAR, S. A; ROBINSON, B et al.Physical review. A, General physics. 1984, Vol 29, Num 5, pp 2578-2580, issn 0556-2791Article

Growth of nanowires of β-NaxV2O5 by metalorganic chemical vapor depositionSAHANA, M. B; SHIVASHANKAR, S. A.Journal of material chemistry. 2003, Vol 13, Num 9, pp 2254-2260, issn 0959-9428, 7 p.Article

Structural and optical properties of polycrystalline thin films of rare earth oxides grown on fused quartz by low pressure MOCVDSINGH, M. P; SHIVASHANKAR, S. A.Journal of crystal growth. 2005, Vol 276, Num 1-2, pp 148-157, issn 0022-0248, 10 p.Article

Studies on structural and electrical properties of sprayed SnO2:Sb filmsELANGOVAN, E; SHIVASHANKAR, S. A; RAMAMURTHI, K et al.Journal of crystal growth. 2005, Vol 276, Num 1-2, pp 215-221, issn 0022-0248, 7 p.Article

Metal-antiferromagnetic-insulator transition in V2O3 alloysSHIVASHANKAR, S. A; HONIG, J. M.Physical review. B, Condensed matter. 1983, Vol 28, Num 10, pp 5695-5701, issn 0163-1829Article

Low-pressure MOCVD of Al2O3 films using aluminium acetylacetonate as precursor: nucleation and growthSINGH, M. P; SHIVASHANKAR, S. A.Surface & coatings technology. 2002, Vol 161, Num 2-3, pp 135-143, issn 0257-8972, 9 p.Article

Carbonaceous nickel oxide nano-composites: As electrode materials in electrochemical capacitor applicationsJENA, Anirudha; MUNICHANDRAIAH, N; SHIVASHANKAR, S. A et al.Journal of power sources. 2013, Vol 237, pp 156-166, issn 0378-7753, 11 p.Article

Growth of nanocrystalline TiO2 films by MOCVD using a novel precursorSHALINI, K; CHANDRASEKARAN, S; SHIVASHANKAR, S. A et al.Journal of crystal growth. 2005, Vol 284, Num 3-4, pp 388-395, issn 0022-0248, 8 p.Article

MOCVD of cobalt oxide thin films: dependence of growth, microstructure, and optical properties on the source of oxidationMANE, Anil U; SHIVASHANKAR, S. A.Journal of crystal growth. 2003, Vol 254, Num 3-4, pp 368-377, issn 0022-0248, 10 p.Article

Completely random nanoporous Cu4O3―CuO―C composite thin films for potential application as multiple channel photonic band gap based filter in the telecommunication wavelengthsDAS, Mahua; BITTENCOURT, C; PIREAUX, J. J et al.Applied physics. A, Materials science & processing (Print). 2012, Vol 109, Num 1, pp 245-254, issn 0947-8396, 10 p.Article

Kinetics of hydrogen evolution on submicron size Co, Ni, Pd and Co-Ni alloy powder electrodes by d.c. polarization and a.c. impedance studiesELUMALAI, P; VASAN, H. N; MUNICHANDRAIAH, N et al.Journal of applied electrochemistry. 2002, Vol 32, Num 9, pp 1005-1010, issn 0021-891X, 6 p.Article

Effect of synthesis route on the structure of Nd3 - xBa3+xCu6O14-2δ (x = 0, 1) system: a neutron diffraction studyKINI, N. S; SHIVASHANKAR, S. A; UMARJI, A. M et al.Solid state communications. 2002, Vol 122, Num 1-2, pp 99-104, issn 0038-1098Article

Epitaxial growth of Co3O4 films by low temperature, low pressure chemical vapour depositionSHALINI, K; MANE, Anil U; SHIVASHANKAR, S. A et al.Journal of crystal growth. 2001, Vol 231, Num 1-2, pp 242-247, issn 0022-0248Article

Low-temperature structure of two copper-based precursors for MOCVD : Aquabis(tert-butyl acetoacetato)copper(II) and bis(dipivaloylmethanido)copper(II)PATNAIK, S; ROW, T. N. G; RAGHUNATHAN, L et al.Acta crystallographica. Section C, Crystal structure communications. 1996, Vol 52, pp 891-894, issn 0108-2701, 4Article

Large deviation from Matthiessen's rule in chemical vapour deposited copper films and its correlation with nanostructureRAMASWAMY, G; RAYCHAUDHURI, A. K; GOSWAMI, J et al.Journal of physics. D, Applied physics (Print). 1997, Vol 30, Num 5, pp L5-L9, issn 0022-3727Article

Rechargeable lithium cells with dendrite-free electrodeposited lithium on aluminium as negative electrodeSURESH, P; SHUKLA, A. K; SHIVASHANKAR, S. A et al.Journal of power sources. 2004, Vol 132, Num 1-2, pp 166-171, issn 0378-7753, 6 p.Article

Electrochemical behaviour of aluminium in non-aqueous electrolytes over a wide potential rangeSURESH, P; SHUKLA, A. K; SHIVASHANKAR, S. A et al.Journal of power sources. 2002, Vol 110, Num 1, pp 11-18, issn 0378-7753Article

Microstructure and properties of VO2 thin films deposited by MOCVD from vanadyl acetylacetonateSAHANA, M. B; DHARMAPRAKASH, M. S; SHIVASHANKAR, S. A et al.Journal of material chemistry. 2002, Vol 12, Num 2, pp 333-338, issn 0959-9428Article

Microwave Assisted Synthesis of Nanostructured Titanium Dioxide with High Photocatalytic ActivityJENA, Anirudha; VINU, R; SHIVASHANKAR, S. A et al.Industrial & engineering chemistry research. 2010, Vol 49, Num 20, pp 9636-9643, issn 0888-5885, 8 p.Article

Thermal analysis and vapour pressure of a new series of tungsten(VI) oxo-alkoxide-β-ketoesterate complex precursors for the chemical vapour deposition of tungsten oxideKUNTE, G. V; SHIVASHANKAR, S. A; UMARJI, A. M et al.Thermochimica acta. 2008, Vol 474, Num 1-2, pp 12-15, issn 0040-6031, 4 p.Article

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