THE GROWTH OF ALPHA - AND BETA -SI₃ N₄ ACCOMPANYING THE NITRIDING OF SILICON POWDER COMPACTSLONGLAND P; MOULSON AJ.1978; J. MATER. SCI.; GBR; DA. 1978; VOL. 13; NO 10; PP. 2279-2280; BIBL. 12 REF.Article

ON THE INITIAL OXIDATION RATE OF SILICONREVESZ AG.1979; J. ELECTROCHEM. SOC.; USA; DA. 1979; VOL. 126; NO 3; PP. 502-503; BIBL. 7 REF.Article

THE INFLUENCE OF IRON AND HYDROGEN IN THE NITRIDATION OF SILICONDERVISBEGOVIC H; RILEY FL.1979; J. MATER. SCI.; GBR; DA. 1979; VOL. 14; NO 5; PP. 1265-1268; BIBL. 12 REF.Article

A NEW MODEL OF THE THERMAL GROWTH OF A SILICON DIOXIDE LAYERLORA TAMAYO A; DOMINGUEZ E; LORA TAMAYO E et al.1978; APPL. PHYS.; DEU; DA. 1978; VOL. 17; NO 1; PP. 79-84; BIBL. 21 REF.Article

ON SI NITRIDING KINETICS AND MECHANISMSMENDELSON MI.1979; J. MATER. SCI.; GBR; DA. 1979; VOL. 14; NO 7; PP. 1752-1754; BIBL. 16 REF.Article

SUR LES REACTIONS DU TRIFLUORURE DE CHLORE AVEC SIGARANIN VF.1979; Z. NEORG. HIM.; ISSN 0044-457X; SUN; DA. 1979; VOL. 24; NO 1; PP. 2892-2896; BIBL. 6 REF.Article

OXIDATION OF SILICONMOTT NF.1982; PHILOS. MAG., A; ISSN 0141-8610; GBR; DA. 1982; VOL. 45; NO 2; PP. 323-330; BIBL. 35 REF.Article

FLUORIDE ACCELERATED NITRIDATION OF SILICONCAMPOS LORIZ D; HOWLETT SP; RILEY FL et al.1979; J. MATER. SCI.; GBR; DA. 1979; VOL. 14; NO 10; PP. 2325-2334; BIBL. 26 REF.Article

KINETICS AND OXIDE PROPERTIES OF SILICON OXIDATION IN O₂-H₂-HCL MIXTURESEHARA K; SAKUMA K; OHWADA K et al.1979; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1979; VOL. 126; NO 12; PP. 2249-2254; BIBL. 15 REF.Article

THE ETCHING OF SILICON WITH XEF₂ VAPORWINTERS HF; COBURN JW.1979; APPL. PHYS. LETTERS; USA; DA. 1979; VOL. 34; NO 1; PP. 70-73; BIBL. 11 REF.Article

THERMAL OXIDATION OF SILICON STUDIED BY HIGH RESOLUTION RUTHERFORD BACKSCATTERINGGRANT WA; CHRISTODOULIDES CE; POGARIDES DC et al.1979; J. RADIOANAL. CHEM.; CHE; DA. 1979; VOL. 48; NO 1-2; PP. 277-286; BIBL. 11 REF.Article

THERMAL OXIDATION OF ARSENIC-DIFFUSED SILICONOHKAWA S; NAKAJIMA Y.1978; J. ELECTROCHEM. SOC.; USA; DA. 1978; VOL. 125; NO 12; PP. 1997-2002; BIBL. 11 REF.Article

INFLUENCE DES IMPURETES SUPERFICIELLES SUR LA CINETIQUE D'INTERACTION DU SILICIUM AVEC HF EN PRESENCE DE 0,01 M HNO₃IZIDINOV SO; YUDIN LA; RASKIN GS et al.1978; ZH. PRIKL. KHIM.; SUN; DA. 1978; VOL. 51; NO 10; PP. 2175-2181; BIBL. 23 REF.Article

HIGH RESOLUTION AES STUDY OF THE OXIDATION OF SI (111)LANG B; MOSSER A.1981; J. MICROSC. SPECTROSC. ELECTRON.; ISSN 0395-9279; FRA; DA. 1981; VOL. 6; NO 2; PP. 131-140; BIBL. 24 REF.Article

KINETICS OF HIGH PRESSURE OXIDATION OF SILICON IN PYROGENIC STEAMRAZOUK RR; LIE LN; DEAL BE et al.1981; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1981; VOL. 128; NO 10; PP. 2214-2220; BIBL. 15 REF.Article

KINETICS OF DECOMPOSITION OF AMORPHOUS HYDROGENATED SILICON FILMSMCMILLAN JA; PETERSON EM.1979; J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1979; VOL. 50; NO 8; PP. 5238-5241; BIBL. 15 REF.Article

REACTIVITY OF SOLID SILICON WITH HYDROGEN UNDER CONDITIONS OF A LOW PRESSURE PLASMAWEBB AP; VEPREK S.1979; CHEM. PHYS. LETTERS; NLD; DA. 1979; VOL. 62; NO 1; PP. 173-177; BIBL. 11 REF.Article

THE EFFECTS OF HYDROGEN ON THE NITRIDATION OF SILICONCAMPOS LORIZ D; RILEY FL.1979; J. MATER. SCI.; GBR; DA. 1979; VOL. 14; NO 4; PP. 1007-1008; BIBL. 10 REF.Article

THE FAST PYROTECHNIC REACTION OF SILICON WITH LEAD OXIDES: DIFFERENTIAL SCANNING CALORIMETRY AND HOT-STAGE MICROSCOPY STUDIESMOGHADDAM AZ; REES GJ.1981; FUEL (GUILDF.); ISSN 0016-2361; GBR; DA. 1981; VOL. 60; NO 7; PP. 629-632; BIBL. 12 REF.Article

CINETIQUE D'OXYDATION THERMIQUE DU SILICIUM DANS UN CHAMP ELECTRIQUE CONTINU, EN ATMOSPHERE D'OXYGENE SECUGAJ YA A; ANOKHIN VZ; MITTOVA I YA et al.1981; Z. FIZ. HIM.; ISSN 0044-4537; SUN; DA. 1981; VOL. 55; NO 10; PP. 2620-2623; BIBL. 4 REF.Article

ON THE OXIDATION KINETICS OF SILICON: THE ROLE OF WATERWOLTERS DR.1980; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1980; VOL. 127; NO 9; PP. 2072-2082; BIBL. 30 REF.Article

LOW TEMPERATURE, HIGH PRESSURE STEAM OXIDATION OF SILICONKATZ LE; HOWELLS BF JR.1979; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1979; VOL. 126; NO 10; PP. 1822-1824; BIBL. 19 REF.Article

THERMAL OXIDATION OF SILICON WITH TWO OXIDIZING SPECIESVILD MAIOR AA; FILIMON S.1979; REV. ROUMAINE PHYS.; ROM; DA. 1979; VOL. 24; NO 6; PP. 607-615; ABS. FRE; BIBL. 6 REF.Article

ETUDE DE L'OXYDATION A L'AIR DES COUCHES OBTENUES SUR SILICIUM APRES ACTION DES SOLUTIONS HF-NANO₂LOGINOV BB; GAJDAENKO VP.1979; ZH. PRIKL. SPEKTROSK.; BYS; DA. 1979; VOL. 31; NO 1; PP. 126-131; ABS. ENG; BIBL. 15 REF.Article

SILICON OXIDATION STUDIES: THE OXIDATION OF HEAVILY B- AND P-DOPED SINGLE CRYSTAL SILICONIRENE EA; DONG DW.1978; J. ELECTROCHEM. SOC.; USA; DA. 1978; VOL. 125; NO 7; PP. 1146-1151; BIBL. 17 REF.Article