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A TECHNIQUE FOR ELIMINATING STANDING WAVES AND OTHER INTERFERENCE EFFECTS IN PHOTORESISTLANG RJ; SMILOWITZ B.1980; I.E.E.E. TRANS. SONICS ULTRASON.; USA; DA. 1980; VOL. 27; NO 3; PP. 134-136; BIBL. 5 REF.Article

A SIMPLE MASK ALIGNER AND PRINTING FRAME FOR CONFORMABLE PHOTOMASK LITHOGRAPHYSMILOWITZ B; LANG RJ.1980; IEEE TRANS. ELECTRON DEVICES; ISSN 0018-9383; USA; DA. 1980; VOL. 27; NO 11; PP. 2165-2167; BIBL. 3 REF.Article

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