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The abrasion of hot silicon targets by reactive sputtering in Ar-O2STEENBECK, K.Thin solid films. 1985, Vol 123, Num 3, pp 239-244, issn 0040-6090Article

THE PROBLEM OF REACTIVE SPUTTERING AND COSPUTTERING OF ELEMENTAL TARGETSSTEENBECK K; STEINBEISS E; UFERT KD et al.1982; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1982; VOL. 92; NO 4; PP. 371-380; BIBL. 12 REF.Article

ZUM EINFLUSS DER SPUTTERBEDINGUNGEN BEI DER BESCHICHTUNG OXYDIERTER SI-SUBSTRATE AUF EIGENSCHAFTEN DER SI/SIO2-GRENZFLAECHE = INFLUENCE DES CONDITIONS DE PULVERISATION DANS LE CAS DU REVETEMENT DE SUBSTRATS EN SI OXYDES SUR LES CARACTERISTIQUES DE L'INTERFACE SI-SIO2STEENBECK K; SALM J; MICHALKE W et al.1979; EXPER. TECH. PHYS.; DDR; DA. 1979; VOL. 27; NO 6; PP. 543-550; ABS. ENG; BIBL. 17 REF.Article

DOTIERUNG DUENNER VO2-SCHICHTEN. = DOPAGE DE COUCHES MINCES VO2UFERT KD; STEENBECK K; STEINBEISS E et al.1977; KRISTALL U. TECH.; DTSCH.; DA. 1977; VOL. 12; NO 6; PP. 603-608; ABS. ANGL.; BIBL. 14 REF.Article

CURRENT-VOLTAGE CHARACTERISTIC OF REACTIVE SPUTTERING WITH ELEMENT TARGETSSALM J; STEENBECK K; STEINBEISS E et al.1979; PHYS. STATUS SOLIDI, A; DDR; DA. 1979; VOL. 54; NO 1; PP. K23-K26; BIBL. 4 REF.Article

Antiferromagnetic energy loss and exchange coupling of IrMn/CoFe films: experiments and simulationsSTEENBECK, K; MATTHEIS, R; DIEGEL, M et al.Journal of magnetism and magnetic materials. 2004, Vol 279, Num 2-3, pp 317-324, issn 0304-8853, 8 p.Article

An alternative method for metallization by laser and ion beam irradiationMACHALETT, F; EDINGER, K; DIEGEL, M et al.Microelectronic engineering. 2002, Vol 60, Num 3-4, pp 429-437, issn 0167-9317Article

Rotational hysteresis losses in sputtered rebco films of different structureANDRA, W; HERGT, R; MICHALKE, W et al.Physica. C. Superconductivity. 1991, Vol 185/89, pp 2169-2170, issn 0921-4534, p.4Conference Paper

Direct patterning of gold oxide thin films by focused ion-beam irradiationMACHALETT, F; EDINGER, K; MELNGAILIS, J et al.Applied physics. A, Materials science & processing (Print). 2000, Vol 71, Num 3, pp 331-335, issn 0947-8396Article

Different sputtering methods for the deposition of high-Tc superconducting thin filmsSTEINBEISS, E; BRUCHLOS, H; EICK, T et al.Vacuum. 1993, Vol 44, Num 11-12, pp 1113-1117, issn 0042-207XConference Paper

Laser surface interaction during and after deposition of thin oxide filmsSTAFAST, H; REDLICH, L; KÖHLER, T et al.Applied surface science. 1996, Vol 106, pp 335-340, issn 0169-4332Conference Paper

In-plane rotational magnetic losses in a laser deposited YBa2Cu3O7-x filmANDRAÊ, W; BETZ, J; BRUNNER, B et al.Physica status solidi. A. Applied research. 1990, Vol 122, Num 2, pp K161-K163, issn 0031-8965Article

Anisotropic magnetoresistance of (0 0 h), (0 h h) and (h h h) La2/3Sr1/3MnO3 thin films on (0 0 1) Si substratesBIBES, M; MARTINEZ, B; FONTCUBERTA, J et al.Journal of magnetism and magnetic materials. 2000, Vol 211, Num 1-3, pp 206-211, issn 0304-8853Conference Paper

Low voltage magnetron discharges for thin film preparationSTEENBECK, K; STEINBEISS, E; WINKLER, S et al.Vacuum. 1990, Vol 42, Num 1-2, pp 39-41, issn 0042-207X, 3 p.Conference Paper

Critical current density and flux pinning determined by different methodsANDRA, W; BRUCHLOS, H; EICK, T et al.Physica. C. Superconductivity. 1991, Vol 180, Num 1-4, pp 184-187, issn 0921-4534Conference Paper

Epitaxial Tl-Ba-Ca-Cu-O films : preparation, properties and applicationsSTEINBEISS, E; MANZEL, M; SCHMIDT, H. G et al.Vacuum. 1996, Vol 47, Num 9, pp 1117-1122, issn 0042-207XArticle

Characterization of YBCO films by torque magnetometryANDRA, W; BETZ, J; BRUNNER, B et al.Physica. C. Superconductivity. 1991, Vol 180, Num 1-4, pp 188-191, issn 0921-4534Conference Paper

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