Effect of the projectile parameters on the charge state formation process in solid sputteringBELYKH, S. F; PALITSIN, V. V; ADRIAENS, A et al.Applied surface science. 2003, Vol 203-04, pp 126-129, issn 0169-4332, 4 p.Conference Paper

Introduction to the Cameca SIMS instrumentsSCHUHMACHER, M.Le Vide (1995). 1999, Vol 54, Num 292, issn 1266-0167, 139, 231-244 [15 p.]Article

Detection of gaseous organophosphorus compounds using secondary ion mass spectrometryGROENEWOLD, G. S; TODD, P. J.Analytical chemistry (Washington, DC). 1985, Vol 57, Num 4, pp 886-890, issn 0003-2700Article

Secondary ion mass spectrometer design considerations for organic and inorganic analysisMAGEE, C. W.A.C.S. symposium series. 1985, Num 291, pp 97-112, issn 0097-6156Article

The effect of oxygen flooding on the secondary ion yield of Cs in the cameca IMS 3fSYKES, D. E; CHEW, A; CRAPPER, M. D et al.Vacuum. 1992, Vol 43, Num 1-2, pp 159-162, issn 0042-207XConference Paper

Sources of uncertainty in the experimental determination of sample heterogeneity in secondary ion mass spectrometryMICHIELS, F. P. L; ADAMS, F. C. V.Analytical chemistry (Washington, DC). 1991, Vol 63, Num 23, pp 2735-2743, issn 0003-2700Article

Isotopic studies of oxidation of Si₃N₄ and Si using SIMSHONGHUA DU; HOUSER, C. A; TRESSLER, R. E et al.Journal of the Electrochemical Society. 1990, Vol 137, Num 2, pp 741-742, issn 0013-4651, 2 p.Article

Relative sensitivity factors of elements in quantitative secondary ion mass spectrometric analysis of biological reference materialsRAMSEYER, G. O; MORRISON, G. H.Analytical chemistry (Washington, DC). 1983, Vol 55, Num 12, pp 1963-1970, issn 0003-2700Article

Shave-off depth profiling for nano-devicesNOJIMA, Masashi; TOI, Masayuki; MAEKAWA, Ayaka et al.Mikrochimica acta (1966. Print). 2006, Vol 155, Num 1-2, pp 219-223, issn 0026-3672, 5 p.Conference Paper

Sputtered neutral mass spectrometryREUTER, W.TrAC. Trends in analytical chemistry (Regular ed.). 1989, Vol 8, Num 6, pp 203-208, issn 0165-9936Article

Static SIMS investigation of Ag-supported amino acidsTAMAKI, S; SICHTERMANN, W; BENNINGHOVEN, A et al.Japanese journal of applied physics. 1984, Vol 23, Num 5, pp 544-549, issn 0021-4922, 1Article

Sulfur Isotope Studies in Solid Organics: A Protocol for Utilizing Heterogeneous Standards and Secondary Ion Mass SpectrometryKING, Hubert E; ZIMMER, Mindy M; HORN, William C et al.Energy & fuels. 2014, Vol 28, Num 3-4, pp 2446-2453, issn 0887-0624, 8 p.Article

Secondary electron analysis of polymeric sions generated by an electrospray ion sourceXU, Y; BAE, Y. K; BEUHLER, R. J et al.Journal of physical chemistry (1952). 1993, Vol 97, Num 46, pp 11883-11886, issn 0022-3654Article

Comment on High-spatial and high-mass-resolution SIMS instrument for the surface analysis of chemically complex materials [Rev. Sci. Instrum. 60, 53 (1989)]. ReplyCONTY, C; SCHUETZLE, D; PRATER, T. J et al.Review of scientific instruments. 1990, Vol 61, Num 1, pp 203-204, issn 0034-6748, 1Article

Ion yields of impurities in gallium arsenide for secondary ion mass spectrometryHOMMA, Y; TANAKA, T.Analytical chemistry (Washington, DC). 1986, Vol 58, Num 6, pp 1108-1112, issn 0003-2700Article

Structural investigation of the antibiotic sporaviridin. XI: Molecular secondary ion mass spectral studies on the constituent pentasaccharides viridopentaosesHARADA, K.-I; KIMURA, I; MASUDA, K et al.Organic mass spectrometry. 1985, Vol 20, Num 9, pp 582-588, issn 0030-493XArticle

Experimental and theorical investigations into the origin of cross-contamination effects observed in a quadrupole-based SIMS instrumentWITTMAACK, K.Applied physics. A, Solids and surfaces. 1985, Vol 38, Num 4, pp 235-252, issn 0721-7250Article

XPS, static SIMS and NEXAFS spectroscopic investigation of thiol adsorption on metals and metal sulfidesGOH, S. W; BUCKLEY, A. N; LAMB, R. N et al.Proceedings - Electrochemical Society. 2006, pp 107-119, issn 0161-6374, isbn 1-56677-440-3, 1Vol, 13 p.Conference Paper

Optimization of the dynamic range of SIMS depth profiles by sample preparationVON CRIEGERN, R; WEITZEL, I; ZEININGER, H et al.Surface and interface analysis. 1990, Vol 15, Num 7, pp 415-421, issn 0142-2421Article

Analysis of polymer surfaces by SIMS. V: The effects of primary ion mass and energy on secondary ion relative intensitiesBRIGGS, D; HEARN, M. J.International journal of mass spectrometry and ion processes. 1985, Vol 67, Num 1, pp 47-56, issn 0168-1176Article

Selective detection of aldehydes and ketones by derivatization/secondary ion mass spectrometryROSS, M. M; KIDWELL, D. A; COLTON, R. J et al.International journal of mass spectrometry and ion processes. 1985, Vol 63, Num 1, pp 141-148, issn 0168-1176Article

Triple-quadrupole secondary ion mass spectrometry of low-temperature solids: collision-activated dissociation of large clusters ionsMAGNERA, T. F; DAVID, D. E; TIAN, R et al.Journal of the American Chemical Society. 1984, Vol 106, Num 17, pp 5040-5041, issn 0002-7863Article

Implementing a SIMS ion source on the NRL trace element accelerator mass spectrometerKNIES, D. L; GRABOWSKI, K. S; CETINA, C et al.Applied surface science. 2006, Vol 252, Num 19, pp 7297-7300, issn 0169-4332, 4 p.Conference Paper

Quantification of molecular secondary ion mass spectrometry by internal standardsMEYER, K; HAGENHOFF, B; DEIMEL, M et al.Organic mass spectrometry. 1992, Vol 27, Num 10, pp 1148-1150, issn 0030-493XArticle

Range of high energy phophorus and medium energy boron ions implanted in polymersTSOUKALAS, D.Solid-state electronics. 1990, Vol 33, Num 6, pp 639-643, issn 0038-1101, 5 p.Article