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Photochemistry of phenyl-substituted methylpolysilanes. Extended Pariser-Parr-Pople-Sandorfy C approachBŁONSKI, S; HERMAN, A; KONIECZNY, S et al.Spectrochimica acta. Part A : Molecular spectroscopy. 1989, Vol 45, Num 7, pp 753-758, issn 0584-8539, 6 p.Article

Polysilahydrocarbon synthetic fluids. I : Synthesis and characterization of trisilahydrocarbonsPACIOREK, K. J. L; SHIH, J. G; KRATZER, R. H et al.Industrial & engineering chemistry research. 1990, Vol 29, Num 9, pp 1855-1858, issn 0888-5885Article

Untersuchungen zur Photoleitfähigkeit Dotierter Polysilane = Investigation concerning the photoconductivity of doped polysilanesECKHARDT, A; CIMROVA, V; NESPUREK, S et al.Journal of information recording materials (1985). 1994, Vol 21, Num 5-6, pp 705-706, issn 0863-0453Conference Paper

Site-selective fluorescence spectroscopy of a matrix-isolated poly-octylmethylsilaneRAUSCHER, U; BÄSSLER, H; TAYLOR, R et al.Chemical physics letters. 1989, Vol 162, Num 1-2, pp 127-131, issn 0009-2614, 5 p.Article

Poly(methyl-phenylsilylene) derivatives as photoconductorsKMINEK, I; NESPUREK, S; BRYNDA, E et al.Collection of Czechoslovak chemical communications. 1993, Vol 58, Num 10, pp 2337-2348, issn 0010-0765Article

Highly mobile charge carriers in poly(di-n-alkyl)silanes in the solid and in the mesophaseVAN DER LAAN, G. P; DE HAAS, M. P; WARMAN, J. M et al.Molecular crystals and liquid crystals science and technology. Section A, Molecular crystals and liquid crystals. 1993, Vol 234-36, pp 705-712, issn 1058-725XConference Paper

Organosilane high polymers: electronic spectra and photodegradationTREFONAS, P. III; WEST, R; MILLER, R. D et al.Journal of polymer science. Polymer letters edition. 1983, Vol 21, Num 10, pp 823-829, issn 0360-6384Article

Characterization of plasma polymer films of phenylsilane by X-ray photoelectron spectroscopyOELHAFEN, P; CUTRO, J. A; HALLER, I et al.Journal of electron spectroscopy and related phenomena. 1984, Vol 34, Num 2, pp 105-113, issn 0368-2048Article

Prephotobleaching process in polysilane filmsHAYASHI, H; KURANDO, T; NAKAYAMA, Y et al.Japanese journal of applied physics. 1997, Vol 36, Num 3A, pp 1250-1255, issn 0021-4922, 1Article

Photobleaching process in polysilane filmsHAYASHI, H; KURANDO, T; OKA, K et al.Japanese journal of applied physics. 1996, Vol 35, Num 7, pp 4096-4100, issn 0021-4922, 1Article

Silicon or fluorine-containing polymersNARITA, T.International journal of polymeric materials (Print). 1993, Vol 20, Num 3-4, pp 285-290, issn 0091-4037Article

Nachweis von [(OC)4Fe=Si(CH3)2•{(H3C)2N}3PO] als Zwischenstufe der Polysilanbildung aus (H3C)2SiCl2 und [Na2Fe(CO)4] = Preuve de [(OC)4Fe=Si(CH3)2•{(H3C)2N3}Po] comme étape intermédiaire de la formation de polysilane à partir de (H3C)SiCl2 et [Na2Fe(CO)4] = Proof of [(OC)4Fe=Si(CH3)2•{(H3C)2N3}Po] as intermediar state of formation of polysilane from of (H3C)SiCl2 and [Na2Fe(CO)4]ZYBILL, C; WILKINSON, D. L; LEIS, C et al.Angewandte Chemie. 1989, Vol 101, Num 2, pp 206-207, issn 0044-8249Article

Löschung der Anregungszustände Verschiedener Sensibilisatoren durch Oniumsalze in Umpolaren Medien = aFÜLLBIER, A; MÜLLER, U; FOUASSIER, J. P et al.Journal of information recording materials (1985). 1994, Vol 21, Num 5-6, pp 611-612, issn 0863-0453Conference Paper

Photoluminescence from silicon-chain cluster in poly(dimethylsilane) evaporated filmHATTORI, R; SUGANO, T; SHIRAFUJI, J et al.Applied surface science. 1997, Vol 113114, pp 472-475, issn 0169-4332Conference Paper

Conformational analysis of poly(di-n-hexylsilylene)DAMEWOOD, J. R. JR.Macromolecules. 1985, Vol 18, Num 9, pp 1793-1795, issn 0024-9297Article

The electrical conductivity of polysilane (SiH2)xJOHN, P; ODEH, I. M; WOOD, J et al.Journal of the Chemical Society. Chemical communications. 1983, Num 24, pp 1496-1497, issn 0022-4936Article

Polysilane photoluminescence specific to oriented thin filmsTANIGAKI, N; KAITO, A; YOSHIDA, M et al.Molecular crystals and liquid crystals science and technology. Section A, Molecular crystals and liquid crystals. 1999, Vol 337, pp 381-384, issn 1058-725XConference Paper

Inorganic-organic polymers derived from functional silicic acid derivatives by additive reactionHOEBBEL, D; ENDRES, K; REINERT, T et al.Journal of non-crystalline solids. 1994, Vol 176, Num 2-3, pp 179-188, issn 0022-3093Article

Directly synthesized polycarbosilanes as binding agents for pressurelessly sintered SiC-materialsSARTORI, P; HABEL, W; VAN AEFFERDEN, B et al.Precursors for CVD and MOCD. European journal of solid state and inorganic chemistry. 1992, Vol 29, pp 127-146, SUPBook Chapter

Novel silicon-containing hydrocarbon rings and polymers via metathesis : X-ray crystal structure of cis,cis-1,1,6,6-tetraphenyl-1,6-disilacyclodeca-3,8-dieneANHAUS, J. T; CLEGG, W; COLLINGWOOD, S. P et al.Journal of the Chemical Society. Chemical communications. 1991, Num 24, pp 1720-1722, issn 0022-4936Article

En Japonais = Thermal oxidation mechanism of polycarbosilaneHASEGAWA, Y.Nippon kagaku kaishi (1972). 1991, Num 10, pp 1271-1277, issn 0369-4577Article

One- and two-photon excitations of σ-conjugated chainsSOOS, Z. G; HAYDEN, G. W.Chemical physics. 1990, Vol 143, Num 2, pp 199-207, issn 0301-0104, 9 p.Article

Photoinitiation of vinyl polymerization by polysilanesWOLFF, A. R; WEST, R.Applied organometallic chemistry. 1987, Vol 1, Num 1, pp 7-14, issn 0268-2605Article

Reduzierung der Feuchteempfindlichkeit beim Epoxidharzeinsatz im Bauwesen durch Silanhaftmittel = Réduction de la sensibilité à l'humidité des résines époxydes des utilisées dans le bâtiment par emploi d'adhésifs à base de silanes = Diminishing the moisture sensivity of epoxy resins used in bulding by silane bonding agentsETTEL, W.-P; GAERTIG, H.-J.Plaste und Kautschuk. 1983, Vol 30, Num 11, pp 647-649, issn 0048-4350Article

Plasma polymerization of tetramethylsilaneFONSECA, J. L. C; APPERLEY, D. C; BADYAL, J. P. S et al.Chemistry of materials. 1993, Vol 5, Num 11, pp 1676-1682, issn 0897-4756Article

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