DETERMINATION OF THE THERMODYNAMIC CONDITIONS TO VAPOUR DEPOSIT TI_XC_1-X AT 1800 KTEYSSANDIER F; DUCARROIR M; BERNARD C et al.1981; J. LESS. COMMON MET.; ISSN 0022-5088; CHE; DA. 1981; VOL. 78; NO 2; PP. 269-274; BIBL. 11 REF.Article

DEPOT EN PHASE VAPEUR DE CARBURE DE TITANE NON STOECHIOMETRIQUE: PREDICTIONS THEORIQUES ET EXPERIENCESTEYSSANDIER F; NADAL M; DUCARROIR M et al.1981; REV. INT. HAUTES TEMP. REFRACT.; ISSN 0035-3434; FRA; DA. 1981; VOL. 18; NO 3; PP. 215-226; ABS. ENG; BIBL. 12 REF.Article

Réalisation de revêtements céramiques dans le système V-C-O à partir d'un précurseur organométallique: le vanadocène = Ceramic coatings in the V-C-O system with vanadocene used as an organometallic precursorPoirier, Laurent; Teyssandier, F.1996, 115 p.Thesis

Thermodynamic approach to the OMCVD of titanium carbide from titanocene dichlorideSLIFIRSKI, J; TEYSSANDIER, F.Advanced materials (Weinheim). 1996, Vol 8, Num 11, pp 247-251, issn 0935-9648Article

Précurseurs « métalloorganiques » et dépôt chimique à partir d'une phase gazeuse = Metal-organic precursors and chemical vapor depositionVALADE, L; TEYSSANDIER, F.L' Actualité chimique (Paris. 1973). 1999, Num 2, pp 14-21, issn 0151-9093Article

Titanocene dichloride used as a precursor for the chemical vapor deposition of titanium carbide : influence of gas phase transportSLIFIRSKI, J; TEYSSANDIER, F.Surface & coatings technology. 1996, Vol 80, Num 3, pp 255-263, issn 0257-8972Article

Cure Advancement of Urethane Networks Using a Sigmoidal Chemorheological ModelTEYSSANDIER, F; LOVE, B. J.Polymer engineering and science. 2010, Vol 50, Num 3, pp 5127-5131, issn 0032-3888, 5 p.Article

MMa Bulk Polymerization and Its Influence on In Situ Resin Viscosity Comparing Several Chemorheological ModelsTEYSSANDIER, F; LOVE, B. J.Journal of applied polymer science (Print). 2011, Vol 120, Num 3, pp 1367-1371, issn 0021-8995, 5 p.Article

Determination de la composition de solutions solides de TiCxNy par utilisation simultanée de la spectrométrie de rétrodiffusion élastique Rutherford et de l'analyse par réactions nucléaires = Determination of TiC_xNy solid solution composition by simultaneous use of elastic Rutherford backscattering spectrometry and nuclear reaction analysisMOSBAH, M; TEYSSANDIER, F.Journal de microscopie et de spectroscopie électroniques. 1987, Vol 12, Num 5, pp 499-500, issn 0395-9279Article

Etude d'un réacteur destiné à caractériser par effet Raman spontané la phase gazeuse dans le procédé de dépôt chimique en phase vapeur = Conception and realization of a reactor for the gas phase study in the chemical vapour deposition process by Raman spectroscopyBisch, Christophe; Teyssandier, F.1996, 159 p.Thesis

Titanium carbide and titanium carbonitride obtained by chemical vapor deposition from organometallic precursor in the range 450-800 °CSLIFIRSKI, J; TEYSSANDIER, F.Journal de physique. IV. 1993, Vol 3, Num 3, pp 367-374, issn 1155-4339Conference Paper

Characterization of C-B-N solid solutions deposited from a gaseous phase between 900° and 1050°CSAUGNAC, F; TEYSSANDIER, F; MARCHAND, A et al.Journal of the American Ceramic Society. 1992, Vol 75, Num 1, pp 161-169, issn 0002-7820Article

Influence des paramètres expérimentaux sur le dépôt chimique en phase gazeuse de TiC sur acier = Influence of experimental parameters on TiC chemical vapour deposition on steelDERRE, A; DUCARROIR, M; TEYSSANDIER, F et al.Mécanique, matériaux, électricité. 1987, Num 421, pp 3-6, issn 0025-6439Conference Paper

Chemorheology of Photopolymerizable Acrylates Using a Modified Boltzmann Sigmoidal ModelLOVE, B. J; PIGUET RUINET, F; TEYSSANDIER, F et al.Journal of polymer science. Part B. Polymer physics. 2008, Vol 46, Num 21, pp 2319-2325, issn 0887-6266, 7 p.Article

Réflexions sur des possibilités d'amélioration de la résistance à l'oxydation des matériaux carbonés = Remarks for the improvement of the resistance against oxidation of carbon bearing materialsDERRE, A; DUCARROIR, M; TEYSSANDIER, F et al.Revue internationale des hautes températures et des réfractaires. 1994, Vol 29, Num 1, pp 11-35, issn 0035-3434Article

Theoretical approach to chemical vapour deposition in the atomic system Ti-Si-C-Cl-HTOUANEN, M; TEYSSANDIER, F; DUCARROIR, M et al.Journal of materials science letters. 1989, Vol 8, Num 1, pp 98-101, issn 0261-8028Article

Titanium carbide coatings on steel: study of the conditions of elaboration and of substrate-coating interactions = Revêtement de carbure de titane sur l'acier: étude des conditions d'élaboration et des interactions substrat-revêtementDERRE, A; TEYSSANDIER, F; DUCARROIR, M et al.Journal de physique. Colloques. 1989, Vol 50, Num 5, pp C5.445-C5.453, issn 0449-1947Conference Paper

2D modelling of non-confined circular impinging jet reactor; Si chemical vapour depositionWANG, Y. B; CHAUSSAVOINE, C; TEYSSANDIER, F et al.Journal of crystal growth. 1993, Vol 126, Num 2-3, pp 373-395, issn 0022-0248Article

How to avoid characterization of steel substrate during chemical vapour deposition of titanium carbideDERRE, A; TEYSSANDIER, F; DUCARROIR, M et al.Thin solid films. 1991, Vol 202, Num 1, pp 125-135, issn 0040-6090, 11 p.Article

Modeling the Effect of the Curing Conversion on the Dynamic Viscosity of Epoxy Resins Cured by an Anhydride Curing AgentTEYSSANDIER, F; IVANKOVIC, M; LOVE, B. J et al.Journal of applied polymer science (Print). 2010, Vol 115, Num 3, pp 1671-1674, issn 0021-8995, 4 p.Article

Rate constants of reactions involving SiH₄ as an association product from quantum Rice-Ramsperger-Kassel calculationsDOLLET, A; DE PERSIS, S; TEYSSANDIER, F et al.PCCP. Physical chemistry chemical physics (Print). 2004, Vol 6, Num 6, pp 1203-1212, issn 1463-9076, 10 p.Article

Optimization of a wall-less like reactor by simulationWANG, Y. B; BISCH, C; TEYSSANDIER, F et al.Chemical engineering science. 1995, Vol 50, Num 10, pp 1605-1617, issn 0009-2509Article

Two-dimensional modelling of a non-confined circular impinging jet reactor : fluid dynamics and heat transferWANG, Y. B; CHAUSSAVOINE, C; TEYSSANDIER, F et al.International journal of heat and mass transfer. 1993, Vol 36, Num 4, pp 857-873, issn 0017-9310Article

Carbon-boron-nitrogen compounds obtained between 800 and 1000°C by low temperature chemical vapor depositionSAUGNAC, F; TEYSSANDIER, F; MARCHAND, A et al.Journal de chimie physique. 1992, Vol 89, Num 6, pp 1453-1468, issn 0021-7689Article

Deposition of nonstoichiometric TiC at high temperatureTEYSSANDIER, F; BERNARD, C; DUCARRIOR, M et al.Journal of the Electrochemical Society. 1988, Vol 135, Num 1, pp 225-229, issn 0013-4651Article