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au.\*:("THOMPSON LF")

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POLY (VINYLFERROCENE)-CONVERSION TO AN OXIDIZED IRON SYSTEM SUITABLE FOR USE AS A SEMITRANSPARENT HARD PHOTOMASK.THOMPSON LF.1975; J. ELECTROCHEM. SOC.; U.S.A.; DA. 1975; VOL. 122; NO 1; PP. 108-111; BIBL. 11 REF.Article

DESIGN OF POLYMER RESISTS FOR ELECTRON LITHOGRAPHY. I.THOMPSON LF.1974; SOLID STATE TECHNOL.; U.S.A.; DA. 1974; VOL. 17; NO 7; PP. 27-40 (5P.); BIBL. 21 REF.Article

DESIGN OF POLYMER RESISTS FOR ELECTRON LITHOGRAPHY. II.THOMPSON LF.1974; SOLID STATE TECHNOL.; U.S.A.; DA. 1974; NO 8; PP. 41-46; BIBL. 21 REF.Article

NITROGEN COMPOUND DISTRIBUTIONS IN HYDROTREATED SHALE OIL PRODUCTS FROM COMMERCIAL-SCALE REFININGHOLMES SA; THOMPSON LF.1983; FUEL (GUILDFORD); ISSN 0016-2361; GBR; DA. 1983; VOL. 62; NO 6; PP. 709-717; BIBL. 23 REF.Article

IS GROWTH OF PLANTS FOLLOWING RICE AFFECTED BY MANGANESE TOXICITY.THOMPSON LF; MAJEDI MR.1980; ARKANSAS FARM RES.; USA; DA. 1980; VOL. 29; NO 5; PP. 14Article

EFFECT OF OLEFIN STRUCTURE ON THE VAPOR-DEVELOPMENT OF POLY(OLEFIN SULFONES) UNDER ELECTRON IRRADIATION.BOWDEN MJ; THOMPSON LF.1977; POLYM. ENGNG SCI.; U.S.A.; DA. 1977; VOL. 17; NO 4; PP. 269-273; BIBL. 10 REF.Article

A NEW FAMILY OF POSITIVE ELECTRON BEAM RESISTS. POLY(OLEFIN SULFONES)THOMPSON LF; BOWDEN MJ.1973; J. ELECTROCHEM. SOC.; U.S.A.; DA. 1973; VOL. 120; NO 12; PP. 1722-1726; BIBL. 8 REF.Article

RESIST MATERIALS FOR FINE LINE LITHOGRAPHYBOWDEN MJ; THOMPSON LF.1979; SOLID STATE TECHNOL.; USA; DA. 1979; VOL. 22; NO 5; PP. 72-82; BIBL. 91 REF.Article

DIRECT OBSERVATION OF BACKSCATTER ELECTRON DISTRIBUTIONS ON SURFACESHEIDENREICH RD; THOMPSON LF.1973; APPL. PHYS. LETTERS; U.S.A.; DA. 1973; VOL. 22; NO 6; PP. 279-281; BIBL. 4 REF.Serial Issue

SPECTRAL PROPERTIES OF NOVA LMC 1977BCANTERNA R; THOMPSON LF.1981; PUBL. ASTRON. SOC. PAC.; ISSN 0004-6280; USA; DA. 1981; VOL. 93; NO 555; PP. 581-586; BIBL. 17 REF.Article

ADENOSINE DEAMINASE DEFICIENCY AND SEVERE COMBINED IMMUNODEFICIENCY DISEASETHOMPSON LF; SEEGMILLER JE.1980; ADV. ENZYMOL.; ISSN 0373-1871; GBR; DA. 1980; VOL. 51; PP. 167-210; BIBL. 220 REF.Article

GEL PERMEATION CHROMATOGRAPHY OF POLYSULFONESBOWDEN MJ; THOMPSON LF.1975; J. APPL. POLYM. SCI.; U.S.A.; DA. 1975; VOL. 19; NO 3; PP. 905-906; BIBL. 4 REF.Article

THE PLASMA POLYMERIZATION OF VINYL MONOMERS. I. THE DESIGN, CONSTRUCTION, AND OPERATION OF AN INDUCTIVELY COUPLED PLASMA GENERATOR AND PRELIMINARY STUDIES WITH NINE MONOMERSTHOMPSON LF; MAYHAN KG.1972; J. APPL. POLYM. SCI.; U.S.A.; DA. 1972; VOL. 16; NO 9; PP. 2291-2315; BIBL. 15 REF.Serial Issue

THE PLASMA POLYMERIZATION OF VINYL MONOMERS. II. A DETAILED STUDY OF THE PLASMA POLYMERIZATION OF STYRENETHOMPSON LF; MAYHAN KG.1972; J. APPL. POLYM. SCI.; U.S.A.; DA. 1972; VOL. 16; NO 9; PP. 2317-2341; BIBL. 5 REF.Serial Issue

POLY (BUTENE-1 SULFONE) AS A POSITIVE ELECTRON RESISTBOWDEN MJ; THOMPSON LF.1974; APPL. POLYM. SYMP.; U.S.A.; DA. 1974; NO 23; PP. 99-106; BIBL. 11 REF.; (2ND SYMP. SCANNING ELECTRON MICROSC. POLYM. COATINGS. 165TH NATL. MEET. AM. CHEM. SOC.; DALLAS; 1973)Conference Paper

POLY(STYRENE SULFONE). A SENSITIVE ION-MILLABLE POSITIVE ELECTRON BEAM RESISTBOWDEN MJ; THOMPSON LF.1974; J. ELECTROCHEM. SOC.; U.S.A.; DA. 1974; VOL. 121; NO 12; PP. 1620-1623; BIBL. 11 REF.Article

VAPOR DEVELOPMENT OF POLY (OLEFIN SULFONE) RESISTSBOWDEN MJ; THOMPSON LF.1974; POLYM. ENGNG SCI.; U.S.A.; DA. 1974; VOL. 14; NO 7; PP. 525-528; BIBL. 7 REF.; (PHOTOPOLYM.: PRINC., PROCESSES MATER. 3RD PHOTOPOLYM. CONF.; ELLENVILLE, N.Y.; 1973)Conference Paper

POLYMER RESIST SYSTEMS FOR PHOTO- AND ELECTRON LITHOGRAPHY.THOMPSON LF; KERWIN RE.1976; ANNU. REV. MATER. SCI.; U.S.A.; DA. 1976; VOL. 6; PP. 267-301; BIBL. 1 P. 1/2Article

NEGATIVE ELECTRON RESISTS FOR DIRECT DEVICE LITHOGRAPHY. I: INITIAL MATERIAL SURVEYTHOMPSON LF; DOERRIES EM.1979; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1979; VOL. 126; NO 10; PP. 1699-1702; BIBL. 27 REF.Article

POLY(BUTENE-1 SULFONE) - A HIGHLY SENSITIVE POSITIVE RESIST.BOWDEN MJ; THOMPSON LF; BALLANTYNE JP et al.1975; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1975; VOL. 12; NO 6; PP. 1294-1296; BIBL. 9 REF.; (SYMP. ELECTRON ION PHOTON BEAM TECHNOL. 13. PROC.; COLORADO SPRINGS; 1975)Conference Paper

LITHOGRAPHY AND RADIATION CHEMISTRY OF EPOXY CONTAINING NEGATIVE ELECTRON RESISTS.THOMPSON LF; FEIT ED; HEIDENREICH RD et al.1974; POLYM. ENGNG SCI.; U.S.A.; DA. 1974; VOL. 14; NO 7; PP. 529-533; BIBL. 10 REF.; (PHOTOPOLYM.: PRINC., PROCESSES MATER. 3RD PHOTOPOLYM. CONF.; ELLENVILLE, N.Y.; 1973)Conference Paper

ION BEAM EXPOSURE CHARACTERISTICS OF RESISTS: EXPERIMENTAL RESULTSHALL TM; WAGNER A; THOMPSON LF et al.1982; J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1982; VOL. 53; NO 6; PP. 3997-4010; BIBL. 18 REF.Article

CHLOROSIS OF BLUEBERRIES IN THE OZARKSARNOLD JT; SCHALLER CC; THOMPSON LF et al.1982; ARKANSAS FARM RES.; USA; DA. 1982; VOL. 31; NO 2; PP. 8-9Article

IDENTIFICATION OF ORGANOSILICON LIQUIDS BY INFRARED SPECTROSCOPYMAYHAN KG; THOMPSON LF; MAGDALIN CF et al.1972; J. PAINT TECHNOL.; U.S.A.; DA. 1972; VOL. 44; NO 567; PP. 85-93; BIBL. 22 REF.Serial Issue

POLY (BUTENE-1 SULFONE) - A HIGHLY SENSITIVE POSITIVE RESIST.BOWDEN MJ; THOMPSON LF; BALLANTYNE JP et al.1975; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1975; VOL. 12; NO 6; PP. 1294-1296; BIBL. 9 REF.; (SYMP. ELECTRON ION PHOTON BEAM TECHNOL. 13. PROC.; COLORADO SPRINGS; 1975)Conference Paper

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