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MONTE CARLO SIMULATION OF FAST SECONDARY ELECTRON PRODUCTION IN ELECTRON BEAM RESISTSMURATA K; KYSER DF; TING CH et al.1981; J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1981; VOL. 52; NO 7; PP. 4396-4405; BIBL. 57 REF.Article

APPLICATION OF LINE-EDGE PROFILE SIMULATION TO THIN-FILM DEPOSITION PROCESSESNEUREUTHER AR; TING CH; CHEN YIH LIU et al.1980; IEEE TRANS. ELECTRON. DEVICES; ISSN 0018-9383; USA; DA. 1980; VOL. 27; NO 8; PP. 1449-1455; BIBL. 6 REF.Article

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