au.\*:("TRACHTENBERG I")
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APPLICATION OF A SULFATE-SENSITIVE ELECTRODE TO NATURAL WATERSJASINSKI R; TRACHTENBERG I.1973; ANAL. CHEM.; U.S.A.; DA. 1973; VOL. 45; NO 7; PP. 1277-1279; BIBL. 6 REF.Serial Issue
APPLICATION OF A SULFATE-SENSITIVE ELECTRODE TO NATURAL WATERSJASINSKI R; TRACHTENBERG I.1973; ANAL. CHEM.; U.S.A. ; 1973, VOL. 45, NUM. 0007, P. 1277 A 1279Serial Issue
POTENTIOMETRIC TITRATION OF SULFATE USING AN ION-SELECTIVE IRON ELECTRODEJASINSKI R; TRACHTENBERG I.1972; ANAL. CHEM.; U.S.A.; DA. 1972; VOL. 44; NO 14; PP. 2373-2376; BIBL. 7 REF.Serial Issue
HYDROBROMIC ACID ELECTROLYSIS USING THE TEXAS INSTRUMENTS SOLAR CHEMICAL CONVERTERLUTTMER JD; TRACHTENBERG I.1982; ELECTROCHEMICAL SOCIETY. SPRING MEETING. GENERAL SESSION/1982-05-09/MONTREAL PQ; USA; PENNINGTON: ELECTROCHEMICAL SOCIETY; DA. 1982; PP. 737Conference Paper
STUDIES OF A NITROGEN DIOXIDE SENSITIVE, CHALCOGENIDE GLASS ELECTRODEJASINSKI R; BARNA G; TRACHTENBERG I et al.1974; J. ELECTROCHEM. SOC.; U.S.A.; DA. 1974; VOL. 121; NO 12; PP. 1575-1578; BIBL. 8 REF.Article
Performance predictions for solar-chemical convertors by computer simulationLUTTMER, J. D; TRACHTENBERG, I.Journal of the Electrochemical Society. 1985, Vol 132, Num 8, pp 1820-1824, issn 0013-4651Article
Modeling and scale-up of multiwafer LPCVD reactorsBADGWELL, T. A; EDGAR, T. F; TRACHTENBERG, I et al.AIChE journal. 1992, Vol 38, Num 6, pp 926-938, issn 0001-1541Article
Mathematical modeling of a single-wafer rapid thermal reactorCHATTERJEE, S; TRACHTENBERG, I; EDGAR, T. F et al.Journal of the Electrochemical Society. 1992, Vol 139, Num 12, pp 3682-3689, issn 0013-4651Article
Electrode materials for hydrobromic acid electrolysis in Texas Instruments' solar chemical converterLUTTMER, J. D; KONRAD, D; TRACHTENBERG, I et al.Journal of the Electrochemical Society. 1985, Vol 132, Num 5, pp 1054-1058, issn 0013-4651Article
Modeling the wafer temperature profile in a multiwafer LPCVD furnaceBADGWELL, T. A; TRACHTENBERG, I; EDGAR, T. F et al.Journal of the Electrochemical Society. 1994, Vol 141, Num 1, pp 161-172, issn 0013-4651Article
Anisotropic etching of SiO2 with a 38.2 weight percent hydrofluoric acid aerosolJURCIK, B. J; BROCK, J. R; TRACHTENBERG, I et al.Journal of the Electrochemical Society. 1991, Vol 138, Num 7, pp 2141-2145, issn 0013-4651Article
Modeling of silicon etching in CF4/O2 and CF4/H2 plasmasVENKATESAN, S. P; TRACHTENBERG, I; EDGAR, T. F et al.Journal of the Electrochemical Society. 1990, Vol 137, Num 7, pp 2280-2290, issn 0013-4651, 11 p.Article
A predictive model for the chemical vapor deposition of polysilicon in a cold wall, rapid thermal systemTOPRAC, A. J; TRACHTENBERG, I; EDGAR, T. F et al.Journal of the Electrochemical Society. 1994, Vol 141, Num 6, pp 1658-1663, issn 0013-4651Article
Modeling of gas-phase chemistry in the chemical vapor deposition of polysilicon in a cold wall systemTOPRAC, A. J; EDGAR, T. F; TRACHTENBERG, I et al.Journal of the Electrochemical Society. 1993, Vol 140, Num 6, pp 1809-1813, issn 0013-4651Article
Laser-assisted liquid film etchingLIM, P; BROCK, J; TRACHTENBERG, I et al.Applied physics letters. 1993, Vol 62, Num 25, pp 3345-3347, issn 0003-6951Article
Reactive cluster beam etching of fine patternsCHUNG, C. W; BROCK, J. R; TRACHTENBERG, I et al.Applied physics letters. 1993, Vol 63, Num 24, pp 3341-3343, issn 0003-6951Article
Laser-induced etching of silicon in hydrofluoric acidLIM, P; BROCK, J. R; TRACHTENBERG, I et al.Applied physics letters. 1992, Vol 60, Num 4, pp 486-488, issn 0003-6951Article
Intergranuler diffusion in real polycrystalsKONDRATEV, V. V; TRACHTENBERG, I. SH.Physica status solidi. B. Basic research. 1992, Vol 171, Num 2, pp 303-315, issn 0370-1972Article
Aerosol jet etchingCHEN, Y. L; BROCK, J. R; TRACHTENBERG, I et al.Aerosol science and technology. 1990, Vol 12, Num 4, pp 842-855, issn 0278-6826, 14 p.Article
Aerosol jet etching of fine patternsCHEN, Y. L; BROCK, J. R; TRACHTENBERG, I et al.Applied physics letters. 1987, Vol 51, Num 26, pp 2203-2205, issn 0003-6951Article
Modeling of plasma etch systems using ordinary least squares, recurrent neural network, and projection to latent structure modelsBUSHMAN, S; EDGAR, T. F; TRACHTENBERG, I et al.Journal of the Electrochemical Society. 1997, Vol 144, Num 4, pp 1379-1389, issn 0013-4651Article
Radio frequency diagnostics for plasma etch systemsBUSHMAN, S; EDGAR, T. F; TRACHTENBERG, I et al.Journal of the Electrochemical Society. 1997, Vol 144, Num 2, pp 721-732, issn 0013-4651Article
Design and modeling of rapid thermal processing systemsSTUBER, J. D; TRACHTENBERG, I; EDGAR, T. F et al.IEEE transactions on semiconductor manufacturing. 1998, Vol 11, Num 3, pp 442-457, issn 0894-6507Article
A theoretical investigation of low pressure particle impaction in a highly underexpanded sonic impinging slip jetCHANG, P. S; BROCK, J. R; TRACHTENBERG, I et al.Journal of aerosol science. 1993, Vol 24, Num 1, pp 31-44, issn 0021-8502Article
Aerosol jet etching of Hg1-xCdxTeJURCIK, B. J; BROCK, J. R; TRACHTENBERG, I et al.Applied physics letters. 1990, Vol 56, Num 17, pp 1682-1684, issn 0003-6951Article