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SINGLE INTERMETALLIC COMPOUND FORMATION IN PD-PB AND PD-SN THIN-FILM COUPLES STUDIES BY X-RAY DIFFRACTION = FORMATION D'UN SEUL COMPOSE INTERMETALLIQUE DANS LES COUPLES DE COUCHES MINCES PD-PB ET PD-SN ETUDIEE PAR DIFFRACTION DE RAYON XTU KN.1982; MATER. LETT.; ISSN 511080; NLD; DA. 1982; VOL. 1; NO 1; PP. 6-10; BIBL. 15 REF.Article

LOW TEMPERATURE ORDERING IN FINE-GRAINED AND DISORDERED CU3AU THIN FILMS = MISE EN ORDRE A BASSE TEMPERATURE DANS LES COUCHES MINCES CU3AU DESORDONNEES A GRAIN FINTU KN.1980; SCR. METALL.; ISSN 0036-9748; USA; DA. 1980; VOL. 14; NO 6; PP. 663-666; BIBL. 14 REF.Article

KINETICS OF THIN-FILM REACTIONS BETWEEN PB AND THE AGPD ALLOY.TU KN.1977; J. APPL. PHYS.; U.S.A.; DA. 1977; VOL. 48; NO 8; PP. 3400-3404; BIBL. 12 REF.Article

INTERDIFFUSION AND REACTION IN BIMETALLIC CU-SN THIN FILMSTU KN.1973; ACTA METALLURG.; E.U.; DA. 1973; VOL. 21; NO 4; PP. 347-354; ABS. FR. ALLEM.; BIBL. 27 REF.Serial Issue

THE CELLULAR REACTION IN PB-SN ALLOYSTU KN.1972; METALLURG. TRANS.; U.S.A.; DA. 1972; VOL. 3; NO 11; PP. 2769-2775; BIBL. 30 REF.Serial Issue

THERMAL STABILITY OF PD2SI AND PDSI IN THIN FILM AND IN BULK DIFFUSION COUPLESTU KN.1982; J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1982; VOL. 53; NO 1; PP. 428-432; BIBL. 12 REF.Article

SELECTIVE GROWTH OF METAL-RICH SILICIDE OF NEAR-NOBLE METALS.TU KN.1975; APPL. PHYS. LETTERS; U.S.A.; DA. 1975; VOL. 27; NO 4; PP. 221-224; BIBL. 27 REF.Article

FORMATION OF SHALLOW SILICIDE CONTACTS OF HIGH SCHOTTKY BARRIER ON SI: ALLOYING PD AND PT WITH W VS ALLOYING PD AND PT WITH SIEIZENBERG M; TU KN.1982; J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1982; VOL. 53; NO 3; PART. 1; PP. 1577-1585; BIBL. 12 REF.Article

LOW TEMPERATURE GETTERING OF CU, AG, AND AU ACROSS A WAFER OF SI BY AL = PIEGEAGE A BASSE TEMPERATURE DE CU, AG ET AU PAR AL A TRAVERS UNE PASTILLE DE SITHOMPSON RD; TU KN.1982; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1982; VOL. 41; NO 5; PP. 440-442; BIBL. 14 REF.Article

TITANIUM-TUNGSTEN CONTACTS TO SI: THE EFFECTS OF ALLOYING ON SCHOTTKY CONTACT AND ON SILICIDE FORMATIONBABCOCK SE; TU KN.1982; J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1982; VOL. 53; NO 10; PP. 6898-6905; BIBL. 17 REF.Article

WETTING OF QUARTZ SURFACES BY AU-SI EUTECTIC MELT.TU KN; LIBERTINI SH.1977; J. APPL. PHYS.; U.S.A.; DA. 1977; VOL. 48; NO 1; PP. 420-421; BIBL. 2 REF.Article

X-RAY STUDY OF INTERDIFFUSION IN BIMETALLIC CU-AU FILMSTU KN; BERRY BS.1972; J. APPL. PHYS.; U.S.A.; DA. 1972; VOL. 43; NO 8; PP. 3283-3290; BIBL. 22 REF.Serial Issue

KINETICS OF INTERFACIAL REACTION IN BIMETALLIC CU-SN THIN FILMSTU KN; THOMPSON RD.1982; ACTA METALL.; USA; DA. 1982-05; VOL. 30; NO 5; PP. 947-952; BIBL. 16 REF.Article

SHALLOW SILICIDE-TO-SILICON CONTACTS: THE CASE OF AMORPHOUS-PD80SI20-TO-SILICONKRITZINGER S; TU KN.1980; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1980; VOL. 37; NO 2; PP. 205-208; BIBL. 9 REF.Article

ANALYSIS OF PARALLEL SCHOTTKY CONTACTS BY DIFFERENTIAL INTERNAL PHOTOEMISSION SPECTROSCOPYOKUMURA T; TU KN.1983; JOURNAL OF APPLIED PHYSICS; ISSN 0021-8979; USA; DA. 1983; VOL. 54; NO 2; PP. 922-927; BIBL. 14 REF.Article

PARALLEL SILICIDE CONTACTSOHDOMARI I; TU KN.1980; J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1980; VOL. 51; NO 7; PP. 3735-3739; BIBL. 5 REF.Article

FORBIDDEN 200 DIFFRACTION SPOTS IN SILICON.TU KN; HOWIE A.1978; PHILOS MAG., B; G.B.; DA. 1978; VOL. 37; NO 1; PP. 73-81; BIBL. 8 REF.Article

GROWTH KINETICS AND DIFFUSION MECHANISM IN PD2SIWITTMER M; TU KN.1983; PHYSICAL REVIEW. B: CONDENSED MATTER; ISSN 0163-1829; USA; DA. 1983; VOL. 27; NO 2; PP. 1173-1179; BIBL. 24 REF.Article

THIN PALLADIUM SILICIDE CONTACTS TO SILICONKRITZINGER S; TU KN.1981; J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1981; VOL. 52; NO 1; PP. 305-310; BIBL. 12 REF.Article

ANALYSIS OF THIN-FILM STRUCTURES WITH NUCLEAR BACKSCATTERING AND X-RAY DIFFRACTION.MAYER JW; TU KN.1974; J. VACCUM SCI. TECHNOL.; U.S.A.; DA. 1974; VOL. 11; NO 1; PP. 86-93; BIBL. 35 REF.; (20TH NATL. SYMP. AM. VAC. 50C. 11TH CONF. MICROBALANCE TECH. PROC.; NEW YORK; 1973)Conference Paper

GROWTH KINETICS OF PLANAR BINARY DIFFUSION COUPLES: "THIN-FILM CASE" VERSUS "BULK CASES" = CINETIQUES DE CROISSANCE DE COUPLES DE DIFFUSION BINAIRES PLANS: LE CAS "COUCHE MINCE" PAR RAPPORT AU CAS "EN VOLUME"GOESELE U; TU KN.1982; J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1982; VOL. 53; NO 4; PP. 3252-3260; BIBL. 42 REF.Article

KINETICS OF INTERFACIAL REACTION IN BIMETALLIC CU-SN THIN FILMS = CINETIQUE COUCHES MINCES BIMETALLIQUES CU-SNTU KN; THOMPSON RD.1982; ACTA METALL.; ISSN 0001-6160; USA; DA. 1982; VOL. 30; NO 5; PP. 947-952; ABS. FRE/GER; BIBL. 16 REF.Article

THIN-FILM REACTIONS OF PB WITH AGAU AND AGPD ALLOYSTU KN; CHANCE DA.1975; J. APPL. PHYS.; U.S.A.; DA. 1975; VOL. 46; NO 8; PP. 3229-3234; BIBL. 18 REF.Article

MASS TRANSPORT IN LAYERED POLYCRYSTALLINE THIN FILMSTU KN; ROSENBERG R.1972; THIN SOLID FILMS; NETHERL.; DA. 1972; VOL. 13; NO 1; PP. 163-167; BIBL. 10 REF.Serial Issue

FORMATION AND SCHOTTKY BEHAVIOR OF MANGANESE SILICIDES ON N-TYPES SILICONEIZENBERG M; TU KN.1982; J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1982; VOL. 53; NO 10; PP. 6885-6890; BIBL. 26 REF.Article

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